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JPS5936365Y2 - Double-sided polishing equipment - Google Patents

Double-sided polishing equipment

Info

Publication number
JPS5936365Y2
JPS5936365Y2 JP1979027556U JP2755679U JPS5936365Y2 JP S5936365 Y2 JPS5936365 Y2 JP S5936365Y2 JP 1979027556 U JP1979027556 U JP 1979027556U JP 2755679 U JP2755679 U JP 2755679U JP S5936365 Y2 JPS5936365 Y2 JP S5936365Y2
Authority
JP
Japan
Prior art keywords
workpiece
polisher
polishers
carrier
pair
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1979027556U
Other languages
Japanese (ja)
Other versions
JPS55129763U (en
Inventor
信明 村上
彰 長谷山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP1979027556U priority Critical patent/JPS5936365Y2/en
Publication of JPS55129763U publication Critical patent/JPS55129763U/ja
Application granted granted Critical
Publication of JPS5936365Y2 publication Critical patent/JPS5936365Y2/en
Expired legal-status Critical Current

Links

Description

【考案の詳細な説明】 本考案は両面ポリシング装置の改良に関する。[Detailed explanation of the idea] The present invention relates to improvements in double-sided polishing equipment.

片面ポリシング装置として、第1図に示すように表面に
人工皮革が取付けられたポリシ面をもち、水平に回転駆
動されるポリシャ1と、上記ポノシ面に被加工物Wを圧
接するためのシリンダ装置2とを有していて、上記被加
工物Wが上記シリンダ装置2に回転自在に保持されたヘ
ッド3に固定され、上記ポリシャ1の軸方向に進退し上
記ポノシ面に圧接されて加工されるようになっているも
のがある。
As shown in FIG. 1, the single-sided polishing device includes a polisher 1 which has a polishing surface to which artificial leather is attached and is driven to rotate horizontally, and a cylinder device for pressurizing the workpiece W to the polishing surface. 2, the workpiece W is fixed to a head 3 rotatably held by the cylinder device 2, advances and retreats in the axial direction of the polisher 1, and is pressed against the polishing surface for processing. There are some things that look like this.

こうしたポリシング加工ではポリシャ1上の砥粒による
深いひっかき傷が生じやすいので、加工面を平滑に仕上
げるのが容易でない欠点がある。
This polishing process tends to cause deep scratches due to the abrasive grains on the polisher 1, so it has the disadvantage that it is not easy to finish the processed surface smoothly.

この欠点を除去するために非接触式平面研摩装置(公開
実用昭和53−110582)が提案されている。
In order to eliminate this drawback, a non-contact type surface polishing device (published in practical use in 1982-110582) has been proposed.

この装置はポリシ面で動圧を発生するポリシャを設け、
このポリシャと被加工物とを砥粒を懸濁した加工液中で
相対運動させて両者間に非接触状態を形成し、上記加工
液中の砥粒と上記被加工物との摩擦によって加工が行な
われるものである。
This device is equipped with a polisher that generates dynamic pressure on the polishing surface.
The polisher and the workpiece are moved relative to each other in a machining fluid in which abrasive grains are suspended to form a non-contact state between them, and the machining is performed by friction between the abrasive grains in the machining fluid and the workpiece. It is done.

ところで両面ポリシング装置として、第2図に示すよう
に、ポリシャ1上に被加工物Wを載置し、この被加工物
Wの上に更にポリシャ6を載置するものがある。
By the way, as shown in FIG. 2, there is a double-sided polishing apparatus in which a workpiece W is placed on a polisher 1, and a polisher 6 is further placed on top of this workpiece W.

この場合上記被加工物Wは平板歯車状のキャリヤ7に保
持される。
In this case, the workpiece W is held by a flat gear-shaped carrier 7.

しかしてこのキャリヤ7は、これが回転駆動されるピニ
オン8およびこのピニオン8と同軸に固定設置されたイ
ンタナルギヤ9に噛合するようになっていて、上記被加
工物Wはキャリヤ7の回転により回転しながら上記ポリ
シャ1,6に圧接されて、その両面が同時にポリシング
加工される。
However, the lever carrier 7 meshes with a pinion 8 that is rotationally driven and an internal gear 9 that is fixedly installed coaxially with the pinion 8, and the workpiece W is rotated by the rotation of the carrier 7. It is brought into pressure contact with the polishers 1 and 6, and both surfaces thereof are simultaneously polished.

