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JPS60118814A - Vertical illuminating type microscope device - Google Patents

Vertical illuminating type microscope device

Info

Publication number
JPS60118814A
JPS60118814A JP22634383A JP22634383A JPS60118814A JP S60118814 A JPS60118814 A JP S60118814A JP 22634383 A JP22634383 A JP 22634383A JP 22634383 A JP22634383 A JP 22634383A JP S60118814 A JPS60118814 A JP S60118814A
Authority
JP
Japan
Prior art keywords
light
invisible
shielding plate
optical system
objective lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22634383A
Other languages
Japanese (ja)
Inventor
Yasushi Oki
裕史 大木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Nippon Kogaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp, Nippon Kogaku KK filed Critical Nikon Corp
Priority to JP22634383A priority Critical patent/JPS60118814A/en
Publication of JPS60118814A publication Critical patent/JPS60118814A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/24Base structure
    • G02B21/241Devices for focusing
    • G02B21/245Devices for focusing using auxiliary sources, detectors
    • G02B21/247Differential detectors
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00Microscopes
    • G02B21/06Means for illuminating specimens
    • G02B21/08Condensers
    • G02B21/082Condensers for incident illumination only

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Automatic Focus Adjustment (AREA)
  • Microscoopes, Condenser (AREA)

Abstract

PURPOSE:To detect a focus by an invisible light with simple constitution, by constituting the titled device so that an image of a slit-shaped opening part on an invisible light shielding plate is projected onto the surface of an object, and its image is formed on a two-divided photodetecting member by its reflected light. CONSTITUTION:The image of a slit-shaped opening part on the first invisible area light shielding plate P1 is projected onto an object surface 8 by infrared rays as an invisible light emitted from a light source 1 as a passing area of the invisible light is shown by oblique lines. Its reflected light passes through the second invisible area light shielding plate P2 which has a transparent area and an opaque area against the invisible light and whose whole surface is transparent, and forms the image of a slit-shaped opening part, on a two-divided photodetecting member 15. Subsequently, output signals of each photodetector 15b, 15c of the two-divided photodetecting member 15 are compared, and the focus is detected. As a result, the stage of which the object 8 is placed is moved in the optical axis direction, a focused state is obtained automatically, and an object observation by a visible light is executed without a trouble.

Description

【発明の詳細な説明】 (発明の技術分野) 本発明は、落射照明型顕微鏡装置、特にそのための焦点
検出装置に関する。
DETAILED DESCRIPTION OF THE INVENTION (Technical Field of the Invention) The present invention relates to an epi-illumination type microscope apparatus, and particularly to a focus detection apparatus therefor.

(発明の背景) 従来、落射照明型顕微鏡に用いられる焦点検出装置とし
て、例えば、米国特許第3721827号明細害に開示
された如く、不可視光(赤外光)を用いて焦点検出を行
う装置が知られている。この装置によれば、可視域観察
に支障を与えることなく焦点検出を行うことが可能であ
る。しかしながら、焦点検出のために観察用とは別の光
源が必要であり、又は観察用照明光源を焦点検出用光源
として共用する場合には焦点検出用の投影系を観察光学
系から分岐して形成し再び照明光学系に合成する必要が
あり、いずれの場合にも複雑な構成にならざるを得なか
った。
(Background of the Invention) Conventionally, as a focus detection device used in an epi-illuminated microscope, there is a device that performs focus detection using invisible light (infrared light), as disclosed in US Pat. No. 3,721,827, for example. Are known. According to this device, it is possible to perform focus detection without interfering with visible range observation. However, if a light source separate from that for observation is required for focus detection, or if the illumination light source for observation is shared as a light source for focus detection, the projection system for focus detection is formed by branching off from the observation optical system. Then, it is necessary to synthesize the light into the illumination optical system again, and in either case, the configuration has to be complicated.

(発明の目的) 本発明の目的は、従来の如く特別な光源を必要とせず、
また、照明光学系の光路を分岐する必要もな(、簡単な
構成で不可視光による焦点検出が可能な落射照明型頭@
鏡装置を提供することにある。
(Object of the invention) The object of the present invention is to eliminate the need for a special light source as in the past;
In addition, there is no need to branch the optical path of the illumination optical system.
The purpose of this invention is to provide a mirror device.

