JPS5960837A - tactile sensor - Google Patents
tactile sensorInfo
- Publication number
- JPS5960837A JPS5960837A JP17056582A JP17056582A JPS5960837A JP S5960837 A JPS5960837 A JP S5960837A JP 17056582 A JP17056582 A JP 17056582A JP 17056582 A JP17056582 A JP 17056582A JP S5960837 A JPS5960837 A JP S5960837A
- Authority
- JP
- Japan
- Prior art keywords
- contact
- magnetoresistive element
- tactile sensor
- magnetic field
- magnetoresistive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Force Measurement Appropriate To Specific Purposes (AREA)
- Testing Or Calibration Of Command Recording Devices (AREA)
- Transmission And Conversion Of Sensor Element Output (AREA)
- Switches That Are Operated By Magnetic Or Electric Fields (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
囚 発明の技術分野
本発明はロボット等に用い、把握対象物体との接触圧力
および同位置を検知するに適したち覚センサに関する。DETAILED DESCRIPTION OF THE INVENTION Technical Field of the Invention The present invention relates to a tactile sensor suitable for use in robots and the like to detect the contact pressure and position of an object to be grasped.
■)技術の背景
ロボットの手先に用いられる触覚センサは物体を確実か
つ安全に把握する上において極めて重要なデバイス(部
品)であるが、ロボットの作業対象が広がるに伴って、
接触圧力および接触位置を分布的に検知し得る触覚セン
サの実用化が望まれている。■) Background of the technology Tactile sensors used in robot hands are extremely important devices (components) for grasping objects reliably and safely, but as the objects of robot work expand,
It is desired to put into practical use a tactile sensor that can detect contact pressure and contact position in a distributed manner.
(0従来技術と問題点
ロボットの手先用のセンナとして、触覚センサ拳圧覚セ
ンサΦすベシ覚センサおよび近接覚センサ等が用いられ
ているが、これらのりし例えば触覚センサおよび圧覚セ
ンサに対しては、導電性ゴム・ばねψ歪ゲージ1光ファ
イバあるいは空気圧を用いたものが知られている。しか
し、これらの密度に設けることは困難であった。(0 Prior Art and Problems Tactile sensors, fist pressure sensors, Φ, proximity sensors, etc. are used as sensors for the hands of robots. A conductive rubber/spring ψ strain gauge 1 using optical fiber or air pressure is known. However, it has been difficult to provide the strain gauge at these densities.
(6)発明の目的
本発明は接触の有無だけではなく、接触圧力および接触
位置をも検知し得る分布的触覚センサを得ることを目的
とする。(6) Object of the Invention The object of the present invention is to obtain a distributed tactile sensor that can detect not only the presence or absence of contact but also the contact pressure and the contact position.
(ト)発明の構成
本発明になる触覚センサは、発磁体と、前記発磁体の両
側に相互に所定の間隙で対向して設けられる磁気抵抗素
子と、前記磁気抵抗素子に対し交流磁界を与える手段と
を備え、接触対象との接触によって生ずる前記発磁体の
移動量を前記磁気抵抗素子を介して検知するようにした
ものである。(G) Structure of the Invention The tactile sensor according to the present invention includes a magnetizing body, a magnetoresistive element provided on both sides of the magnetizing body facing each other with a predetermined gap, and applying an alternating magnetic field to the magnetoresistive element. and a means for detecting the amount of movement of the magnetic body caused by contact with a contact object via the magnetoresistive element.
■ 発明の実施例
以下、本発明の要旨を実施例によって具体的に説明する
。■ Examples of the Invention The gist of the present invention will be specifically explained below with reference to Examples.
第1図は本発明一実施例の斜視図(a)と部分断面図(
b)を示し、1は厚さ約100μmのフィルム状の発磁
体、2は発磁体1を挾むように両側に相互に所定の間隙
で対向して設けられる1対の磁気抵抗素子、3は後記基
板上に形成され磁気抵抗素子2に対し交流磁界を与える
手段として用いるコイル、4は発磁体1上にエツチング
によって形成された位置決め孔にセットされ直径約50
0μmの非磁性球からなる接触子、5は磁気抵抗素子2
と等しい線膨張係数を有する温度補償用抵抗、6は基板
、7は厚さ約200μmのシリコンゴム等の弾性を有す
る充填材である。Figure 1 is a perspective view (a) and a partial sectional view (a) of one embodiment of the present invention.
b), in which 1 is a film-like magnetic body with a thickness of about 100 μm, 2 is a pair of magnetoresistive elements provided on both sides facing each other with a predetermined gap so as to sandwich the magnetic body 1, and 3 is a substrate described later. A coil 4 formed on the magnetoresistive element 2 and used as a means for applying an alternating magnetic field to the magnetoresistive element 2 is set in a positioning hole formed by etching on the magnet generator 1 and has a diameter of about 50 mm.
