JPS60141628A - Preparation of quartz glass doped with fluorine - Google Patents
Preparation of quartz glass doped with fluorineInfo
- Publication number
- JPS60141628A JPS60141628A JP24853183A JP24853183A JPS60141628A JP S60141628 A JPS60141628 A JP S60141628A JP 24853183 A JP24853183 A JP 24853183A JP 24853183 A JP24853183 A JP 24853183A JP S60141628 A JPS60141628 A JP S60141628A
- Authority
- JP
- Japan
- Prior art keywords
- quartz glass
- fluorine
- refractive index
- doped
- soot
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/018—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD] by glass deposition on a glass substrate, e.g. by inside-, modified-, plasma-, or plasma modified- chemical vapour deposition [ICVD, MCVD, PCVD, PMCVD], i.e. by thin layer coating on the inside or outside of a glass tube or on a glass rod
- C03B37/01807—Reactant delivery systems, e.g. reactant deposition burners
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01446—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/28—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with phosphorus
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Glass Melting And Manufacturing (AREA)
- Glass Compositions (AREA)
Abstract
Description
【発明の詳細な説明】 する。[Detailed description of the invention] do.
石英ガラスにフッ素をドーピングすると石英ガラスの屈
折率が低下することが知られており、かかるフッ素ドー
プ石英ガラスはたとえば石英ガラス光ファイバのクラッ
ドの材料として用いられている。It is known that doping quartz glass with fluorine lowers the refractive index of the quartz glass, and such fluorine-doped quartz glass is used, for example, as a material for the cladding of silica glass optical fibers.
石英ガラス系光ファイバは、コアと該コアよりも屈折率
の小さいフッ素ドープ石英ガラス製のクラッドとからな
る組成のものが知られており、コアとクラッドの屈折率
の差(八〇)を利用して光を伝送している。このΔnが
大きければ大きいほど漏光を少なくすることができ、間
口数も大きくすることができる。しかし、光を伝送する
コアは光透過損失のできるだけ小さいものにする必要が
あり、その点から高純度の石英ガラスが好ましく、した
がってΔnを大きくするために屈折率を小さくしたフッ
素ドープ石英ガラスをクラッドとして用いている。Silica glass-based optical fibers are known to have a composition consisting of a core and a fluorine-doped silica glass cladding that has a smaller refractive index than the core, and utilizes the difference in refractive index between the core and the cladding (80) and transmits light. The larger Δn is, the more light leakage can be reduced and the number of openings can be increased. However, the core that transmits light must have as little light transmission loss as possible, and from that point of view, high-purity quartz glass is preferable. Therefore, in order to increase Δn, fluorine-doped quartz glass with a low refractive index is used as a cladding. It is used as
かかるフッ素ドープ石英ガラスの製法としては、SL
C# 4とBF3などのフッ素化物と酸素からなる混合
ガスを加熱してフッ素−ホウ素ドープ石英ガラスを製造
する方法などが知られている。As a method for manufacturing such fluorine-doped quartz glass, SL
A method of manufacturing fluorine-boron doped quartz glass by heating a mixed gas consisting of C#4, a fluoride such as BF3, and oxygen is known.
しかしながら、かかる方法によってえられるフッ素−ホ
ウ素ドープ石英ガラスにはフッ素と共にホウ素が多聞に
ドープされているので、ホウ素に起因する種々の問題、
たとえば熱膨張係数の増大などの問題を有しており、実
用的なフッ素−ホウ素ドープ石英ガラスとしてはせいぜ
い屈折率が1.4465 (純石英ガラスの屈折率(1
,4585>との差(八〇)は0.012>のものしか
えられない。However, since the fluorine-boron doped quartz glass obtained by this method is heavily doped with fluorine and boron, there are various problems caused by boron.
For example, it has problems such as an increase in the coefficient of thermal expansion, and a practical fluorine-boron doped silica glass has a refractive index of at most 1.4465 (the refractive index of pure silica glass (1
, 4585> (80), only 0.012> can be obtained.
本発明者らはより一層屈折率の低い実用的なフッ素ドー
プ石英ガラスをうるべく鋭意研究を重ねた結果、PFs
をドーパントの前駆体として用いてフッ素ドープ石英ガ
ラスを製造するときは、えられたフッ素ドープ石英ガラ
スの屈折率をより一層低下させることができることを見
出し、本発明を完成した。As a result of intensive research to create a practical fluorine-doped quartz glass with an even lower refractive index, the inventors found that PFs
They have discovered that when producing fluorine-doped quartz glass using fluorine-doped quartz glass as a dopant precursor, the refractive index of the obtained fluorine-doped quartz glass can be further reduced, and the present invention has been completed.