(発明の概要) 本発明による落射照明型un鏡装置は、半透過鏡を介し
て物体面へ照明光を供給するための光源を有する落射照
明光学系と、該半透過鏡を介して該物体の像を観察する
ための対物レンズを有する観察光学系とを持つ落射照明
型顕微鏡において、該落射照明光学系中の前記物体面と
共役な位置即ち基準物体面と常に共役位置に配置される
視野絞り位置又は視野絞りと共役な位置 に、不可視光
に対してスリット状の開口部を有し可視光に対して全面
透明な第1不可視域遮光板を設け、該観察光学系中の前
記半透過鏡より像側の光路中における前記対物レンズの
瞳位置近傍又は該対物レンズの瞳位置とばぼ共役な位置
、若しくは該落射照明光学系中の前記半透過鏡より光源
側の光路中におりJる011記対物レンズの瞳位置近傍
又は該対物レンズの瞳位置とほぼ共役な位置に、不可視
光に対して所定の境界線の一方の側が透明で他方の側が
不透明で1IJ8+!光に対して全面透明な第2不可視
域遮光板を設け、前記第1不可視域遮光板上の不可視光
に幻するスリット状開口部の長手方向と前記第2不I1
.1視JI3i遮光板上の不可視光に対する境界線とを
光路」二において平行に配置し、さらに、前記観察光学
系のり・1物レンズによる結像光束から不可視光を抽出
する光学系を設け、該不可視光抽出光学系の結像面上に
おりる不可視光の位置を検出するだめの受光部組を設り
たものである。
(Summary of the Invention) An epi-illumination type UN mirror device according to the present invention includes an epi-illumination optical system having a light source for supplying illumination light to an object surface via a semi-transmissive mirror, and an epi-illumination optical system that supplies illumination light to an object surface via a semi-transmissive mirror. In an epi-illumination microscope having an observation optical system having an objective lens for observing an image of the object, a field of view always arranged at a position conjugate to the object plane in the epi-illumination optical system, that is, a position conjugate to the reference object plane. A first invisible-range light-shielding plate that has a slit-shaped opening for invisible light and is completely transparent for visible light is provided at the aperture position or a position conjugate with the field stop, and the semi-transparent light in the observation optical system is provided. Near the pupil position of the objective lens in the optical path on the image side of the mirror or at a position substantially conjugate with the pupil position of the objective lens, or in the optical path on the light source side of the semi-transparent mirror in the epi-illumination optical system. 011 Near the pupil position of the objective lens or at a position almost conjugate with the pupil position of the objective lens, one side of a predetermined boundary line is transparent to invisible light and the other side is opaque, and 1IJ8+! A second invisible-area light-shielding plate completely transparent to light is provided, and the longitudinal direction of the slit-shaped opening that appears to the invisible light on the first invisible-area light-shielding plate and the second invisible light-shielding plate are provided.
.. 1. A boundary line for invisible light on the JI3i light shielding plate is arranged parallel to the optical path 2, and an optical system is further provided to extract invisible light from the imaging light beam formed by the observation optical system glue and 1-object lens. A light receiving unit set is provided to detect the position of invisible light falling on the imaging plane of the invisible light extraction optical system.

(実施例) 以下、本発明を実施例に基づいて説明する。(Example) Hereinafter, the present invention will be explained based on examples.