このような両面ポリシング装置は第1図に示した前記片
面ポリシング装置と同様の理由により深いひっかき傷が
生じやすいため加工面を平滑に仕上げるのが容易でない
欠点をもつ。
This type of double-sided polishing apparatus has the disadvantage that it is difficult to finish the machined surface smoothly for the same reason as the single-sided polishing apparatus shown in FIG. 1 because deep scratches are likely to occur.

この欠点を除去するためにこの両面ポリシング装置に前
記片面ポリシング装置に対してなされた前記提案をその
まま適用すると、被加工物の両面にそれぞれ動圧を発生
する2個のポリシャを設けることが考えられる。
In order to eliminate this drawback, if the above-mentioned proposal made for the single-sided polishing apparatus is applied as is to this double-sided polishing apparatus, it would be possible to provide two polishers that generate dynamic pressure on both sides of the workpiece. .

すなわち、被加工物の下側に上面で動圧を発生するポリ
シ面が形成されたボッシャを設けるとともに上記被加工
物の上側に下面で動圧を発生するポリシ面が形成された
ポリシャを設ける。
That is, a bosser having a polishing surface that generates dynamic pressure on its upper surface is provided below the workpiece, and a polisher having a polishing surface that generates dynamic pressure on its lower surface is provided above the workpiece.

そして加工液中でポリシャと被加工物とを相対運動させ
動圧により下ポリシャから被加工物を浮上させ、この浮
上した被加工物から更に動圧により上ポリシャを浮上さ
せる装置が考えられる。
A conceivable device is one in which a polisher and a workpiece are moved relative to each other in a machining fluid, the workpiece is floated from a lower polisher by dynamic pressure, and an upper polisher is further floated from the floated workpiece by dynamic pressure.

しかしながらこの装置は上、下ポリシャを離間するため
の動圧発生が被加工物を介して行なわれるため浮上する
間隙が変動して所要の加工品質が得られない恐れがある
However, in this apparatus, since the dynamic pressure for separating the upper and lower polishers is generated through the workpiece, the floating gap may fluctuate and the required processing quality may not be obtained.

本考案は上記の事情によりなされたもので一対のポリシ
ャの被加工物を介して対向する対向面を同磁極をもつと
ともに上記ポリシャの回転により加工液を介して上記被
加工物に動圧を与える面に形成し、安定した間隙が得ら
れるようにして所要の加工品質を得るものである。
The present invention was developed in view of the above-mentioned circumstances, and the opposing surfaces of a pair of polishers facing each other across the workpiece have the same magnetic pole, and the rotation of the polisher applies dynamic pressure to the workpiece through the machining fluid. The required processing quality is obtained by forming a stable gap on the surface.

以下、図面を参照し本考案を実施例に基づいて説明する
Hereinafter, the present invention will be described based on embodiments with reference to the drawings.

装置は第3図および゛第4図に示すように円板状被加工
物Wを介して対向する一対のポリシャ11゜12とキャ
リヤ13およびその回転機構などで構成される。
As shown in FIGS. 3 and 4, the apparatus is comprised of a pair of polishers 11 and 12 facing each other with a disk-shaped workpiece W interposed therebetween, a carrier 13, and its rotation mechanism.

すなわち、水平に配置された円板状のボッシャ11の上
に上記被加工物Wが載置され、更にその上に上記ポリシ
ャ11と同形状のポリシャ12が載置される構造である
That is, the workpiece W is placed on a disk-shaped bosser 11 arranged horizontally, and a polisher 12 having the same shape as the polisher 11 is placed on top of the workpiece W.

そして上記ポリシャ11は図示せぬ駆動装置により定位
置で速度可変に回転されるようになっている。
The polisher 11 is rotated at a fixed position at a variable speed by a drive device (not shown).

このポリシャ11は上記被加工物Wを介してポリシャ1
2と対向する対向面14がたとえばS極になるように図
示せぬ永久磁石が内蔵され回転軸方向に均一な磁力が生
じるようになっている。
This polisher 11 is connected to the polisher 1 through the workpiece W.
A permanent magnet (not shown) is built in so that the opposing surface 14 facing the rotating shaft 2 has an S pole, for example, so that a uniform magnetic force is generated in the direction of the rotation axis.

