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JPS60124852U - electron beam equipment - Google Patents

electron beam equipment

Info

Publication number
JPS60124852U
JPS60124852U JP1257584U JP1257584U JPS60124852U JP S60124852 U JPS60124852 U JP S60124852U JP 1257584 U JP1257584 U JP 1257584U JP 1257584 U JP1257584 U JP 1257584U JP S60124852 U JPS60124852 U JP S60124852U
Authority
JP
Japan
Prior art keywords
electron beam
sample
scanning
beam equipment
converging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1257584U
Other languages
Japanese (ja)
Other versions
JPH024441Y2 (en
Inventor
生江 隆男
宏 島田
Original Assignee
日本電子株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日本電子株式会社 filed Critical 日本電子株式会社
Priority to JP1257584U priority Critical patent/JPS60124852U/en
Publication of JPS60124852U publication Critical patent/JPS60124852U/en
Application granted granted Critical
Publication of JPH024441Y2 publication Critical patent/JPH024441Y2/ja
Granted legal-status Critical Current

Links

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Abstract] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の一実施例を示した走査電子顕微鏡の概
略図、第2図はメ多ルアノードの−一実施例を示したも
のである。一 1:電子銃、2:電子凱7411対物レンズ、6−:試
料、7:マイクロ,チャンネルプレート、8a:、第1
電圧源、8゛b:第2電甲源、9:反イッチ、10:メ
タルアノード、12:隼算回路、1,3:陰極線管。−
FIG. 1 is a schematic diagram of a scanning electron microscope showing an embodiment of the present invention, and FIG. 2 shows an embodiment of a metal anode. 11: Electron gun, 2: Electron Kai 7411 objective lens, 6-: Sample, 7: Micro, channel plate, 8a: First
Voltage source, 8゛b: second voltage source, 9: anti-switch, 10: metal anode, 12: calculation circuit, 1, 3: cathode ray tube. −

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 電子線発生手段、該手段からの電子線を試料上に収束す
る手段、該収束した電子線で該試料上をX方向及びY1
方向に走査させ1る手段、該走査によって試料から発生
する電子を轡幅し、X方向及びY方向の各走査方向に夫
々2分割されたメタル部に検出させる様に成しhマイク
ロチャンネルプレート、該プレートからの検出傭号に基
づいた画像を表示する手段かう成る電子線装置。
an electron beam generating means, a means for converging the electron beam from the means onto the sample, and a means for converging the electron beam from the means on the sample;
a means for scanning in one direction; a microchannel plate configured to cross the electrons generated from the sample by the scanning and detect them in metal parts divided into two in each of the scanning directions of the X direction and the Y direction; An electron beam device comprising means for displaying an image based on the detected signature from the plate.
JP1257584U 1984-02-01 1984-02-01 electron beam equipment Granted JPS60124852U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1257584U JPS60124852U (en) 1984-02-01 1984-02-01 electron beam equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1257584U JPS60124852U (en) 1984-02-01 1984-02-01 electron beam equipment

Publications (2)

Publication Number Publication Date
JPS60124852U true JPS60124852U (en) 1985-08-22
JPH024441Y2 JPH024441Y2 (en) 1990-02-01

Family

ID=30495768

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1257584U Granted JPS60124852U (en) 1984-02-01 1984-02-01 electron beam equipment

Country Status (1)

Country Link
JP (1) JPS60124852U (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62184752A (en) * 1986-02-07 1987-08-13 Jeol Ltd Charged particle beam length meter
JPS62234859A (en) * 1986-03-24 1987-10-15 ザ ウエルデイング インステイテユ−ト Charged particle collector assembly
JPH01143127A (en) * 1987-11-27 1989-06-05 Hitachi Ltd Surface shape measuring method by scanning electron microscope
JPH0266842A (en) * 1988-08-31 1990-03-06 Jeol Ltd Power source device for charged particle detector
JP2002141015A (en) * 2000-10-13 2002-05-17 Applied Materials Inc Substrate inspection device and inspection method of the same
JP2014150002A (en) * 2013-02-01 2014-08-21 Horon:Kk Noise reduction electron beam device, and electron beam noise reduction method

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62184752A (en) * 1986-02-07 1987-08-13 Jeol Ltd Charged particle beam length meter
JPS62234859A (en) * 1986-03-24 1987-10-15 ザ ウエルデイング インステイテユ−ト Charged particle collector assembly
JPH01143127A (en) * 1987-11-27 1989-06-05 Hitachi Ltd Surface shape measuring method by scanning electron microscope
JPH0266842A (en) * 1988-08-31 1990-03-06 Jeol Ltd Power source device for charged particle detector
JP2002141015A (en) * 2000-10-13 2002-05-17 Applied Materials Inc Substrate inspection device and inspection method of the same
JP2014150002A (en) * 2013-02-01 2014-08-21 Horon:Kk Noise reduction electron beam device, and electron beam noise reduction method

Also Published As

Publication number Publication date
JPH024441Y2 (en) 1990-02-01

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