第1図は、本発明による落射照明型顕微鏡装置の第1実
施例の概略構成図である。照明光源(1)からの照明光
は集光レンズ(2)によって開口絞り(3)の位置に集
光される。そして、第1リレーレンズ(4)、第2リレ
ーレンズ(5)及び第1半透過鏡(6)を介して対物レ
ンズく7)へ導かれ、物体面(8)の同軸落射照明を行
う。物体面く8)で反射された光束は、対物レンズ(7
)の収斂作用を受け、第1半透過鏡(6)及び第2半透
過鏡(11)を透過して像面(12)に集光され、ここ
に物体の像が形成される。像面(12)上の物体像は接
眼レンズ(13)により拡大観察される。ここで、第1
リレーレンズ(4〉と第2リレーレンズ(5)との間に
、視野絞り(9)が配置され、この視野絞りは第2リレ
ーレンズ(5)及び対物レンズ(7)に関して、基準物
体面と共役である。また、開口絞り(3)は第1及び第
2リレーレンズ(4・5)に関して、対物レンズ(7)
の瞳位置(10)と共役である。第1図中には、基準物
体面(8)との共役関係を表す光線を実線で、また対物
レンズの瞳との共役関係を表す光線を点線でそれぞれ示
した。
FIG. 1 is a schematic diagram of a first embodiment of an epi-illumination type microscope apparatus according to the present invention. Illumination light from an illumination light source (1) is focused by a condenser lens (2) at the position of an aperture stop (3). The light is then guided to the objective lens 7) via the first relay lens (4), the second relay lens (5), and the first semi-transmissive mirror (6), and performs coaxial epi-illumination of the object surface (8). The light beam reflected by the object surface (8) is reflected by the objective lens (7).
), the light passes through the first semi-transmitting mirror (6) and the second semi-transmitting mirror (11) and is focused on the image plane (12), where an image of the object is formed. The object image on the image plane (12) is magnified and observed by an eyepiece (13). Here, the first
A field stop (9) is arranged between the relay lens (4) and the second relay lens (5), and this field stop is aligned with the reference object plane with respect to the second relay lens (5) and the objective lens (7). The aperture stop (3) is conjugate with the objective lens (7) with respect to the first and second relay lenses (4, 5).
is conjugate with the pupil position (10) of In FIG. 1, light rays representing a conjugate relationship with the reference object plane (8) are shown by solid lines, and light rays representing a conjugate relationship with the pupil of the objective lens are shown by dotted lines.

そして、視野絞り(9)の位置Gこは、第2図の平面図
に示す如く、不可視光に対してスリット状の開11部d
を光軸と交わる中心位置に有し可視光に苅し゛(は全面
透明な第工不I]J視城遮光板P1が配置され、第1半
透過鎮(6)と第2半透過鏡(11)との間には、第3
図の平面図に示す如く、不可視光に対して境界線すを境
界とする透明領域Cと不透明領域dとを有し、可視光に
対しては全面透明な第2不可視域遮光板P2が配置され
ている。
As shown in the plan view of FIG.
A light-shielding plate P1 is placed at the central position intersecting the optical axis and is transparent to visible light. 11) There is a third
As shown in the plan view of the figure, a second invisible-area light-shielding plate P2 is arranged, which has a transparent area C and an opaque area d bounded by a boundary line S to invisible light, and is entirely transparent to visible light. has been done.

第2半透過鏡(11)で反射された光路中には、不ij
J視光を透過し可視光を遮光するフィルター(14)が
配置され、基準像点位置には2分割受光部44’(15
)が設けられている。2分割受光部材(15)は、第4
図の平面図に示す如く、分割線(15a)を隔てて並列
配置された2つの受光素子(15b・15c)ををして
いる。受光部祠(15)の分割線(15g)は対物レン
ズの光軸りに垂直に交わるように配置されている。また
、第2不可視域遮光板P2の境界線す及び2分割受光部
材(15)の分割線(15a)は、光路上で共に第1不
可視域遮光板Pl上のスリット状開口部aの長手方向と
平行になるように配置されている。
In the optical path reflected by the second semi-transmissive mirror (11), there are
A filter (14) that transmits J visual light and blocks visible light is arranged, and a two-split light receiving section 44' (15) is arranged at the reference image point position.
) is provided. The two-split light receiving member (15) has a fourth
As shown in the plan view of the figure, two light receiving elements (15b and 15c) are arranged in parallel with a dividing line (15a) in between. The dividing line (15g) of the light receiving part shrine (15) is arranged to intersect perpendicularly to the optical axis of the objective lens. Further, the boundary line of the second invisible area light shielding plate P2 and the dividing line (15a) of the two-part light receiving member (15) are both on the optical path in the longitudinal direction of the slit-shaped opening a on the first invisible area light shielding plate Pl. is placed parallel to.

このような構−成において、光源(1)から発する不可
視光としての赤外光により、第1不可視域遮光板Pl上
のスリット状開口部の像が物体面(8〉上に投影され、
物体面(8)からの反射光によりスリット状開口部の像
が2分割受光部材(15)上に形成される。そして、対
物レンズのピントが正確に物体面(8)に合致している
場合には、視野絞り位置に設けられた第1不可視J13
i遮光板Pl上のスリット状開口部の像が物体面(8)
上に鮮明に形成され、従って2分割受光部材(15)上
にもスリット状開口部の像が鮮明に結像される。
In such a configuration, an image of the slit-shaped opening on the first invisible region light shielding plate Pl is projected onto the object plane (8>) by infrared light as invisible light emitted from the light source (1),
An image of the slit-shaped opening is formed on the two-part light-receiving member (15) by the reflected light from the object plane (8). When the focus of the objective lens accurately matches the object plane (8), the first invisible J13 provided at the field stop position
i The image of the slit-shaped opening on the light-shielding plate Pl is the object plane (8)
Therefore, an image of the slit-shaped opening is clearly formed also on the two-part light receiving member (15).

