JPS6010407A - Production of magnetic head - Google Patents
Production of magnetic headInfo
- Publication number
- JPS6010407A JPS6010407A JP11583083A JP11583083A JPS6010407A JP S6010407 A JPS6010407 A JP S6010407A JP 11583083 A JP11583083 A JP 11583083A JP 11583083 A JP11583083 A JP 11583083A JP S6010407 A JPS6010407 A JP S6010407A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- head
- film head
- combined
- elements
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- 239000010409 thin film Substances 0.000 claims abstract description 80
- 239000002131 composite material Substances 0.000 claims abstract description 9
- 238000000034 method Methods 0.000 claims abstract description 9
- 238000001514 detection method Methods 0.000 claims description 14
- 230000000694 effects Effects 0.000 abstract description 3
- 230000001939 inductive effect Effects 0.000 abstract 1
- 230000006698 induction Effects 0.000 description 4
- 239000010408 film Substances 0.000 description 3
- 101100113692 Caenorhabditis elegans clk-2 gene Proteins 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/33—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
- G11B5/39—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
- G11B5/3903—Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3103—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
- G11B5/3166—Testing or indicating in relation thereto, e.g. before the fabrication is completed
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の利用分野〕
本発明は磁気・＼ノドの製造方法に関し、特に磁気誘導
型”Ｍ膜ヘッドと磁気抵抗効果型薄膜ヘッドとを組合わ
せて構成される置台型薄膜磁気ヘッドの製造方法に関す
るものである。[Detailed Description of the Invention] [Field of Application of the Invention] The present invention relates to a method for manufacturing a magnetic/node, and particularly to a stand-type device constructed by combining a magnetic induction type M film head and a magnetoresistive thin film head. The present invention relates to a method of manufacturing a thin film magnetic head.
第１図は従来の磁気ディスク用薄膜ヘッドの斜視図であ
る。この形の薄膜ヘッドの場合には、ギャップ深さく寸
法Ｂ）は図に矢印Ａで示される方向から顕微鏡等を用い
て測定することができる。FIG. 1 is a perspective view of a conventional thin film head for magnetic disks. In the case of this type of thin film head, the gap depth dimension B) can be measured using a microscope or the like from the direction shown by arrow A in the figure.
第２図は複合型薄膜磁気ヘッド（以下、単に「複合型ヘ
ッド」という）の組合わせ前の状況を示す斜視図、第３
図は組合わせ後の状況を示す斜視図である。両図から明
らかな如く、複合型ヘッドの組合わせ工程においては、
薄膜素子を直接具ることができないため、組合わせる薄
膜ヘッドのギャップ深さを高精度に合わせることは困難
であった。Figure 2 is a perspective view showing the state of the composite thin-film magnetic head (hereinafter simply referred to as "compound head") before it is assembled;
The figure is a perspective view showing the situation after combination. As is clear from both figures, in the process of assembling the composite head,
Since the thin film element cannot be directly provided, it has been difficult to match the gap depth of the combined thin film head with high precision.
本発明は上記事情に鑑みてなされたもので、その目的と
するところは、複合型ヘッドの組合わせ工程において、
組合わせる薄膜ヘッドのを高精度に位置合わせすること
を可能にする磁気ヘッドの製造方法を提供することにあ
る。The present invention has been made in view of the above circumstances, and its purpose is to:
It is an object of the present invention to provide a method for manufacturing a magnetic head that enables highly accurate alignment of thin film heads to be combined.
本発明の要点は、磁気誘導型薄膜ヘッドと磁気抵抗効果
型薄膜ヘッドとを組合わせて構成される複合型へ多ドの
製造方法において、前記組合わされる薄膜ヘッドの薄膜
素子の両外側部に前記薄膜素子と実質的に同一の構成を
有する検知パターンを設ける工程と、前記検知パターン
を利用して前記薄膜ヘッドを組合わせる工程とを有する
如く構成した点にある。The gist of the present invention is to provide a method for manufacturing a composite head formed by combining a magneto-inductive thin-film head and a magnetoresistive thin-film head, in which both outer sides of the thin-film element of the combined thin-film head are The present invention is configured to include a step of providing a detection pattern having substantially the same configuration as the thin film element, and a step of combining the thin film head using the detection pattern.
以下、本発明の実施例を図面に基づいて詳細に説明する
。Embodiments of the present invention will be described in detail below with reference to the drawings.
第４図は本発明の一実施例である磁気ヘッドの製造方法
において用いる磁気誘導型薄膜ヘッドの素子部を拡大し
Ｃ示す正面図、第５図はその側面図である。FIG. 4 is an enlarged front view showing an element portion of a magnetic induction type thin film head used in a method of manufacturing a magnetic head according to an embodiment of the present invention, and FIG. 5 is a side view thereof.
