JPS5952883A - Solar battery - Google Patents
Solar batteryInfo
- Publication number
- JPS5952883A JPS5952883A JP57163341A JP16334182A JPS5952883A JP S5952883 A JPS5952883 A JP S5952883A JP 57163341 A JP57163341 A JP 57163341A JP 16334182 A JP16334182 A JP 16334182A JP S5952883 A JPS5952883 A JP S5952883A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- solar battery
- junction
- contained
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims abstract description 22
- 229910052796 boron Inorganic materials 0.000 abstract description 7
- 229910052698 phosphorus Inorganic materials 0.000 abstract description 7
- 229910052710 silicon Inorganic materials 0.000 abstract description 6
- 238000000034 method Methods 0.000 abstract description 4
- 239000010409 thin film Substances 0.000 abstract description 4
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 3
- 239000001257 hydrogen Substances 0.000 abstract description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 2
- 238000006243 chemical reaction Methods 0.000 abstract description 2
- 238000000354 decomposition reaction Methods 0.000 abstract description 2
- 239000010408 film Substances 0.000 abstract description 2
- 239000007789 gas Substances 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 2
- 239000002184 metal Substances 0.000 abstract description 2
- 239000000758 substrate Substances 0.000 abstract description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 abstract 1
- 238000013329 compounding Methods 0.000 abstract 1
- 239000002245 particle Substances 0.000 abstract 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910052798 chalcogen Inorganic materials 0.000 description 1
- 150000001787 chalcogens Chemical class 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F10/00—Individual photovoltaic cells, e.g. solar cells
- H10F10/10—Individual photovoltaic cells, e.g. solar cells having potential barriers
- H10F10/17—Photovoltaic cells having only PIN junction potential barriers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
Landscapes
- Photovoltaic Devices (AREA)
Abstract
Description
【発明の詳細な説明】
不発IJ1.i非晶質半導体を用いた太陽電池に関する
。[Detailed description of the invention] Unexploded IJ1. This invention relates to a solar cell using an amorphous semiconductor.
非晶質シリコンが荷電子制御が可能であることが鉦明さ
れて以来、特に太陽電池への非晶質半導体の応用が注目
され、各方面で研究がなされている。これらの中には太
陽光の有効利用λいう観点から、シリコンに他の■族元
素を添加してなる核元素非晶質半導体を用いる工夫がな
されている。Since it was discovered that amorphous silicon can control charged electrons, the application of amorphous semiconductors to solar cells has attracted particular attention, and research has been conducted in various fields. Among these, from the viewpoint of effective utilization of sunlight λ, efforts have been made to use core element amorphous semiconductors made by adding other group II elements to silicon.
例えば光の入射側の層において、炭素をシリコンに混合
することによって光学的禁止帯幅を広げる。For example, by mixing carbon with silicon in the layer on the light incident side, the optical band gap is widened.
それKよってソリコンのみからなる電流発生領域へ到達
する光責が増加するうこれとは逆に電流発生領域を形成
する層においては、ゲルマニラl、をシリコンに混合す
ることによって禁止帯幅を小さくして太陽プロを有効に
吸収する。しかしこれらは、各層を構成する半導体が異
種であってヘテロ接合を形成することになり、接合作成
の土に技術的困難全作なう。As a result, the amount of light reaching the current generation region made only of silicon increases.On the contrary, in the layer forming the current generation region, the forbidden band width can be reduced by mixing gel manila l with silicon. to effectively absorb solar energy. However, in these methods, the semiconductors constituting each layer are of different types, forming a heterojunction, making it technically difficult to create the junction.
本発明はこのようなヘテロ接合を形成す−ることなしに
、同種半導体から接合が形成され、しかもエネルギー、
ギャップが調整可能Cあるような太陽電池を提供するこ
とを目的とする。In the present invention, a junction is formed from the same type of semiconductor without forming such a heterojunction, and moreover, the energy and
It is an object of the present invention to provide a solar cell in which the gap is adjustable.