第5図は、物体面(8)のピントが合致している状態に
おける不可視光(赤外光)の様子を示す光路図である。
FIG. 5 is an optical path diagram showing the state of invisible light (infrared light) when the object plane (8) is in focus.

図中の斜線部が不可視光の通過領域を表している。また
、第6図(A)〜(C)は2分割受光部材(15)に達
する不可視光の様子を示す部分拡大光路図である。第6
図(A)は物体面(8)にピントが合致している状態、
第6図(13)及び第6図(C)は、ピントが外れてい
る前ピン、後ピンの状態をそ昨ぞれ表している。第6図
の各図から明らかな如く、ピントが合致している時には
2分割受光部材(15)の両受光素子(15b・15C
)の両方にほぼ均等に不可視光が入射し、ピントが外れ
ている時には、不可視光が一方に偏って入射する。従っ
て、各受光素子(15b・15C)の出力信号を比較す
ることによつ”6焦点検出を行うことができる。尚、第
5図及び第6図にζそれぞれ斜線部で示した不可視光領
域は、理解を容易にするために、視野絞りの中心点を通
る光束のみを示すものであり、実際には物体面(8)及
び2分割受光部!、J’(15)上で、スリット状開l
」部の幅に相当する光束幅を有している。
The shaded area in the figure represents the area through which invisible light passes. Moreover, FIGS. 6(A) to 6(C) are partially enlarged optical path diagrams showing the state of invisible light reaching the two-split light receiving member (15). 6th
Figure (A) shows a state where the object plane (8) is in focus,
FIG. 6(13) and FIG. 6(C) respectively show the state of the front focus and the rear focus being out of focus. As is clear from each figure in FIG. 6, when the focus is on, both light receiving elements (15b and 15C
) Invisible light is incident almost equally on both sides, and when the object is out of focus, invisible light is incident on one side. Therefore, by comparing the output signals of each light-receiving element (15b, 15C), it is possible to perform 6-focus detection.In addition, the invisible light area indicated by diagonal lines in Figs. 5 and 6, respectively. For ease of understanding, only the light flux passing through the center point of the field diaphragm is shown; in reality, a slit-shaped Open l
It has a luminous flux width corresponding to the width of the section.

そし゛色受光部+A(15)上の各受光素子(15b・
15C)からの出力信号は演算手段(16)に人力され
、演算手段(16)は両受光素子からの出力信号の差か
らピントの合否及び前ビン後ビンの判別を行い、ピント
の外れ量に対応する信号を出力する。駆動手段(17)
は演算手段(16)からの信号に基づいて、物体を載置
するステージ(18)を光軸方向に移動させる。そして
、受光素子(15b・15C)の各々に等しい光量が到
達する状態になるまで上記の動作が繰り返えされ、最終
的に正確なピント合焦状態が自動的に得られる。従って
、このような構成の落射照明型顕微鏡装置によれば、可
視光による物体観察には何等支障を生ずることな(、光
源を共用し、また通常の落射照明光学系をそのまま用い
た簡単な構成により、自動焦点検出をおこなううことが
可能である。
Then each light receiving element (15b) on the color light receiving section +A (15)
The output signal from 15C) is inputted to the calculation means (16), which determines whether the focus is in focus or not and the front bin and the rear bin based on the difference between the output signals from both light receiving elements, and determines the amount of out-of-focus. Output the corresponding signal. Drive means (17)
moves the stage (18) on which the object is placed in the optical axis direction based on the signal from the calculation means (16). Then, the above operation is repeated until the same amount of light reaches each of the light receiving elements (15b, 15C), and finally, an accurate focusing state is automatically obtained. Therefore, an epi-illumination type microscope device with such a configuration does not cause any trouble in observing objects using visible light (it has a simple configuration that shares a light source and uses a normal epi-illumination optical system as is). This makes it possible to perform automatic focus detection.