本実施例においては、薄膜ヘッドの形成工程ににいて、
該薄膜・＼ノドの素子部に必要な数の薄膜素子群を設（
づるだ番づでなく、該薄膜素子群の両外側部に、前記検
知パターン用として、と記薄膜素Ｉ・と同じ薄１模素−
ｆ−をもう１個ずつ設けている。上記薄膜素子群および
検知パターンを有する薄膜ヘッドは他の薄膜・＼ラドと
組合わされる前に、その両側端面を、前記検知パターン
が該側端面に露出する如く加工される。In this example, in the process of forming a thin film head,
Set up the necessary number of thin film element groups in the element part of the thin film/nod (
Instead of numbering, on both outer sides of the thin film element group, for the detection pattern, there is a thin 1-mole which is the same as the thin film element I.
One more f- is provided. Before the thin film head having the thin film element group and the detection pattern is combined with another thin film/rad, both end faces thereof are processed so that the detection pattern is exposed on the side end faces.
第４図、第５図は上記加工の終了した状態を示すもので
あり、図において、１は薄膜ヘッド、２は薄膜素子、３
は′Ｒ膜素子２から加工された検知パターンを示してい
る。第５図における寸法りは薄膜ヘッド１のギャップ深
さを示すものであり、この状態においては、上記ギャッ
プ深さＤを高精度に測定可能であることは明らかである
。Figures 4 and 5 show the state after the above processing is completed, and in the figures, 1 is a thin film head, 2 is a thin film element, and 3 is a thin film head.
1 shows a detection pattern processed from the 'R film element 2. The dimensions in FIG. 5 indicate the gap depth of the thin film head 1, and it is clear that in this state the gap depth D can be measured with high precision.
第６図は磁気誘導型薄膜ヘッド４と、磁気抵抗型薄膜ヘ
ッド５とを組合わせて複合型ヘッドを構成する状況を示
す側面図である。両薄膜ヘッド４゜５は、前述の如く、
ギャップ深さが測定可能な状態に加工されていることは
言うまでもない。図において、６は薄膜ヘッド４のギャ
ップ深さ基準点を、７は薄膜ヘッド５のギャップ深さ基
準点を示している。また、寸法Ｃは薄膜・＼ラド５のギ
ャップ深さを、寸法りは薄膜ヘッド４のギャップ深さを
示し、寸法Ｅは上記両薄膜ヘッドを組合わせる場合に必
要な相対位置寸法を示している。FIG. 6 is a side view showing a composite head constructed by combining the magnetic induction type thin film head 4 and the magnetoresistive type thin film head 5. Both thin film heads 4.5 are, as described above,
Needless to say, it is processed so that the gap depth can be measured. In the figure, 6 indicates the gap depth reference point of the thin film head 4, and 7 indicates the gap depth reference point of the thin film head 5. In addition, dimension C indicates the gap depth of the thin film/rad 5, dimension indicates the gap depth of the thin film head 4, and dimension E indicates the relative position dimension required when combining both of the above thin film heads. .
本実施例においては、上記両薄膜ヘッド４，５の両側端
面に呪わ４している前記検知パターンを用いて、−」二
記寸法Ｅを必要とされるＪ゛法に高精度に合わせること
が可能である。上記寸法Ｅを高精度に合わせ両薄膜・＼
ラドを互いに移動しないように固定した後に、該組合わ
された両薄膜ヘッドを図に矢印Ｆで示さＪＬる方向から
加工する。加工は両茫膜・＼ラドの内のどちらか一方の
ギャップ深さに注目して行えば良い。何故ならば、上記
寸法Ｅが一定に維持されているため、一方のギャップ深
さが最適」法に達した時点においては、他方のギャップ
深さも最適寸法に達しているからである。In this embodiment, by using the detection patterns formed on both side end surfaces of the thin film heads 4 and 5, it is possible to adjust the dimension E in -'2 to the required J' method with high precision. It is possible. The above dimension E is adjusted to high precision for both thin films.
After fixing the rads so that they do not move relative to each other, both of the combined thin film heads are processed from the direction JL shown by arrow F in the figure. Machining can be carried out by paying attention to the gap depth of either the membranous membrane or the rad. This is because, since the dimension E is kept constant, when one gap depth reaches its optimum value, the other gap depth also reaches its optimum value.