この目的は太陽電池の接合を形成する非晶質半導体の各
層が、If1旗、■銭、V核の各々に列する少なくとも
一つずつの同一元素とダングリングボンドを終端する元
素とからなることによって達成される。The purpose of this is to ensure that each layer of the amorphous semiconductor that forms the junction of the solar cell consists of at least one identical element arranged in each of the If1, ■, and V nuclei, and an element that terminates the dangling bond. achieved by.
本発明は太陽電池の各層を同一のIVFZ元素半導体と
■−■化合物半導体との腹合半導体によって(イタ成し
ようとする考えに基づいてい心。The present invention is based on the idea that each layer of a solar cell is formed by a composite semiconductor consisting of the same IVFZ element semiconductor and (1)-(2) compound semiconductor.
以F図を引用し−C本発明の実施例シこつい゛C説明す
る。第1図に示す太陽電池をよ、金属基板1上にp層2
.1層3.9層4が半導体薄膜で形成され、さらにその
上に透明導電膜5、格子電極6が設けられたものである
。pl@2.1層3.n7#4はすべてB、Si、Pの
三元素からなる非晶質半導体各層であり、ダングリング
ボンドを終端するターミネータとして水素が添加されて
いる。第2図はその非晶質半導体各層における各元素の
含廟量の分布を示す。p層2はBがPより多く、9層4
はPかBよシ多く含まれておシ、これにより荷電子制御
を行う。一方j層3ンまBとPの量が同じか、あるいは
補償のためにBit、PJtのいずれかが多くてもよい
。Hereinafter, an embodiment of the present invention will be described with reference to FIG. In the solar cell shown in FIG. 1, a p-layer 2 is formed on a metal substrate 1.
.. One layer 3.9 layers 4 are formed of semiconductor thin films, and a transparent conductive film 5 and a grid electrode 6 are further provided thereon. pl@2.1 layer 3. n7#4 is an amorphous semiconductor layer made of three elements, B, Si, and P, and hydrogen is added as a terminator for terminating dangling bonds. FIG. 2 shows the distribution of the content of each element in each layer of the amorphous semiconductor. P layer 2 has more B than P, 9 layers 4
contains more P or B, which controls charge electrons. On the other hand, in the j layer, the amounts of B and P may be the same, or either Bit or PJt may be larger for compensation.
このような太陽電池の半導体層INは、例えばグロー放
電分解法により原料ガスとしてのSIH’ +B2H6
,PH! の配合化を各層に対応して鴎かに変化させ
ることだけKより、同一般帷で連続的に極めて簡単に形
成でき、しかも良好な18合台、得ることができる。し
かも本発明の最大の特長は、半導体のエネルギー、ギャ
ップをSl量に対する(s+p)量の割合によって調整
できることである。従って1M3のエネルギー・ギヤ、
ツブを太陽光エネルギースペクトルの最大点に合わせ、
変換効率の高い太陽電池を製作することも容易にできる
。The semiconductor layer IN of such a solar cell is prepared by, for example, glow discharge decomposition method using SIH' +B2H6 as a raw material gas.
,PH! By simply changing the formulation of each layer in accordance with each layer, the same general cloth can be formed continuously and extremely easily, and a good 18-layer product can be obtained. Moreover, the greatest feature of the present invention is that the energy and gap of the semiconductor can be adjusted by adjusting the ratio of the amount (s+p) to the amount of Sl. Therefore 1M3 energy gear,
Align the whelk with the maximum point of the solar energy spectrum,
It is also easy to manufacture solar cells with high conversion efficiency.
以上のように本発明は同種半導体からなり、しかも特性
の調整が容易にできる薄膜半導体太陽電池を得るもので
、太陽電池の特性の向上を経済的に達成できる点で極め
て有効であるつなおIVFi元索としてSlの代りにG
e、■族元素としてB以外にAI、In、+la、■旅
元素としてはP以外にSt) + Asが使えることは
いうまでもなり0ターミネータとしては水素ばかりでな
くハロゲンまたはカルコゲン元素を用いてもよい。“ま
た前述のn−1−p構造だけでなく、ショットキバリア
型の構造の太陽電池にも適用できる。As described above, the present invention provides a thin film semiconductor solar cell which is made of the same type of semiconductor and whose characteristics can be easily adjusted. G instead of Sl as the original cable
It goes without saying that AI, In, +la can be used in addition to B as group elements, and St) + As can be used in addition to P as travel elements, and not only hydrogen but also halogen or chalcogen elements can be used as 0 terminators. Good too. “In addition to the aforementioned n-1-p structure, it can also be applied to solar cells with a Schottky barrier type structure.