上記第1実施例においては、第2不可視域遮光板P2を
第1半透過鏡(6)と第2半透過鏡(11)との間に配
置したが、この範囲で対物レンズ(7)の瞳位置により
近い位置であることが有効であり、第1半透過鎮(6)
に近い位置であることが望ましい。また、結像光束のう
ちの不可視光を1’) lll’j像さ−Uてリレーす
る場合には、対物レンズの11f!位置(10)と共役
な位置に第2不可視域遮光4及1)2を設りるごとが望
ましい。さらに、第2不可視域遮光扱112の位置は、
第1半透過鏡(6)の結像系側のみならず照明系側に設
LJることも可11ヒであり、第1半透過鏡(6)の光
源(1)側の光路中において、対物レンズ(7)の瞳位
置の近傍又は対物レンズ(7)の瞳位置(10)と共役
な位置に配置することも可能である。第7図は第2不l
JJ視域遮光板1)2を第1半透過鏡(6)と第2リレ
ーレンズ(5)との間に配置した第2実施例の光路図で
あり、第5図と同様に不可視光の通過領域をP1線部で
示した。また第8図は、第2不可視域遮光JMP2を開
1」絞り(3)の位置に配置した第3実施例の光路図で
あり、このように第2不可視域遮光扱1’2が第1不司
′6A域遮光板1〕1よりも光源側に配置され°Cも本
発明ば成立する。ずなわち、不可視光にス(して瞳分割
を行うだめの第2不可視域遮光板P2の位置は、落射照
明を行うための第1半透過鏡(6)の像側でも照明光源
側でも良く、共に“対物レンズの瞳位置に近い位置又は
この瞳位置と共役な位置に配置することが有効である。
In the first embodiment, the second invisible region light shielding plate P2 is arranged between the first semi-transmissive mirror (6) and the second semi-transmissive mirror (11). It is effective to have a position closer to the pupil position, and the first semi-transparent stop (6)
It is desirable that the location be close to . In addition, when relaying the invisible light of the imaging light flux through the 1') lll'j image, the objective lens 11f! It is desirable to provide the second invisible region light shielding 4 and 1) 2 at a position conjugate with position (10). Furthermore, the position of the second invisible area shading treatment 112 is as follows:
It is also possible to install LJ not only on the imaging system side of the first semi-transmissive mirror (6) but also on the illumination system side, and in the optical path of the first semi-transmissive mirror (6) on the light source (1) side. It is also possible to arrange it near the pupil position of the objective lens (7) or at a position conjugate with the pupil position (10) of the objective lens (7). Figure 7 is the second figure.
This is an optical path diagram of the second embodiment in which the JJ viewing area light shielding plate 1) 2 is arranged between the first semi-transmissive mirror (6) and the second relay lens (5), and similarly to FIG. The passage area is indicated by the P1 line. FIG. 8 is an optical path diagram of the third embodiment in which the second invisible region shading JMP2 is opened at the position of the aperture (3) of 1'', and in this way, the second invisible region shading 1'2 is treated as the first According to the present invention, it is arranged closer to the light source than the light-shielding plate 1] 1 in the area 6A. In other words, the position of the second invisible light shielding plate P2, which is used to block invisible light and perform pupil division, can be placed either on the image side of the first semi-transmissive mirror (6) for epi-illumination or on the illumination light source side. It is effective to arrange both at a position close to the pupil position of the objective lens or at a position conjugate with this pupil position.

