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JPS5992020A - Non-oxidative heat treatment apparatus - Google Patents

Non-oxidative heat treatment apparatus

Info

Publication number
JPS5992020A
JPS5992020A JP20175182A JP20175182A JPS5992020A JP S5992020 A JPS5992020 A JP S5992020A JP 20175182 A JP20175182 A JP 20175182A JP 20175182 A JP20175182 A JP 20175182A JP S5992020 A JPS5992020 A JP S5992020A
Authority
JP
Japan
Prior art keywords
treated
heat treatment
frequency heating
reductive gas
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20175182A
Other languages
Japanese (ja)
Other versions
JPH0342935B2 (en
Inventor
Masazumi Onishi
昌澄 大西
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyota Motor Corp
Original Assignee
Toyota Motor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyota Motor Corp filed Critical Toyota Motor Corp
Priority to JP20175182A priority Critical patent/JPS5992020A/en
Publication of JPS5992020A publication Critical patent/JPS5992020A/en
Publication of JPH0342935B2 publication Critical patent/JPH0342935B2/ja
Granted legal-status Critical Current

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  • Physical Or Chemical Processes And Apparatus (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)

Abstract

PURPOSE:To reduce the consumption amount of reductive gas and to enable uniform non-oxidative treatment over the whole surface of an object to be treated, by sufficiently cover the surface of the object to be treated with active reductive gas by reducing the internal volume of a treating chamber. CONSTITUTION:In performing non-oxidative heat treatment such as high temp. carburization by using high frequency heating, an object 6 to be treated is hermetically sealed and a high frequency heating coil 2 and a shielding plate 3 made of a non-metallic material are arranged to the side surface of the object 6 to be treated to constitute a treating chamber 5. Reductive gas supplied from the lower part of the treating chamber 5 is blown to the object 6 to be treated from a blow-out port 8 provided to side surface of the object to be treated to treat the same. By this mechanism, because the inner volume of the treating chamber 5 can be reduced and the surface of the object 6 to be treated can be sufficiently covered with active reductive gas, the whole of the object to be treated is uniformly subjected to non-oxidative heat treatment and the amount to be used of the reductive gas required in heat treatment is remarkably reduced.

Description

【発明の詳細な説明】 本発明は無酸化熱処理技術、特に高周波加熱を用いて無
酸化熱処理するための還元性ガスの挿入方法およびその
ための装置1こ関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a non-oxidizing heat treatment technique, particularly to a method of introducing a reducing gas for non-oxidizing heat treatment using high frequency heating, and an apparatus therefor.

従来、高温加熱処理の1つとして、高周波加熱処理を用
いて肢処理材を無酸化熱処理する場合。
Conventionally, limb treatment materials are subjected to non-oxidation heat treatment using high frequency heat treatment as one of the high temperature heat treatments.

第1図のような装置を用いて熱処理していた。従来装置
では、処理室7′が^周波加熱コイル2′から処理室側
壁1′まで100 mm以上離して設置しである。なお
、3′は被処理物、4′は還元性ガス挿入1」。
The heat treatment was carried out using an apparatus as shown in FIG. In the conventional apparatus, the processing chamber 7' is installed with a distance of 100 mm or more from the frequency heating coil 2' to the processing chamber side wall 1'. In addition, 3' is the object to be treated, and 4' is the reducing gas insertion 1.

5′は還元性ガス排出口である。5' is a reducing gas outlet.

ここでは、鋼製の炉体6′が誘尋加熱されないように、
大型の処理室7′を用いて処理室7′円に^周波加熱コ
イル2′および被処理物3′を収容し、窒素ガス等の不
活性ガスあるいは還元性ガスで置換した後、高周波加熱
を行ない所要の条件で熱処理を行なっているが、処理室
7′が大型のため不活性カス等とのカス置換に長時間を
要するのと、不活性カス等ガス消費屋が大で夛)るとい
う欠点がある。
Here, in order to prevent the steel furnace body 6' from being dielectrically heated,
Using a large processing chamber 7', the frequency heating coil 2' and the object to be processed 3' are housed in the processing chamber 7', and after replacing with an inert gas such as nitrogen gas or a reducing gas, high frequency heating is performed. Heat treatment is carried out under the required conditions, but because the processing chamber 7' is large, it takes a long time to replace the scum with inert scum, etc., and the gas consumers such as inert scum are large. There are drawbacks.

