JPS60129933A - Driving method of base film - Google Patents

Abstract

PURPOSE:To increase the film forming speed and also to improve the orientation of magnetic film with a vacuum evaporating device for production of magnetic film, for example, by driving a base film along the depressed surface side of a blet. CONSTITUTION:A belt 14 is driven along a prescribed curve, and this belt 14 and a base film 12 have the electromagnetic attracting force of static electricity, magnetism, etc. At the same time, the film 12 is driven at the same speed as the belt 14 and synchronously with the belt 14. Thus the film 12 is driven along said curve with a close contact secured to the depressed surface side of the belt 14. This eliminate the conventional need to control the steam incident angle by means of a mask with a vacuum evaporating device for production of mgentic film for example. Thus the film forming speed can be increased with input of the vapor having an accurate indicent angle component. This improves both the productivty and the orientation properties of a magnetic film.

Description

[Detailed description of the invention] [Field of application of the invention] The present invention is for manufacturing magnetic recording tape.

The present invention relates to a method of running a long base film along a predetermined curved surface when depositing a magnetic material on the film.

[Background of the invention and prior art]

A magnetic film is produced by vacuum deposition (1) There are two types of open-air recording tapes, so-called vapor-deposited tapes, depending on the direction in which the magnetic material adheres to the surface of the base soil: oblique vapor-deposited tapes and vertical vapor-deposited tapes. In the former, a magnetic film is created by making the vapor of a magnetic material obliquely incident on the surface of the base film at a fixed angle, whereas in the latter, the same vapor is made incident perpendicularly on the surface of the base film. In other words, for any magnetic film, it is required that the Ff of the magnetic material be made incident on the base film at a constant angle.

Conventionally, when producing these magnetic films,
By attaching a base film to a drum, the film is bent along the cylindrical surface, and a mask for regulating the incident angle is used to cause vapor having a predetermined incident angle component to be incident on the surface of the film.

For example, FIG. 1 schematically shows a conventional perpendicular magnetic film manufacturing apparatus and a base film traveling apparatus used in the apparatus. In the above traveling device, the unwinder
A base film 2 unwound from a roll 3 is applied to a rotating drum 4, and then wound onto a winder roll 5. On the other hand, a stem source 1 is arranged on the normal line of the drum 4, and a mask 6 having a slit 7 in -1- notation 11ii j is arranged between the evaporation source 1 and the drum 4. ing.

Therefore, of the vapor emitted from the evaporation source 1, only the vertical component of the vapor that has passed through the slit 7 is incident on the surface of the base film 2 on which it travels, creating a 6〉 curved reservoir. There is.

[Problems with conventional technology]

However, there are several problems with such base soil traveling means. First of all, the deposition rate of the magnetic film is slow and the productivity is low.

This is because only a small portion of the vapor that passes through the narrow slit 7 of the generated magnetism enters the base soil 2 and damages the magnetic film. This is because the vapor other than this is incident on the surface of the base film 2 through 1 (11) and does not contribute to forming the magnetic film.Secondly, the mask 6
There is a certain degree of variation in the angle of incidence of steam regulated by the angle of incidence, and there is a limit to its accuracy. This is slit 7
has a finite width, the incident angle regulated by this is also a.
This is because there is a range in which it becomes thermal.

Thirdly, stress is generated in the base film 2 attached to the 5yen↑6J plane, which affects the magnetic film to be produced by at least 1°. ■1j et al., base film 2 on drum 4
If the film 2 is placed in close contact with the surface of In a film with a small elastic modulus, irregular stress may occur due to the tension during vapor deposition.

[Purpose of the invention]

The present invention has been made to solve the above-mentioned conventional problems related to the base film traveling means, and this configuration will be described in detail below.

[I existing requirements of the invention]

In the running force method according to the present invention, a Hell H4 running along a predetermined curve j1; let In the same 11.1, the same film 12
While feeding the heald 14 at a speed equal to that of the heald 14, the heald 14 is brought into close contact with the concave side of the heald 14, and in this tight state, the base film 12 is moved along the above curve. This is the way to drive.

[Embodiments of the invention]

This configuration will be explained in more detail with reference to the embodiments shown in FIGS. 2 and 3. FIG. ing. The illustrated heald 14 is made of a flexible heald such as a stainless steel heald and is closed in a loop shape to form a so-called non-1γill·i;1 heald. In this case, it is desirable that the surface of the heald 14 be as small as 1% of the ground plane. This is then wound around drive rollers 18 and 19 and run along an arc of a predetermined radius. As shown.

After passing through one drive roller 18, this Hell i-14 travels along the circular arc, and the other drive roller 1J-Ra 19
After passing through, it reverses and now passes through the outside of the above circular arc and returns to the drive roller 18 (it has ¥-1i'3. This traveling path is designed so as to sandwich both side edges of the helt 14. It can be formed by a holding guide (not shown) or the like.