第9図は本発明による落射照明型顕微鏡装置を暗視野照
明型に応用した第4実施例の概略光路図である。図中、
第1図に示す構成と同一の機能を有する部材には同一の
図番を付した。暗視野照明とするためには、落射照明系
中ムこおいて光軸を含む中心部分の可視光を遮光するた
めの可視域遮光板P3を第1半透過鏡(6)と第2リレ
ーレンズ(5)との間に配置することが必要である。こ
れにより、可視光は対物レンズ(7)の周辺部から物体
(8)を大きな角度で照明し、物体(8)からの正反射
光は対物レンズ(7)に入射することなく、物体面での
散乱(回折)光のみが対物レンズ(7)に入射して結像
に寄与し良好な暗視野照明がなされる。ここで、不可視
光については可視域遮光板P3は同等作用せず、前記の
実施例と全く同様に自動焦点検出がなされ得る。この場
合にも、照明系は可視域遮光板P3を用いれば通常の暗
視野照明光学系と光源を共用でき、同等光路を分岐さ・
Uる必要なく簡単な構成によって自動焦点検出が可能で
ある。また、この場合にも、第2不可視域遮光扱112
の位置は第9図に示した如く第1半透過鏡(に)の像側
に限らず1.第7図又は第8図のように第1半透過鏡(
6)の光源側であっても良いことは、−1・うまでもな
い。
FIG. 9 is a schematic optical path diagram of a fourth embodiment in which the epi-illumination type microscope apparatus according to the present invention is applied to a dark-field illumination type. In the figure,
Components having the same functions as those shown in FIG. 1 are given the same reference numbers. In order to achieve dark field illumination, a visible range light shielding plate P3 for blocking visible light in the central part including the optical axis is installed in the epi-illumination system by using a first semi-transmissive mirror (6) and a second relay lens. (5). As a result, the visible light illuminates the object (8) from the periphery of the objective lens (7) at a large angle, and the specularly reflected light from the object (8) does not enter the objective lens (7) and illuminates the object (8) at the object surface. Only the scattered (diffraction) light enters the objective lens (7) and contributes to image formation, resulting in good dark field illumination. Here, the visible light shielding plate P3 does not have the same effect on invisible light, and automatic focus detection can be performed in exactly the same manner as in the above embodiment. In this case as well, the illumination system can share the light source with a normal dark-field illumination optical system by using the visible light shielding plate P3, and the equivalent optical path can be branched.
Automatic focus detection is possible with a simple configuration without the need for any maintenance. Also in this case, the second invisible region light blocking treatment 112
The position of 1. is not limited to the image side of the first semi-transmissive mirror as shown in FIG. As shown in Figure 7 or 8, the first semi-transparent mirror (
6) It goes without saying that the light source side may be -1.

尚、上記各実施例において、不可視光に対して実質的に
瞳分割を行うための第2不可視域遮光板1)2上の境界
線すは、必ずしも光路の中央部即ぢ光軸と交わる位置に
ある必要はなく、不可視光が軸外の領域を通過するよう
に、例えば第10図の平面図に示す如く、第2不可視域
遮光板P2上にて不透明領域dが半分以上を占めるよう
に構成すれば良い。このような第2不可視域遮光IEt
P2の構成しよ、この不uJ視域遮光板を対物レンズの
瞳位置又は瞳と共役な位置に正確には配置できない場合
に有効である。また、上記の図示した実施例の構成では
、第1半透過鏡(6)の反射により落射照明を行い、こ
れを透過する光路上に観察系を設けたが、逆の構成もu
J能である。第2半透過鏡(11)によって不可視光を
抽出する不可視光抽出光学系も、第2半透過11! (
11)による反射側の光路のみならず、透過側の光路上
に設けることも可能である。
In each of the above embodiments, the boundary line on the second invisible area light shielding plate 1) 2 for substantially performing pupil division for invisible light is not necessarily located at the center of the optical path, or at a position where it intersects with the optical axis. For example, as shown in the plan view of FIG. 10, the opaque area d occupies more than half of the second invisible area light shielding plate P2 so that the invisible light passes through the off-axis area. Just configure it. Such a second invisible region shading IEt
The configuration P2 is effective when this UJ viewing area light shielding plate cannot be placed accurately at the pupil position of the objective lens or at a position conjugate with the pupil. In addition, in the configuration of the embodiment illustrated above, epi-illumination is performed by reflection from the first semi-transmissive mirror (6), and an observation system is provided on the optical path passing through this, but the reverse configuration is also possible.
It is J-Noh. The invisible light extraction optical system that extracts invisible light using the second semi-transmissive mirror (11) also includes the second semi-transmissive mirror (11)! (
11) can be provided not only on the optical path on the reflection side but also on the optical path on the transmission side.

さらに、不可視光抽出光学系を形成する第2半透過1 
(11)とフィルター(14)とを1個のダイクロイッ
クミラーで置換することも可能である。
Furthermore, a second semi-transparent 1 forming an invisible light extraction optical system
It is also possible to replace (11) and filter (14) with one dichroic mirror.