またこの処理室7′内で無酸化熱処理を行なう場合、被
処理物3′の全曲にわたって均一な無酸化熱処理を行な
うには、多大な茄元性ガスを挿入しなければ被処理物3
′表面での活性ガスが不充分となり、処理ムラを生ずる
欠点もある。
In addition, when non-oxidizing heat treatment is performed in this processing chamber 7', in order to perform uniform non-oxidizing heat treatment over the entire length of the object 3', it is necessary to insert a large amount of oxidative gas into the object 3'.
'There is also the drawback that there is insufficient active gas on the surface, resulting in uneven processing.

本発明は高周波加熱を用いて無酸化熱処理を行なう場合
において、還元性ガス等のガス消費風を低減させるとと
もに被処理物3′を均一に無酸化熱処理させる熱処理装
置の提供を目的とする。
An object of the present invention is to provide a heat treatment apparatus that reduces the amount of gas consumption such as reducing gas when performing non-oxidation heat treatment using high-frequency heating, and uniformly performs non-oxidation heat treatment on a workpiece 3'.

かかる目的は、高周波加熱を用いて高温浸炭などの無酸
化熱処理を11なう場合において、被処理物を密閉する
とともに、該被処理物側面には高周波コイルおよび非金
属材料を配して処理室を構成し、処理室ド方より挿入す
る還元性ガスを被処理物の測面に設けた吹き出し口から
、被処理物に吹きつけて処理することを特徴とした無酸
化熱処理装置によって達成される。
The purpose of this is to seal the object to be treated and place a high-frequency coil and a non-metallic material on the side of the object when performing non-oxidizing heat treatment such as high-temperature carburizing using high-frequency heating. This is achieved by a non-oxidation heat treatment device, which consists of a non-oxidizing heat treatment device, which is characterized by blowing reducing gas, which is inserted from the inside of the processing chamber, onto the object from an outlet provided on the surface of the object to be processed. .

以ド添(=J図面に基づいて本発明の詳細な説明する。The present invention will now be described in detail based on the accompanying drawings.

第2図は本発明にかかる無酸化熱処理装置の一例を示す
。天井と底面で囲むとともに側面を高周波加熱コイルお
よび非金属材f!4(たとえばセラミック)のガス遮蔽
板3を設は処理室5を空室4から隔絶した2室構造とし
、処理室5内へのみ還元性ガスを挿入している。
FIG. 2 shows an example of the non-oxidation heat treatment apparatus according to the present invention. It is surrounded by the ceiling and bottom, and the sides are covered with high-frequency heating coils and non-metallic materials f! A gas shielding plate 3 of 4 (for example, ceramic) is provided to form a two-chamber structure in which the processing chamber 5 is isolated from the empty chamber 4, and reducing gas is inserted only into the processing chamber 5.

また被処理物6表面を活性な還元性ガスで十分覆い被処
理物6の表面の均一な無酸化処理を行なうために、尚周
波加熱フィル2の内周面のガス穴8から、あるいは被処
理物6近憎に設けたノズル7から、被処理物6表面に〆
6性な還元性ガスを吹きつけながら所要条件で高周波加
熱を行ない、無酸化熱処理を行なうものである。
In addition, in order to sufficiently cover the surface of the object to be treated 6 with active reducing gas and perform a uniform non-oxidation treatment on the surface of the object to be treated 6, the gas hole 8 on the inner circumferential surface of the high frequency heating filter 2 or the A non-oxidizing heat treatment is carried out by performing high frequency heating under required conditions while blowing a reducing gas onto the surface of the object 6 from a nozzle 7 provided near the object 6.

なお処理室5内を2至構造として空室4から隔絶して高
周波加熱コイル2の内向のガス穴8あるいはノズル7か
ら還元性ガスを吹きつけながら。
Note that the inside of the processing chamber 5 is isolated from the empty chamber 4 by having a two-way structure, and reducing gas is blown from the inward gas hole 8 or nozzle 7 of the high-frequency heating coil 2.