A contact made of a 0 μm non-magnetic ball, 5 is a magnetoresistive element 2
6 is a substrate, and 7 is an elastic filler such as silicone rubber having a thickness of about 200 μm.
温度補償用抵抗5は磁気抵抗素子2に対応し近接して配
列され、コイル3・磁気抵抗素子2および温度補償用抵
抗5はホ) IJソグラフイ・化学エツチング等の薄膜
技術によって基板6上に形成される。The temperature compensation resistor 5 corresponds to and is arranged close to the magnetoresistive element 2, and the coil 3, the magnetoresistive element 2, and the temperature compensation resistor 5 are formed on the substrate 6 by thin film technology such as IJ lithography or chemical etching. be done.
第2図は、磁気抵抗素子2の特性Aと、交流磁界Bによ
る磁気抵抗素子2の抵抗値の変化Cを示把握対象と接触
しない状態におりるもの、(b)は接触子4が把握対象
と接触し発磁体1の変位によって直流磁界のシフ)NH
が生じた状態におけるものを示す。Fig. 2 shows the characteristic A of the magnetoresistive element 2 and the change C in the resistance value of the magnetoresistive element 2 due to the alternating magnetic field B. Fig. 2 shows the state in which the magnetoresistive element 2 is not in contact with the object to be grasped, and (b) the contactor 4 is grasped. Shift of the DC magnetic field due to the displacement of the magnet 1 when it comes into contact with the object) NH
Shows the state where this occurs.
なお、接触子4が把握対象と接融しない状態において、
発磁体1と対向する1対の磁気抵抗素子2の各々との間
隙の不平衡によって生ずる影響は他の手段によって除去
することができるので、以下、磁気抵抗素子2の特性A
はR座標軸に関し線じた場合の、交流磁界Bによる磁気
抵抗索子2の抵抗値の変化Cを、フーリエ級数に展開し
、交流磁界の周波数の成分(以下、基本波と称する)を
取出すと、
3−
となり、直流磁界のシフトNHの関数として表わされ、
第3図にこの関係を示す。In addition, in a state where the contact 4 is not fused with the object to be grasped,
Since the influence caused by the unbalance of the gap between the magnetoresistive element 1 and each of the pair of magnetoresistive elements 2 facing each other can be removed by other means, the characteristic A of the magnetoresistive element 2 will be described below.
When the change C in the resistance value of the magnetoresistive cable 2 due to the alternating magnetic field B is expanded into a Fourier series and the frequency component (hereinafter referred to as the fundamental wave) of the alternating magnetic field is taken out as a line with respect to the R coordinate axis. , 3-, and is expressed as a function of the shift NH of the DC magnetic field,
Figure 3 shows this relationship.
第4図は前記△Rを得るだめに用いる同期検波回路の構
成例を示し、11は増幅器、12はバンドパスフィルタ
、13は同期検波器、14はローパスフィルタ、15は
差動増幅器、C1とC2は1対の磁気抵抗索子2の各々
から得られる信号、またbは交流磁界を得るために用い
る発振器の出力である。FIG. 4 shows an example of the configuration of a synchronous detection circuit used to obtain the ΔR, in which 11 is an amplifier, 12 is a band-pass filter, 13 is a synchronous detector, 14 is a low-pass filter, 15 is a differential amplifier, C1 and C2 is the signal obtained from each of the pair of magnetoresistive cables 2, and b is the output of the oscillator used to obtain the alternating magnetic field.