すなわち、第1図の構成において、第2半通過鏡(11
)の代わりに不可視光(例えば赤外光)を反射し可視光
を透過するダイクロイックミラー又はグイクロイックプ
リズムを設ければ、フィルター(14)を除くことがで
き部材の数が少なくなりより簡単な構成とすることがで
きる。他方、上記の実施例ではいずれも2分割受光部材
を用いたが、この代わりに所謂イメージセンサを用いる
こともできる。この場合には、多数の受光素子エレメン
トから成るイメージセンサ上の任意の位置で実質的に2
分割することができるので、合焦時のスリット状開口部
の像はセンサー上のどの位置にあってもよく、センサー
の位置合わせ調整を比較的容易に行うことが可能である
That is, in the configuration shown in FIG.
) If a dichroic mirror or a gicchroic prism that reflects invisible light (e.g. infrared light) and transmits visible light is provided instead of the filter (14), the number of components will be reduced and it will be simpler. It can be configured as follows. On the other hand, in each of the above embodiments, a two-split light receiving member is used, but a so-called image sensor may be used instead. In this case, substantially two
Since it can be divided, the image of the slit-shaped opening can be located at any position on the sensor during focusing, making it possible to adjust the sensor position relatively easily.

(発明の効果) 以上のごとく本発明の落射照明型顕微鏡装置によれば、
従来の如く特別な光源を必要と廿ず、また、照明光学系
の光路を分岐する必要もなく、簡単な構成でしかも通常
の可視光による物体観察には同等支障を生ずることなく
不可視光による焦点検出がI!Bif3である。
(Effects of the Invention) As described above, according to the epi-illumination type microscope device of the present invention,
Unlike conventional methods, it does not require a special light source or branch the optical path of the illumination optical system, has a simple configuration, and can be used as a focal point using invisible light without causing the same problems as normal object observation using visible light. Detection is I! It is Bif3.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明による落射照明型顕微鏡装置の第1実施
例を示す概略構成図、第2図は第1不可視域遮光板の平
面図、第3図は第2不可視域遮光板の平面図、第4図は
2分割受光部祠の平面図、第5図は第1実施例における
不[可視光の通過領域を小ず光1−8図、第6図(A)
〜(C)は2分割受光部Hに達する不可視光の様子を示
す部分光路拡大図、第7し1は第2実施例におりる不可
視光の通過領域余水す光路図、第8図は第3実施例にお
番ノる不−1jJ視尤の通過領域を示す光路図、第9図
は本発明を1l(H視野照明による落射照明型顕微鏡に
応用した第4実施例における不可視光の通過領域を示す
光路図、第10図は第2不可視域遮光板の他の例を示す
平面図である。 (主要部分の符号の説明) 1・・・光源 6,7・・・半透過鏡 7・・・対物レンズ 8・・・物体 9・・・視野絞り 10・・・対物レンズの瞳位置15
・・・2分割受光素子 Pl・・・第1不可視域遮光板 a・・・スリット状開口部 P2・・・第2不可視域遮光板 b・・・境界線 出願人 日本光学工業株式会社 代理人 渡辺隆男
FIG. 1 is a schematic configuration diagram showing a first embodiment of an epi-illumination type microscope apparatus according to the present invention, FIG. 2 is a plan view of a first invisible area light shielding plate, and FIG. 3 is a plan view of a second invisible area light shielding plate. , Fig. 4 is a plan view of the two-divided light-receiving part shrine, Fig. 5 is a plan view of the invisible light passage area in the first embodiment, Fig.
- (C) are partial optical path enlarged views showing the state of invisible light reaching the two-split light-receiving section H, No. 7 and 1 are optical path diagrams showing the passage area of invisible light in the second embodiment, and FIG. FIG. 9 is an optical path diagram showing the passage area of the invisible light beam in the third embodiment, and FIG. The optical path diagram showing the passage area and FIG. 10 are plan views showing other examples of the second invisible area light shielding plate. (Explanation of symbols of main parts) 1... Light source 6, 7... Semi-transparent mirror 7...Objective lens 8...Object 9...Field diaphragm 10...Pupillary position of objective lens 15
...Two-divided light-receiving element Pl...First invisible area light shielding plate a...Slit-shaped opening P2...Second invisible area light shielding plate b...Boundary line Applicant Nippon Kogaku Kogyo Co., Ltd. Agent Takao Watanabe

Claims (1)

