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JPS60219783A - Gas laser tube - Google Patents

Gas laser tube

Info

Publication number
JPS60219783A
JPS60219783A JP7594584A JP7594584A JPS60219783A JP S60219783 A JPS60219783 A JP S60219783A JP 7594584 A JP7594584 A JP 7594584A JP 7594584 A JP7594584 A JP 7594584A JP S60219783 A JPS60219783 A JP S60219783A
Authority
JP
Japan
Prior art keywords
tube
anode
cathode
laser tube
gas laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7594584A
Other languages
Japanese (ja)
Inventor
Katsuro Takebe
武部 勝郎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP7594584A priority Critical patent/JPS60219783A/en
Publication of JPS60219783A publication Critical patent/JPS60219783A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/0305Selection of materials for the tube or the coatings thereon
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02Constructional details
    • H01S3/03Constructional details of gas laser discharge tubes
    • H01S3/032Constructional details of gas laser discharge tubes for confinement of the discharge, e.g. by special features of the discharge constricting tube
    • H01S3/0323Constructional details of gas laser discharge tubes for confinement of the discharge, e.g. by special features of the discharge constricting tube by special features of the discharge constricting tube, e.g. capillary

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)

Abstract

PURPOSE:To obtain the titled tube of low cost and high quality by a method wherein a discharge path fine tube forming a discharge path is made of silicon nitride. CONSTITUTION:The fine tube made of silicon nitride forms a discharge path between the cathode 11 and the anode 5 connected via encapsulating trays 2 and 3 respectively. Heat dissipating fins 6 are bonded to the outer periphery of the tube 1, and the heat evolving in the encapsulating trays 2, 3, and 7 and the anode 5 is dissipated via fins 6 by the air fed in from a fan not illustrated. A cathode valve 4 includes the cathode 11 and contains argon gas. Besides, a return path 9 for the argon gas connects the valve 4 with an anode valve 8.

Description

【発明の詳細な説明】 (1)発明の属する分野 本発明は、ヘリウム・ネオン、アルゴン、クリプトン、
炭酸ガス等のガス放電による励起を用いてレーザ発振を
現出させるガスレーザ管に関するものである。
DETAILED DESCRIPTION OF THE INVENTION (1) Field to which the invention pertains The present invention relates to helium-neon, argon, krypton,
The present invention relates to a gas laser tube that produces laser oscillation using excitation by discharge of a gas such as carbon dioxide gas.

(り従来の技術 一般K、ガスレーザ管は、放電路を形成するガラスまた
はセラミックから成る放電路細管(以下細管と称する)
、両端に位置する一対の窓、陽極および陰極を主構成要
素とする円筒状の密閉管であり、その内部には、ヘリウ
ム−ネオン、アルゴン、クリプトン、炭酸ガス等が封入
されている。
(Prior art in general) A gas laser tube is a discharge path thin tube (hereinafter referred to as a thin tube) made of glass or ceramic that forms a discharge path.
It is a cylindrical sealed tube whose main components include a pair of windows located at both ends, an anode, and a cathode, and helium-neon, argon, krypton, carbon dioxide gas, etc. are sealed inside the tube.

ところで、上記ガスレーザ管の高出力化を図るには、放
電電流の密度を大きくしなければならないが、その場合
、細管管壁における放電ガスの衝突によシ損失エネルギ
ーが増大する。このため。
Incidentally, in order to increase the output of the gas laser tube, it is necessary to increase the density of the discharge current, but in this case, energy loss due to collision of the discharge gas on the thin tube wall increases. For this reason.

細管の管壁温度が著しく上昇し、細管の破壊や発振効率
の低下を生ぜしめる。
The temperature of the tube wall of the capillary increases significantly, causing destruction of the capillary and a decrease in oscillation efficiency.

こうした理由により、炭酸ガスレーザやアルゴンレーザ
等の高出力レーザの場合には、ガスレーザ管とりわけ細
管部の熱放散が極めて重要な課題となる。
For these reasons, in the case of high-power lasers such as carbon dioxide lasers and argon lasers, heat dissipation in the gas laser tube, especially in the thin tube section, becomes an extremely important issue.

そこで、出力が比較的大きい場合には、耐熱性耐熱衝撃
性に優れた石英ガラス管の内部に、タングステン等の高
融点金属あるいは黒鉛を用いた導電性有孔円板を絶縁用
スペーサを介して積層して形成した細管部を配設したガ
スレーザ管と熱伝導性および気密性に優れたベリリアセ
ラミック製細管を外囲器を兼ねて使用したガスレーザ管
の二種類が一般的である。いずれも外囲器は冷却水に浸
漬されている。
Therefore, when the output is relatively large, a conductive perforated disk made of a high-melting point metal such as tungsten or graphite is placed inside a quartz glass tube with excellent heat resistance and thermal shock resistance via an insulating spacer. There are generally two types of gas laser tubes: a gas laser tube with a laminated thin tube section and a gas laser tube that uses a thin tube made of beryllia ceramic, which has excellent thermal conductivity and airtightness, and also serves as an envelope. In both cases, the envelope is immersed in cooling water.