本発明に用いるPFsは融点−93,8℃、沸点−84
4℃、分子@ 126の常温でガス状の化合物である。PFs used in the present invention has a melting point of -93.8°C and a boiling point of -84°C.
It is a gaseous compound at room temperature of 4°C, molecules @ 126.
本発明の方法においては、St C14のようなSt
a?形成剤とPFsと酸素からなる混合ガスを約800
〜1600℃に加熱してリンとフッ素をドープしたSt
atのスートを形成し、さらにリンとフッ素を含むS
L Op i!をガラス化してもよいし、St CI
4と水素と酸素からなる混合ガスを燃炊させて5LOt
のスートを形成せしめ、ついでかかるスートにPFsを
接触させたのちガラス化してもよい。いずれの方法にお
いても、屈折率が1.445以下のフッ素ドープ石英ガ
ラスがえられる。In the method of the invention, St
a? Approximately 800 ml of mixed gas consisting of forming agent, PFs, and oxygen
St heated to ~1600°C and doped with phosphorus and fluorine
S which forms the soot of at and further contains phosphorus and fluorine
L Opi! may be vitrified, or St CI
5LOt by burning a mixed gas consisting of 4, hydrogen and oxygen
A soot may be formed, and then the soot may be brought into contact with PFs and then vitrified. In either method, fluorine-doped quartz glass having a refractive index of 1.445 or less can be obtained.
St CI 4のようなSt 02形成剤とPFsとを
含む混合ガスを用いるばあいは1.5tOt形成剤10
0容量部あたりPFsを0.05〜1容量部混合すれば
よい。また、SL 02スートにPFsを接触させるば
あい、約100〜1000℃、好ましくは約300〜8
00℃の温度のSt OtスートにPFsを5〜eO分
間程度接触させればよい。When using a mixed gas containing a St 02 forming agent such as St CI 4 and PFs, 1.5 tOt forming agent 10
0.05 to 1 part by volume of PFs may be mixed per 0 part by volume. In addition, when PFs is brought into contact with SL 02 soot, the temperature is about 100 to 1000°C, preferably about 300 to 8°C.
PFs may be brought into contact with St Ot soot at a temperature of 00° C. for about 5 to eO minutes.
本発明の方法によりえられる石英ガラスは、フッ素のほ
かにリンもドープされている。このリンは石英ガラスの
屈折率を大きくする方向に作用するが、その程度はフッ
素の屈折率低下作用に比してごく小さく、フッ素による
屈折率低下効果を大きく損なわせるものではない。The quartz glass obtained by the method of the invention is doped not only with fluorine but also with phosphorus. Although this phosphorus acts to increase the refractive index of silica glass, the degree of this action is very small compared to the refractive index lowering effect of fluorine, and does not significantly impair the refractive index lowering effect of fluorine.
なお、PFsは水により分解するので、できるだけ水の
存在しない系で使用するのが好ましい。Note that, since PFs is decomposed by water, it is preferable to use it in a system free of water as much as possible.
本発明の方法でえられるフッ素ドープ石英ガラスは、石
英ガラス系光ファイバのクラッドやイメージガイドのク
ラッド、光学レンズ、プリズムとして有効である。石英
ガラス系光ファイバのクラッドとして用いるときは、コ
アの高純度の石英ガラスとの屈折率の差(八〇)を0.
02以上にすることができ、したがってクラッドの厚さ
をより一層薄りすることができると共に開口数を大きく
することができる。The fluorine-doped quartz glass obtained by the method of the present invention is effective as the cladding of a silica glass optical fiber, the cladding of an image guide, an optical lens, and a prism. When used as the cladding of a silica glass-based optical fiber, the difference in refractive index (80) with the high-purity silica glass of the core should be set to 0.
02 or more, therefore, the thickness of the cladding can be further reduced and the numerical aperture can be increased.