【特許請求の範囲】[Claims] 半透過鏡を介して物体面へ照明光を供給するための光源
を有する落射照明光学系と、該半透過鏡を介して該物体
の像を観察するための対物レンズを有する観察光学系と
を持つ落射照明型顕微鏡において、該落射照明光学系中
の前記物体面と共役な位置に、不可視光に対してスリッ
ト状の開口部を有し可視光に対して全面透明な第1不可
視域遮光板を設け、該観察光学系中の前記半透過鏡より
像側の光路中に兆りる前記対物レンズの瞳位置近傍又は
該対物レンズの瞳位置とほぼ共役な位置、若しくは該落
射照明光学系中の前記半透過鏡より光源側の光路中にお
ける前記対物レンズの瞳位置近傍又は該対物レンズの瞳
位置とほぼ共役な位置に、不可視光に対しては所定の境
界線の一方の側が透明で他方の側が不透明で可視光に対
しては全面透明な第2不可視域遮光板を設け、前記第1
不isJ視域遮光板上の不可視光に対するスリット状開
口部の1;子方向と前記第2不可視域遮光板上の不可視
光にり・]する境界線とを光路上において平行に配置し
、さらに、前記観察光学系の対物レンズによる結像光束
から不可視光を抽出する光学系を設け、該不可視光抽出
光学系の結像面上における不可視光の位置を検出するた
めの受光部材を設けたことをM7徴とする落射照明型顕
微鏡装置。
an epi-illumination optical system having a light source for supplying illumination light to an object surface via a semi-transmissive mirror; and an observation optical system having an objective lens for observing an image of the object via the semi-transmissive mirror. In an epi-illumination type microscope, the epi-illumination optical system includes a first invisible-area light-shielding plate having a slit-shaped opening for invisible light at a position conjugate with the object plane and completely transparent for visible light. near the pupil position of the objective lens in the optical path on the image side of the semi-transmissive mirror in the observation optical system, or at a position substantially conjugate with the pupil position of the objective lens, or in the epi-illumination optical system. At a position near the pupil position of the objective lens or at a position substantially conjugate to the pupil position of the objective lens in the optical path on the light source side of the semi-transparent mirror, one side of a predetermined boundary line is transparent and the other side is transparent to invisible light. A second invisible area light shielding plate is provided which is opaque on its side and entirely transparent to visible light;
The first direction of the slit-shaped opening for invisible light on the invisible light shielding plate and the boundary line for the invisible light on the second invisible light shielding plate are arranged in parallel on the optical path, and , an optical system for extracting invisible light from the imaging light beam formed by the objective lens of the observation optical system is provided, and a light receiving member is provided for detecting the position of the invisible light on the imaging surface of the invisible light extraction optical system. Epi-illumination type microscope device with M7 signature.
JP22634383A 1983-11-30 1983-11-30 Vertical illuminating type microscope device Pending JPS60118814A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22634383A JPS60118814A (en) 1983-11-30 1983-11-30 Vertical illuminating type microscope device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22634383A JPS60118814A (en) 1983-11-30 1983-11-30 Vertical illuminating type microscope device

Publications (1)

Publication Number Publication Date
JPS60118814A true JPS60118814A (en) 1985-06-26

Family

ID=16843679

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22634383A Pending JPS60118814A (en) 1983-11-30 1983-11-30 Vertical illuminating type microscope device

Country Status (1)

Country Link
JP (1) JPS60118814A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62164011A (en) * 1986-01-14 1987-07-20 Wakasa Kogaku Kenkyusho:Kk Wavelength difference microscope
US4737022A (en) * 1985-07-31 1988-04-12 Carl-Zeiss-Stiftung Automatic focusing device for reflected light microscopes
JPH04295813A (en) * 1991-03-25 1992-10-20 Sumitomo Metal Ind Ltd Microscope automatic focusing device
US6974938B1 (en) 2000-03-08 2005-12-13 Tibotec Bvba Microscope having a stable autofocusing apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4737022A (en) * 1985-07-31 1988-04-12 Carl-Zeiss-Stiftung Automatic focusing device for reflected light microscopes
JPS62164011A (en) * 1986-01-14 1987-07-20 Wakasa Kogaku Kenkyusho:Kk Wavelength difference microscope
JPH04295813A (en) * 1991-03-25 1992-10-20 Sumitomo Metal Ind Ltd Microscope automatic focusing device
US6974938B1 (en) 2000-03-08 2005-12-13 Tibotec Bvba Microscope having a stable autofocusing apparatus
US7016110B2 (en) 2000-03-08 2006-03-21 Tibotec Bvba Microscope suitable for high-throughput screening having an autofocusing apparatus

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