なお、直流磁界のシフ)NHは、発磁体1と磁気抵抗素
子2との間隙、すなわち、接触子4が把握対象と接触し
たときに生ずる発磁体1の変位の関数であるが、同時に
また外部磁界にも影!#ケlされる。Note that the shift (NH) of the DC magnetic field is a function of the gap between the magnetic body 1 and the magnetoresistive element 2, that is, the displacement of the magnetic body 1 that occurs when the contactor 4 comes into contact with the object to be grasped, but at the same time Even the magnetic field has a shadow! #Being killed.
したがって、触覚センサとして用いるためには、この影
響を除去する必要があシ、本実施例においては、発磁体
1の両側に一対の磁気抵抗索子2を対向して設け、その
各々の素子の出力の位相が互4−
に逆相となるようにしている。外部磁界は前HIシ各々
の素子に対し同相の出力が生ずるように作用するので、
第4図に示すように差動増幅器15を用いることKよっ
て、これを除去することができる。Therefore, in order to use it as a tactile sensor, it is necessary to eliminate this influence. In this embodiment, a pair of magnetoresistive cables 2 are provided facing each other on both sides of the magnetizing body 1, and each element is The phases of the outputs are set to be opposite to each other. Since the external magnetic field acts on each element of the front HI switch so that the same phase output is generated,
This can be eliminated by using a differential amplifier 15 as shown in FIG.
以上のような構成によって、多数個のJ/′=触子4を
マトリックス状に高密度に設りることか可能であり、し
たがって分布的に接触の有無・接触圧力および接触位置
を精密に検知することができる。With the above configuration, it is possible to arrange a large number of J/' = contactors 4 in a matrix at high density, and therefore it is possible to precisely detect the presence or absence of contact, contact pressure, and contact position in a distributed manner. can do.
′thだ信号変調によって雑音成分を除去できるので感
度を尚めることもできる。Since noise components can be removed by signal modulation, sensitivity can also be improved.
第4図に例示しだような同期検波回路は、一対ことがで
きる。A pair of synchronous detection circuits as illustrated in FIG. 4 can be used.
■ 発明の詳細
な説明したように、本発明によれは接触の有無のみなら
ず、接触圧力および接触位置をも精密に検知できる触覚
センサが得られる。(2) Detailed Description of the Invention As described in detail, the present invention provides a tactile sensor that can accurately detect not only the presence or absence of contact, but also the contact pressure and the contact position.
第1図は本発明一実施例の構成図を示し、1はりb修坏
、2は世仇累す、3は父流忙介?与えるコイルである。
第2図および第3図は本発明−実施セ;)の動作原理説
明図、第4図は本づf1明−実施例に用いられる同期検
波回路を示す。
7一FIG. 1 shows a configuration diagram of an embodiment of the present invention. It is a coil that gives. FIGS. 2 and 3 are explanatory diagrams of the operating principle of the present invention, and FIG. 4 shows a synchronous detection circuit used in the present invention. 71
Claims (1)
特徴とする触覚センサ。A tactile sensor comprising a magnetic body and a predetermined space on both sides of the magnetic body.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17056582A JPS5960837A (en) | 1982-09-29 | 1982-09-29 | tactile sensor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP17056582A JPS5960837A (en) | 1982-09-29 | 1982-09-29 | tactile sensor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5960837A true JPS5960837A (en) | 1984-04-06 |
Family
ID=15907192
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP17056582A Pending JPS5960837A (en) | 1982-09-29 | 1982-09-29 | tactile sensor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5960837A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008093480A1 (en) * | 2007-01-29 | 2008-08-07 | Tokyo Denki University | Tactile sensor |
CN110553671A (en) * | 2018-06-04 | 2019-12-10 | 北京纳米能源与系统研究所 | Tactile sensor |
-
1982
- 1982-09-29 JP JP17056582A patent/JPS5960837A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008093480A1 (en) * | 2007-01-29 | 2008-08-07 | Tokyo Denki University | Tactile sensor |
JP2008185399A (en) * | 2007-01-29 | 2008-08-14 | Tokyo Denki Univ | Tactile sensor |
US8286509B2 (en) | 2007-01-29 | 2012-10-16 | Tokyo Denki University | Tactile sensor |
CN110553671A (en) * | 2018-06-04 | 2019-12-10 | 北京纳米能源与系统研究所 | Tactile sensor |
CN110553671B (en) * | 2018-06-04 | 2021-10-08 | 北京纳米能源与系统研究所 | tactile sensor |
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