また、出力が比較的小さい場合VCは、ベリリアセラミ
ック製細管の外壁に放熱フィンを設けたガスレーザ管が
一般的であシ、ファンによシ空冷される。
In addition, when the output is relatively small, the VC is generally a gas laser tube with heat dissipation fins provided on the outer wall of a thin beryllia ceramic tube, which is air-cooled by a fan.

このうち、ベリリアセラミック細管は1種々の利点を備
えているが、製造上極めて重大な欠点を有している。
Among these, beryllia ceramic capillary tubes have various advantages, but have extremely serious drawbacks in manufacturing.

すなわち、ベリリアセラミックは第一に法的に規制のあ
る物質でちゃ、加工、取扱いに腐心しなければならない
こと、第二に、極めて高価であり、長尺ものや所要の形
状のものが入手しにくいこと第三には、機械的強度がア
ルミナセラミック等に比して弱く軽量化ができないこと
などが挙げられる。また、これらの欠点から派生する製
造上の問題点も多く、ベリリアセラミックから他の材質
への転換がめられて来た。
Firstly, beryllia ceramic is a legally regulated substance and must be processed and handled with great care.Secondly, it is extremely expensive and cannot be obtained in long pieces or in the required shape. The third difficulty is that the mechanical strength is weaker than that of alumina ceramics and the like, making it impossible to reduce the weight. In addition, there are many manufacturing problems derived from these drawbacks, and there have been attempts to switch from beryllia ceramic to other materials.

(3)発明の目的 本発明は、従来のべIJ リアセラミック細管を使用し
たガスレーザ管の欠点を解決するために、ベリリアセラ
ミックを窒化珪素におきかえたもので。
(3) Purpose of the Invention The present invention replaces beryllia ceramic with silicon nitride in order to solve the drawbacks of the conventional gas laser tube using beryllium ceramic thin tubes.

法的な規制もなく、比較的安価で、高品質のガスレーザ
管を提供することにある。
The objective is to provide a relatively inexpensive, high-quality gas laser tube with no legal restrictions.

以下1本発明について詳細に説明する。The present invention will be explained in detail below.

(4)発明の構成および作用 第1図は、本発明の1実施例によるアルゴンガスレーザ
管断面を示す。第1図において、1は長さ55mm、外
径10mm、内径1.02mm の窒化珪素製細管であ
シ、封入皿2および3を介して各々連結されている陰極
11および陽極5の間に放電路を形成する。
(4) Structure and operation of the invention FIG. 1 shows a cross section of an argon gas laser tube according to an embodiment of the invention. In FIG. 1, 1 is a thin tube made of silicon nitride with a length of 55 mm, an outer diameter of 10 mm, and an inner diameter of 1.02 mm. form a road.

細管1の外周には、放熱フィン6が接合されておシ、細
管1.封入皿2.3,7.陽極5に生ずる熱は、ファン
(図示せず)により送シ込まれる空気によって放熱フィ
ン6を介して放散される。
A radiation fin 6 is joined to the outer periphery of the thin tube 1. Enclosure dish 2.3, 7. Heat generated at the anode 5 is dissipated through the heat radiation fins 6 by air blown in by a fan (not shown).

陰極バルブ4L陰極11を内包し、かつ、アルゴンガス
を溜めている。またアルゴンガスのリターンパス9が、
陰極バルブ4と、陽極バルブ8を連結している。そして
1両端には放電路の中心軸に対してブリー−スタ角を成
すいわゆるプリエースタ窓10が対向して接合されてい
る。
Cathode bulb 4L contains a cathode 11 and stores argon gas. In addition, the argon gas return path 9 is
A cathode bulb 4 and an anode bulb 8 are connected. So-called pre-acitor windows 10 forming a breaster angle with respect to the central axis of the discharge path are connected to both ends of the discharge path.

次に、前記構造を有するアルゴンレーザ管の製作方法に
ついて述べる。
Next, a method for manufacturing an argon laser tube having the above structure will be described.

窒化珪素は、熱膨張率が小さく、高温強度や機械的強度
が優れてお勺、ベリリアセラミックに代置すべき素材と
して適合性を備えている。しかし。
Silicon nitride has a low coefficient of thermal expansion and excellent high-temperature strength and mechanical strength, making it suitable as a material to replace beryllia ceramic. but.

従来窒化珪素は酸化物を含まぬため、金属化処理ができ
ずろう付による接合が困難であったが、チタン合金の一
程であるT i −Cu −B eろう材により炭化珪
素に金属化処理を施さず直゛接ろう付施工が可能なこと
を確認した。
Conventionally, silicon nitride cannot be metallized because it does not contain oxides, making joining by brazing difficult. It was confirmed that direct brazing can be performed without any treatment.