第1図は本発明の一実施例の太陽電池の断面図、第2図
は半導体層の厚さ方向におけ゛るSi 。
B、P各元素の含有量の分布図である。FIG. 1 is a cross-sectional view of a solar cell according to an embodiment of the present invention, and FIG. 2 is a view of Si in the thickness direction of the semiconductor layer. It is a distribution diagram of the content of B and P elements.
Claims (1)
VD、1旗の各々に属する少なくとも−りずつの元素と
ダングリングボンドを終端する元素とからなる−ことを
特徴とする太陽電池。1) Each 1- of the amorphous semiconductor forming the junction is
1. A solar cell comprising at least one element belonging to each of the VD and one flags and an element terminating a dangling bond.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57163341A JPS5952883A (en) | 1982-09-20 | 1982-09-20 | Solar battery |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57163341A JPS5952883A (en) | 1982-09-20 | 1982-09-20 | Solar battery |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5952883A true JPS5952883A (en) | 1984-03-27 |
Family
ID=15772024
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57163341A Pending JPS5952883A (en) | 1982-09-20 | 1982-09-20 | Solar battery |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5952883A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4681984A (en) * | 1985-04-11 | 1987-07-21 | Siemens Aktiengesellschaft | Solar cell comprising a semiconductor body formed of amorphous silicon and having a layer sequence p-SiC/i/n |
US4692558A (en) * | 1983-05-11 | 1987-09-08 | Chronar Corporation | Counteraction of semiconductor impurity effects |
US4734379A (en) * | 1985-09-18 | 1988-03-29 | Fuji Electric Corporate Research And Development Ltd. | Method of manufacture of solar battery |
US4742012A (en) * | 1984-11-27 | 1988-05-03 | Toa Nenryo Kogyo K.K. | Method of making graded junction containing amorphous semiconductor device |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55151328A (en) * | 1979-05-16 | 1980-11-25 | Hitachi Ltd | Method and apparatus for fabricating hydrogen-containing amorphous semiconductor film |
JPS564287A (en) * | 1979-06-18 | 1981-01-17 | Rca Corp | Amorphous silicon solar battery |
JPS56114387A (en) * | 1980-02-13 | 1981-09-08 | Sanyo Electric Co Ltd | Manufacture of photovoltaic force element |
-
1982
- 1982-09-20 JP JP57163341A patent/JPS5952883A/en active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS55151328A (en) * | 1979-05-16 | 1980-11-25 | Hitachi Ltd | Method and apparatus for fabricating hydrogen-containing amorphous semiconductor film |
JPS564287A (en) * | 1979-06-18 | 1981-01-17 | Rca Corp | Amorphous silicon solar battery |
JPS56114387A (en) * | 1980-02-13 | 1981-09-08 | Sanyo Electric Co Ltd | Manufacture of photovoltaic force element |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4692558A (en) * | 1983-05-11 | 1987-09-08 | Chronar Corporation | Counteraction of semiconductor impurity effects |
US4742012A (en) * | 1984-11-27 | 1988-05-03 | Toa Nenryo Kogyo K.K. | Method of making graded junction containing amorphous semiconductor device |
US4681984A (en) * | 1985-04-11 | 1987-07-21 | Siemens Aktiengesellschaft | Solar cell comprising a semiconductor body formed of amorphous silicon and having a layer sequence p-SiC/i/n |
US4734379A (en) * | 1985-09-18 | 1988-03-29 | Fuji Electric Corporate Research And Development Ltd. | Method of manufacture of solar battery |
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