−上述の寸法Ｅは、指定値に対して±１μｍ以下の精度
で自わせることか要求されるため、この調整には、例え
ば、第７図に示す如き装置を用いると良い。第７図は、
組合わせる各薄膜ヘッドの上下、左右にそれぞれ圧電素
子８を配したものである。圧電素子は電圧を印加するこ
とによりその寸法が伸縮するので、互いに相対している
圧電素子の一方に印加する電圧を増加させ他方に印加す
る電圧を減少させることにより、薄膜ヘッドを微小寸法
ずつ移動させて前記必要寸法Ｅを高精度に調整すること
が可能である。- Since the above-mentioned dimension E is required to be adjusted with an accuracy of ±1 μm or less with respect to the specified value, it is preferable to use, for example, a device as shown in FIG. 7 for this adjustment. Figure 7 shows
Piezoelectric elements 8 are arranged above and below, and on the left and right sides of each thin film head to be combined. Piezoelectric elements expand and contract in size when voltage is applied to them, so by increasing the voltage applied to one of the piezoelectric elements facing each other and decreasing the voltage applied to the other, the thin film head can be moved minute by minute. Thus, the required dimension E can be adjusted with high precision.
上記実施例においては、検知パターンとして、薄膜素子
と同一のものを用いる例を示したが、検知パターンはこ
れに限られるものではなく、他の標準パターン的なもの
を用いることも可能であることは言うまでもない。In the above embodiment, an example is shown in which the same detection pattern as the thin film element is used, but the detection pattern is not limited to this, and other standard patterns may also be used. Needless to say.
以上述べた如く、本発明によれば、磁気誘導型覆膜ヘッ
ドと磁気抵抗型薄膜ヘッドとを組合わせて構成される複
合型ヘッドの製造方法において、前記組合わされる薄膜
ヘッドの薄膜素子の両外側部に前記薄膜素子と実質的に
同一の構成を有する検知パターンを設ける工程と、前記
検知パターンを利用して前記薄膜ヘッドを組合わせる工
程とを有する如く構成したので、組合わせる薄膜ヘッド
を高精度に位置合わせすることが可能な磁気ヘッドの製
造方法を実現できるという顕著な効果を奏するものであ
る。As described above, according to the present invention, in a method for manufacturing a composite head configured by combining a magnetic induction type coated film head and a magnetoresistive type thin film head, both thin film elements of the combined thin film head are combined. Since the configuration includes the steps of providing a detection pattern having substantially the same configuration as the thin film element on the outer side, and combining the thin film head using the detection pattern, the thin film head to be combined can be raised. This has the remarkable effect of realizing a method of manufacturing a magnetic head that allows accurate positioning.
第１図は従来の薄膜ヘッドを示す斜視図、第２図は複合
型ヘッドの組合わせ前の状況を示す斜視図、第３図は組
合わせ後の状況を示す斜視図、第４ＵＡは本発明の一実
施例に用いる薄膜ヘッドの正面図、第５図はその側面図
、第６図は複合型ヘッドを構成する状況を示す側面図、
第７図は組合わせ時に用いる位置調整装置の一例を示す
斜視図である。
２：薄膜素子、３：検知パターン、４：磁気誘導型薄膜
ヘッド、５：磁気抵抗効果型薄膜ヘッド、Ｃ，Ｄ ：ギ
ヤノブ深さ・
第 １ 図
第 ２ 図
第 ３ 図
第 ４ 図
第 ５ 図
第 ６ 図
１′
第 ７ 図FIG. 1 is a perspective view showing a conventional thin film head, FIG. 2 is a perspective view showing the state before combination of the composite head, FIG. 3 is a perspective view showing the state after combination, and 4UA is the invention of the present invention. 5 is a front view of a thin film head used in one embodiment, FIG. 5 is a side view thereof, and FIG. 6 is a side view showing a situation in which a composite head is constructed;
FIG. 7 is a perspective view showing an example of a position adjustment device used in combination. 2: Thin film element, 3: Detection pattern, 4: Magneto-inductive thin film head, 5: Magnetoresistive thin film head, C, D: Gear knob depth - Figure 1 Figure 2 Figure 3 Figure 4 Figure 5 Figure 6 Figure 1' Figure 7
Claims (1)
組合わせて構成される複合型薄膜磁気ヘッドの製造方法
において、前記組合わされる薄膜ヘッドの薄膜素子の面
外側部に前記薄膜素子と実質的に同一の構成を有する検
知パターンを設ける工程と、前記検知パターンを利用し
て前記薄膜ヘッドを組合わせる工程とを有することを特
徴とする磁気ヘッドの製造方法。In a method for manufacturing a composite thin film magnetic head configured by combining a magneto-inductive thin film head and a magnetoresistive thin film head, the thin film head to be combined has a thin film element substantially in contact with the thin film element on the outer side of the thin film element of the combined thin film head. 1. A method of manufacturing a magnetic head, comprising the steps of: providing a detection pattern having the same configuration on the magnetic head; and combining the thin film head using the detection pattern.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11583083A JPS6010407A (en) | 1983-06-29 | 1983-06-29 | Production of magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11583083A JPS6010407A (en) | 1983-06-29 | 1983-06-29 | Production of magnetic head |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6010407A true JPS6010407A (en) | 1985-01-19 |