無酸化熱処理を行なうため、挿入[」8からのキャリヤ
ガスは従来装置に比べ大幅に低減できる。
Since the non-oxidizing heat treatment is performed, the amount of carrier gas from the insertion point 8 can be significantly reduced compared to conventional equipment.

−例として所定の浸炭焼入を行なう!コめに必要な浸炭
ガスの消費量を第1表1と7ドす。
- For example, carry out the specified carburizing and quenching! The consumption amount of carburizing gas required for rice is shown in Table 1.

第1表 浸炭焼入処理におけるガス消費量所定の浸炭焼
入を行なうのに必要な浸炭性ガスは、従来装置に比べ本
発明装置を用いることにより1/10に減少しているこ
とが理解される。
Table 1 Gas consumption in carburizing and quenching It is understood that the carburizing gas required to carry out the specified carburizing and quenching process is reduced to 1/10 by using the device of the present invention compared to the conventional device. Ru.

また従米装置において1本発明装置での浸炭に適した垣
まで浸炭性ガスの挿入足を減少させると第3図に示すよ
うに浸炭ムラを生じて191要の浸炭焼入ができない、
、第3図は同一浸炭ガス挿入条件で、従来装置および本
発明装置で浸炭したものの外観および一部(す【曲状部
を観察した結果である。
In addition, if the insertion rate of carburizing gas is reduced to a level suitable for carburizing with the device of the present invention in a conventional device, uneven carburizing occurs as shown in Fig. 3, and the carburizing and quenching required in 191 cannot be performed.
3 shows the appearance and part (curved part) of the carburized specimens carburized by the conventional device and the device of the present invention under the same carburizing gas injection conditions.

図中1および1′は断面浸炭ノー、2は浸炭ムラ都。In the figure, 1 and 1' are cross-sections with no carburization, and 2 is uneven carburization.

3および3′は表面截某上均−浸炭されていると認めら
れる部分である。
3 and 3' are areas where the surface is recognized to have been uniformly carburized.

なお2本実施例では、ガスシールを完全とするため、2
Mh’4造としているが1本発明において2室構造であ
ることは必須の条件ではない。
In addition, in this example, in order to ensure a complete gas seal, 2.
Although it is a Mh'4 structure, it is not an essential condition for the present invention to have a two-chamber structure.

本発明装置により浸炭したものは均一に浸炭されている
のに対し、従米装置により浸炭したものは表面観察から
も断面観察からも浸炭ムラの存在が明瞭に確認できる。
The specimens carburized by the apparatus of the present invention were uniformly carburized, whereas the specimens carburized by the conventional apparatus clearly showed the presence of uneven carburization both from surface observation and cross-sectional observation.