After the base film 12 is unwound from the five unwinder rolls 13, the drive roller 18 and the charging roller 20
The heald 14 is sandwiched therebetween, is charged here, and at the same time is fed at a speed equal to the traveling speed of the heald 14. Therefore, this base film 12 is brought into close contact with the concave side of the heald 14 due to the electrostatic charge, and in this state, the heald 14
It is also made to run along the upper arc. Then, when it reaches the other drive roller 19, it is sandwiched between the same roller 19 and the static eliminating roller 21, where the static electricity is removed.
After leaving the roller 14, it is wound up on a winder roll 15.

In the illustrated vapor deposition apparatus, the evaporation source 11 is arranged at the center of the circular arc in order to produce a magnetic film on the surface of the base film 12 using such a traveling means. Therefore, all of the vapor of the magnetic material emitted from the evaporation source 11 enters perpendicularly at each position on the surface of the base film 2. Therefore.

A magnetic film consisting only of vertical components can be produced, and its orientation is improved. At the same time, most of the vapor emitted from the evaporation source 11 can be made to enter the base film 12, and the film formation rate can also be improved. do. In addition, base film 1
2 is in close contact with the heald 14 and runs together with it, so no tension is applied to the heald 12 and no stress is generated.

Note that such a traveling means can also be applied to a magnetic film manufacturing apparatus using oblique vapor deposition by changing the shape of the curved surface on which the helmet 14 travels. That is, the bell 1-14 is run along a curve that always intersects the line lI'r at a constant angle, that is, ]ogr=aθ (where a is a constant), and By arranging the evaporation source 11 at the above point (r=0), the vapor emitted from the evaporation source 11 can be made to be incident at each position on the surface of the base film 12 at a constant angle. .

Next, FIG. 3 shows a method according to the present invention applied to amorphous silicon (a
-5i) An example of application to a device that explodes N (plasma CVD device) is shown. This device has 1O-
Glow discharge is generated between a pair of electrodes in a silane gas (SiH4) atmosphere of approximately 1 Torr, and a base film I2 having fQ properties such as stainless steel is passed through the plasma during this time, and an amorphous silicon layer is formed on the surface of the base film I2. This is to create a.

In this embodiment, the bell eye 4 is used as one electrode.

On the other hand, the other electrode 22 is placed on the inner side thereof, and the center of the electrode 22 is placed on the center of the circular arc along which the belt 14 runs. Then, at least either the bell 4 or the base film 12 is magnetized.
The concave side of the vehicle is densely moved. In this case, the base film 12 is in close contact with the bell eye 4 and travels together with it, making it possible to feed the heald 14. Base film 12
and the electrode 22 are kept in a constant positional relationship with respect to the lightning.

In addition, in the production of solar cells, ζ is reduced by impurity control.
In addition to producing the amorphous silicon layer in p, i, n7I or in the reverse order, the vacuum M ;rl'r of the transparent conductor or metal material is also required for electrode production.

In this case, by combining a plurality of fI devices according to the present invention and sequentially connecting them, a series of steps can be performed continuously.

〔Effect of the invention〕

As explained above, in the present invention, since the base film is run along the concave side of the bell, for example,
In a vacuum evaporation apparatus for producing magnetic films, there is no longer a need to regulate the incident angle of vapor with a mask as in the past.

Therefore, it is possible to improve the film forming rate and at the same time to inject vapor having a precise incident angle component, thereby improving productivity and orientation of the magnetic film.

In addition, in a plasma CVD apparatus for manufacturing solar cells, it is possible to carry out regular feeding, and to maintain an accurate positional relationship between the base film and the electrode. Furthermore, since the base film is in close contact with the surface of the belt and runs together with it, the belt can be run without stress being applied to the film.

[Brief explanation of drawings]

FIG. 1 is an explanatory view of a conventional base film without showing the running elements, and FIGS. 2 and 2 are explanatory views showing various embodiments of the present invention. 12- Base Film 14- Held Patent Applicant Taiyo Yuden Co., Ltd. Agent Patent Attorney Kazuyoshi Hojo] 3- Nairi Mi 11 Stop Z: (Method) 1980 4
May 5th 1, Incident Asu1ζ 11r+, I'1158 Il:4! fj'l petition no. 238
259 No. 2, Title of the invention 1. Method of running a film 3. +1iil2 Lf Kushi (Section with 'l (Related Patent 11, address: -1-9'F, Taito-ku, Tokyo, 2-12, Name: Q'yama) Inuyo Seriden Co., Ltd. 4, agent

Claims (1)

[Claims] While applying an electromagnetic attraction force to the base film and the base film running along a predetermined curve, the same is applied while applying an electromagnetic attraction force to the base film at a speed equal to the running speed of the belt. A running force method for a base film, characterized in that a film J. is brought into close contact with the concave side of a heald, and the film is run along the above-mentioned curve in the close contact state.