Family
ID=14672169
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11583083A Pending JPS6010407A (en) | 1983-06-29 | 1983-06-29 | Production of magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6010407A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1998039770A1 (en) * | 1997-03-04 | 1998-09-11 | Micrion Corporation | Thin-film magnetic recording head manufacture |
| US6004437A (en) * | 1996-04-19 | 1999-12-21 | Micrion Corporation | Thin-film magnetic recording head manufacturing method |
| US6332962B1 (en) | 1997-06-13 | 2001-12-25 | Micrion Corporation | Thin-film magnetic recording head manufacture using selective imaging |
| WO2002013187A3 (en) * | 2000-08-03 | 2003-02-06 | Storage Technology Corp | Tape head modules having adjacent substrates each provided with write and/or read elements |
-
1983
- 1983-06-29 JP JP11583083A patent/JPS6010407A/en active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6004437A (en) * | 1996-04-19 | 1999-12-21 | Micrion Corporation | Thin-film magnetic recording head manufacturing method |
| US6354438B1 (en) | 1996-04-19 | 2002-03-12 | Micrion Corporation | Focused ion beam apparatus for forming thin-film magnetic recording heads |
| US6579665B2 (en) | 1996-04-19 | 2003-06-17 | Fei Company | Thin-film magnetic recording head manufacture |
| US7045275B2 (en) | 1996-04-19 | 2006-05-16 | Fei Company | Thin-film magnetic recording head manufacture |
| WO1998039770A1 (en) * | 1997-03-04 | 1998-09-11 | Micrion Corporation | Thin-film magnetic recording head manufacture |
| US6332962B1 (en) | 1997-06-13 | 2001-12-25 | Micrion Corporation | Thin-film magnetic recording head manufacture using selective imaging |
| US6824644B2 (en) | 1997-06-13 | 2004-11-30 | Fei Company | Thin-film magnetic recording head manufacture using selective imaging |
| WO2002013187A3 (en) * | 2000-08-03 | 2003-02-06 | Storage Technology Corp | Tape head modules having adjacent substrates each provided with write and/or read elements |
| US6570738B1 (en) | 2000-08-03 | 2003-05-27 | Storage Technology Corporation | Tape head modules having adjacent substrates each provided with write and/or read elements |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH1186251A (en) | Manufacture of magnetic head | |
| JPS6010407A (en) | Production of magnetic head | |
| JP2002026428A (en) | Method of forming photoresist pattern and method of manufacturing magnetoresistive effect thin film magnetic head | |
| JPH02292706A (en) | Manufacture of apparatus using structure of thin film layer | |
| JPH0453012A (en) | Manufacture of thin film magnetic head | |
| JP3465280B2 (en) | Manufacturing method of magnetic sensor | |
| JPH0629821Y2 (en) | Head arm in FDD device | |
| JP2005022086A (en) | Manufacturing method of quartz base plate | |
| JPS6425490A (en) | Manufacture of stress detector | |
| JPS5833616B2 (en) | Rotating magnetic head device | |
| JP2004125734A (en) | Method for manufacturing slit plate of optical rotary encoder | |
| JP2838821B2 (en) | Manufacturing method of magnetic head | |
| JPS60177416A (en) | Production of thin film magnetic head | |
| JPS6276018A (en) | Production of composite type magnetic head | |
| JPS6271313A (en) | Manufacture of piezoelectric vibrator chip | |
| JPH07176013A (en) | Production of magnetic head | |
| JPS6257140A (en) | Pattern board creation method | |
| JPS61120362A (en) | Production of grooved master disk for optical disk | |
| JP2000123309A (en) | Core integrated body, slider member, magnetic head and manufacture thereof | |
| JPS62145525A (en) | Manufacturing method of thin film magnetic head | |
| JPS6055507A (en) | Vaertically magnetized recording head | |
| JPH0130215B2 (en) | ||
| JPS6342327B2 (en) | ||
| JPS63161510A (en) | Composite magnetic head | |
| JPH071386A (en) | Assembling method of round edge assembly |