そこで第1図に示した封入皿2.陽極5.封入皿3.細
管l、封入皿2および放熱フィン6をろうl’48T 
1−482r−4Beを用いて、ろう付温度1030°
Cで真空ろう付を行なりた。その後、従来の公知の方法
罠よシ、ガラス加工を施し、アルゴンレーザ管20を完
成した。
Therefore, the enclosure dish 2 shown in FIG. Anode 5. Enclosure dish 3. Braze the capillary tube l, the enclosure plate 2 and the radiation fin 6 with l'48T.
Using 1-482r-4Be, brazing temperature 1030°
Vacuum brazing was performed at C. Thereafter, the argon laser tube 20 was completed by performing glass processing using a conventional known method.

本実施例では空冷アルゴンレーザ管について述べたが、
水冷アルゴンレーザ管も、ろう付構造は同一であるため
、前記の製作方法によシ容易に製作することができる。
Although this example describes an air-cooled argon laser tube,
Since the water-cooled argon laser tube has the same brazing structure, it can be easily manufactured using the above manufacturing method.

また、48Ti−48Zr−4B eの代置に純チタン
を用いても窒化珪素の真空ろう付が可能であることは言
を俟たない。
Furthermore, it goes without saying that vacuum brazing of silicon nitride is possible even if pure titanium is used in place of 48Ti-48Zr-4Be.

このようにして、チタン系ろう材を用いて窒化珪素を使
用した細管と金属部品を真空ろう付し、気密性耐熱衝撃
性に優れたアルゴンレーザ管を製作することができた。
In this way, we were able to vacuum-braze a thin tube made of silicon nitride and a metal part using a titanium brazing filler metal, and fabricate an argon laser tube with excellent airtightness and thermal shock resistance.

(5)効果の説明 以上述べた如く1本発明によれは、細管として従来使用
してきたベリリアセラミックに比して。
(5) Description of Effects As stated above, the present invention has advantages over beryllia ceramics, which have been conventionally used as thin tubes.

(イ)取扱上の規制もなく、1(ロ)細管表面に複雑な
工程を要する金属化処理を省略でき、(ハ)様々な機械
加工ができ、←)機械的強度や耐熱衝撃性の大きく。
(b) There are no restrictions on handling, (b) metallization treatment that requires complicated processes on the tube surface can be omitted, (c) various machining processes can be performed, and (←) high mechanical strength and thermal shock resistance. .

(ホ)安価な窒化珪素を用いて高品質のガスレーザ管を
提供することができる。
(e) A high quality gas laser tube can be provided using inexpensive silicon nitride.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の詳細な説明するためのガスレーザ管の
縦断面図である。 1・・・・・・窒化珪素を使用した細管、2,3.7・
・・・・・封入皿、4・・・・・・陰極パルプ、5・・
・・・・陽極、6・・・・・・放熱フィン、8・・・・
・・陽極パルプ、9・・・・・・リターンパス、10・
・・・・・ブリュースタ窓、11・・・・・・陰極。 20・・・・・・ガスレーザ管。
FIG. 1 is a longitudinal sectional view of a gas laser tube for explaining the present invention in detail. 1... Thin tube using silicon nitride, 2,3.7.
... Enclosure dish, 4 ... Cathode pulp, 5 ...
...Anode, 6...Radiation fin, 8...
・・Anode pulp, 9・・Return path, 10・
...Brewster window, 11 ... cathode. 20...Gas laser tube.

Claims (1)

【特許請求の範囲】[Claims] 陽極と陰極の間に放電路を形成する細管を有するガスレ
ーザ管において、前記細管の材質が窒化珪素であること
を特徴とするガスレーザ管。
1. A gas laser tube having a thin tube forming a discharge path between an anode and a cathode, characterized in that the thin tube is made of silicon nitride.
JP7594584A 1984-04-16 1984-04-16 Gas laser tube Pending JPS60219783A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7594584A JPS60219783A (en) 1984-04-16 1984-04-16 Gas laser tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7594584A JPS60219783A (en) 1984-04-16 1984-04-16 Gas laser tube

Publications (1)

Publication Number Publication Date
JPS60219783A true JPS60219783A (en) 1985-11-02

Family

ID=13590868

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7594584A Pending JPS60219783A (en) 1984-04-16 1984-04-16 Gas laser tube

Country Status (1)

Country Link
JP (1) JPS60219783A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6272188A (en) * 1985-09-26 1987-04-02 Toshiba Corp Laser tube

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6272188A (en) * 1985-09-26 1987-04-02 Toshiba Corp Laser tube
JPH0319716B2 (en) * 1985-09-26 1991-03-15 Tokyo Shibaura Electric Co

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