以上より明らかなように1本発明装置によれば処理室5
の内容積を著しく小さくでき、被処理物6表向を活性な
還元性ガスで十分覆うことができるため被処理物全体が
均一に無酸化熱処理できるばかりか、該熱処理に要する
還元性ガスの使用量を著しく減少させることができる利
点がみる。
As is clear from the above, according to the apparatus of the present invention, the processing chamber 5
The inner volume of the workpiece can be significantly reduced, and the surface of the workpiece 6 can be sufficiently covered with active reducing gas, so not only can the entire workpiece be uniformly heat-treated without oxidation, but the reducing gas required for the heat treatment can also be used. The advantage is that the amount can be significantly reduced.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の^周反加熱無酸化熱処理装置。 第2図は本発明にかかる高周波加熱無酸化熱処理装置の
一例、@3図は本発明装置の鳩正条件で。 従来装置および本発明装置uを用いて浸炭処理した処理
品の一例を示す。 2・・・高周波加熱用コイル、3・・・非金属材料製遮
蔽板、5・・・処理室、6・・・被処理物、7・・・ノ
ズル。 8・・・高周波加熱用コイル内周向のガス穴、9・・・
キャリヤガス挿入口、10・・・ガス排出日出  願 
 人 トヨタ自動車株式会社 第1図 第20 オ芝釆ゼ青賞父馬J里品    本」は日月士」置処I
里市第3図 手 続 補 正 書 (方 式) %式%( 7、事fりの表示 昭和57年特許願第201751号 2、発明の名称 無酸化熱処理装置 3、補正をする壱 事件どの関係  特許出願人 住所  愛知県豊田市]・ヨタ町1番地 〒4714、
補正命令の日刊 昭和58年2月2日(発送り  ff和58年2月22
日)5、棺i正の対象 第3図
Figure 1 shows a conventional circumferential heating non-oxidizing heat treatment equipment. Figure 2 shows an example of the high-frequency heating non-oxidation heat treatment apparatus according to the present invention, and Figure 3 shows the apparatus of the present invention under positive conditions. An example of a treated product carburized using a conventional device and a device u of the present invention is shown. 2... High-frequency heating coil, 3... Shielding plate made of non-metallic material, 5... Processing chamber, 6... Workpiece, 7... Nozzle. 8... Gas hole in the inner circumferential direction of the high-frequency heating coil, 9...
Carrier gas insertion port, 10...Gas exhaust port
Person Toyota Motor Corporation Figure 1 Figure 20 Oshiba Kaze Ao Award sire J Rishina Hon' is Sun Moon Shi' Treatment I
Satoichi Figure 3 Procedures Amendment (Method) % Formula % (7. Indication of fact 1982 Patent Application No. 201751 2. Title of invention Non-oxidation heat treatment device 3. 1. Case to be amended Related Patent applicant address: 1 Yota-cho, Toyota City, Aichi Prefecture 4714,
Daily publication of amendment order February 2, 1982 (Shipped ffFebruary 22, 1982)
5. Figure 3 of the coffin i positive object

Claims (1)

【特許請求の範囲】[Claims] 高周波加熱を用いて高温浸炭などの無酸化熱処理(以゛
ド単に無酸化熱処理という)を行なう場合において、a
処理物を密閉するとともに、該被処理物側面には高周波
加熱コイルおよび非金属材料を配して処理室を構成し、
処理室ド方より挿入する還元性ガス(以ド単に還元性ガ
スという)を被処理物の611j面に設けた吹き出(ノ
ロから、被処理物に吹きつけて処理することを特徴とし
tこ無酸化熱処理装置。
When performing non-oxidation heat treatment such as high-temperature carburizing using high-frequency heating (hereinafter simply referred to as non-oxidation heat treatment), a
The processing chamber is configured by sealing the processing object and arranging a high-frequency heating coil and a non-metallic material on the side surface of the processing object,
The process is characterized in that the reducing gas (hereinafter simply referred to as reducing gas), which is inserted from the side of the processing chamber, is sprayed onto the processed object from a blow-out provided on the surface 611j of the processed object. Oxidation heat treatment equipment.
JP20175182A 1982-11-17 1982-11-17 Non-oxidative heat treatment apparatus Granted JPS5992020A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20175182A JPS5992020A (en) 1982-11-17 1982-11-17 Non-oxidative heat treatment apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20175182A JPS5992020A (en) 1982-11-17 1982-11-17 Non-oxidative heat treatment apparatus

Publications (2)

Publication Number Publication Date
JPS5992020A true JPS5992020A (en) 1984-05-28
JPH0342935B2 JPH0342935B2 (en) 1991-06-28

Family

ID=16446328

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20175182A Granted JPS5992020A (en) 1982-11-17 1982-11-17 Non-oxidative heat treatment apparatus

Country Status (1)

Country Link
JP (1) JPS5992020A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04129217U (en) * 1991-05-16 1992-11-25 ミサワホーム株式会社 construction panel
JPH0649948A (en) * 1992-07-29 1994-02-22 Misawa Homes Co Ltd Wall panel containing trough

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5799483B2 (en) * 2009-07-23 2015-10-28 トヨタ自動車株式会社 Carburizing method and carburizing apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04129217U (en) * 1991-05-16 1992-11-25 ミサワホーム株式会社 construction panel
JPH0649948A (en) * 1992-07-29 1994-02-22 Misawa Homes Co Ltd Wall panel containing trough

Also Published As

Publication number Publication date
JPH0342935B2 (en) 1991-06-28

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