また、石英ガラス系光ファイバを用いるイメージガイド
は、製造上の制約から通常多数本の光ファイバを融着し
て作製されており、可撓性に劣るという問題を有してい
るが、本発明によるときはクラッドを薄くできるので、
イメージガイドの外径を小さくすることができ、可撓性
を大幅に向上せしめることができる。PFsをドーバン
との前駆体として用いると屈折率が従来のフッ素ドープ
石英ガラスなどに比して大幅に低下する理由は明らかで
はないが、PF%が強いル゛イス酸であり、石英系ガラ
スの骨格であ1
になるとリンが1〜3個のフッ素を伴ってガラス骨格中
に取り込まれるからと推定される。Furthermore, image guides using silica glass optical fibers are usually manufactured by fusing a large number of optical fibers together due to manufacturing constraints, and have the problem of poor flexibility. The cladding can be made thinner when
The outer diameter of the image guide can be reduced, and its flexibility can be greatly improved. It is not clear why the refractive index is significantly lower than that of conventional fluorine-doped silica glass when PFs is used as a precursor with Dovan, but it is a Lewis acid with a strong PF%, It is presumed that when the skeleton becomes 1, phosphorus is incorporated into the glass skeleton together with 1 to 3 fluorine atoms.
つぎに実施例をあげて本発明の詳細な説明する −が、
本発明はかかる実施例のみに限定されるものではない。Next, the present invention will be explained in detail by giving examples.
The present invention is not limited to such embodiments.
実施例1
600℃に加熱された石英ガラス管にSL CI 4
とPFsと酸素の混合ガス(SL(Ja : P F
s :0p−1:0,3:2、モル比)を10分間に亘
って連続的に接触させてリンとフッ素がドープされたs
t 02のスートを形成した。ついでその石英ガラスを
1200℃に加熱して前記Si o!のスートをガラス
化してフッ素ドープ石英ガラスをえた。えられたフッ素
ドープ石英ガラスの屈折率は1,438であった。Example 1 SL CI 4 was placed in a quartz glass tube heated to 600°C.
A mixed gas of PFs and oxygen (SL (Ja: PF
s:0p-1:0, 3:2, molar ratio) was doped with phosphorus and fluorine by continuously contacting them for 10 minutes.
A soot of t 02 was formed. Then, the quartz glass was heated to 1200°C to form the SiO! The soot was vitrified to obtain fluorine-doped quartz glass. The refractive index of the obtained fluorine-doped quartz glass was 1,438.
実施例2
SL CI < と水素と酸素の混合ガス(SLC&a
: Ha :0、−1: 10: 25、モル比)を
燃煉させて石英ガラス上に吹きつけてSt oeのスー
トを形成した。Example 2 SL CI < and mixed gas of hydrogen and oxygen (SLC&a
: Ha: 0, -1: 10: 25, molar ratio) was burned and blown onto quartz glass to form Stoe's soot.
ついで該スートを600℃に保持し、PFsを10分間
接触させたのち1200℃に加熱してガラス化し、リン
−フッ素ドープ石英ガラスをえた。えられたフッ素ドー
プ石英ガラスの屈折率は1.432であった。The soot was then maintained at 600° C., contacted with PFs for 10 minutes, and then heated to 1200° C. to vitrify it to obtain phosphorus-fluorine doped quartz glass. The refractive index of the obtained fluorine-doped quartz glass was 1.432.
Claims (1)
特徴とするフッ素ドープ石英ガラスの製法。A method for producing fluorine-doped quartz glass, characterized in that I PFs is used as a Dovan i- precursor.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24853183A JPS60141628A (en) | 1983-12-27 | 1983-12-27 | Preparation of quartz glass doped with fluorine |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24853183A JPS60141628A (en) | 1983-12-27 | 1983-12-27 | Preparation of quartz glass doped with fluorine |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS60141628A true JPS60141628A (en) | 1985-07-26 |
Family
ID=17179568
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP24853183A Pending JPS60141628A (en) | 1983-12-27 | 1983-12-27 | Preparation of quartz glass doped with fluorine |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60141628A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63240501A (en) * | 1987-03-27 | 1988-10-06 | Matsushita Electric Ind Co Ltd | Projecting lens and exposing device using said lens |
US4804247A (en) * | 1984-04-12 | 1989-02-14 | Sumitomo Electric Industries, Ltd. | Quartz glass optical fiber |
-
1983
- 1983-12-27 JP JP24853183A patent/JPS60141628A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4804247A (en) * | 1984-04-12 | 1989-02-14 | Sumitomo Electric Industries, Ltd. | Quartz glass optical fiber |
JPS63240501A (en) * | 1987-03-27 | 1988-10-06 | Matsushita Electric Ind Co Ltd | Projecting lens and exposing device using said lens |
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