このポリシャ11は第5図に示すように矢印Aで示す回
転方向に負の傾斜角をもつ放射状の溝15が対向面14
に一様に形成されていて、矢印A方向に回転すると加工
液を介し軸方向に動圧を生じる。
As shown in FIG. 5, this polisher 11 has radial grooves 15 having a negative inclination angle in the direction of rotation shown by arrow A on the opposing surface 14.
The shaft is uniformly formed, and when rotated in the direction of arrow A, dynamic pressure is generated in the axial direction via the machining fluid.

つぎにポリシャ12は図示せぬ駆動装置により上記ポリ
シャ11と同軸かつ無関係に速度可変で回転されるよう
になっており、その回転軸方向にスライド自在に設けら
れている。
Next, the polisher 12 is rotated at a variable speed coaxially with and independently of the polisher 11 by a drive device (not shown), and is provided so as to be slidable in the direction of its rotation axis.

このポリシャ12は上記被加工物Wを介して上記ポリシ
ャ11と対向する対向面16が上記ポリシャ11と同様
のS極をもち、反発する磁力によって上記ポリシャ11
との間に被加工物Wの厚さにより大きい間隙が生じるよ
うになっている。
This polisher 12 has a facing surface 16 that faces the polisher 11 through the workpiece W and has an S pole similar to that of the polisher 11, and a repelling magnetic force causes the polisher 11 to
Depending on the thickness of the workpiece W, a larger gap is created between the two.

なお、この間隙は上記ポリシャ12におもりを負荷して
調節することができる。
Note that this gap can be adjusted by applying a weight to the polisher 12.

また、このポリシャ12はその対向面16が上記ポリシ
ャ11と同様の動圧を生じる面に形成されている。
Further, the opposing surface 16 of this polisher 12 is formed to be a surface that generates a dynamic pressure similar to that of the polisher 11 described above.

次にキャリヤ13およびその回転機構について説明する
と、上記一対のポリシャ11.12間、これらのポリシ
ャ11.12と同軸に、図示せぬ駆動装置によりこれら
のポリシャ11.12と無関係に速度可変のピニオン1
7が設けられる。
Next, to explain the carrier 13 and its rotation mechanism, between the pair of polishers 11.12 and coaxially with these polishers 11.12, there is a pinion whose speed is variable independently of these polishers 11.12 by a drive device (not shown). 1
7 is provided.

また、このピニオン17と同軸に上記ポリシャ11.1
2より大きいインタナルギヤ18が固定的に設けられ、
これらのギヤ17.18間に被加工物Wより厚さの薄い
平板歯車状のキャリヤ13が噛合している。
Also, the polisher 11.1 is coaxially connected to this pinion 17.
An internal gear 18 larger than 2 is fixedly provided,
A flat gear-shaped carrier 13, which is thinner than the workpiece W, is meshed between these gears 17 and 18.

つまり、このキャリヤ13は上記ピニオン17の回転に
伴ない、上記ポリシャ11.12間で自転しつつ上記ピ
ニオン17の軸心を中心として公転するようになってい
る。
That is, as the pinion 17 rotates, the carrier 13 rotates between the polishers 11 and 12 and revolves around the axis of the pinion 17.

このキャリヤ13には中心に円形の被加工物保持孔19
が形成される。
This carrier 13 has a circular workpiece holding hole 19 in the center.
is formed.

この保持孔19は加工中に上記キャリヤ13の回転軸方
向への被加工物の動きが拘束されないように、上記被加
工物の直径よりも大きな直径をもっている。
This holding hole 19 has a diameter larger than the diameter of the workpiece so that the movement of the workpiece in the direction of the rotation axis of the carrier 13 is not restricted during machining.

第4図ではキャリヤ13が円周を等分して4個配置され
ている。
In FIG. 4, four carriers 13 are arranged equally dividing the circumference.

そして加工中加工部は図示せぬ加工液槽の砥粒を懸濁し
た加工液に浸漬されるようになっている。
During processing, the processing portion is immersed in a processing liquid in which abrasive grains are suspended in a processing liquid tank (not shown).

なお、上記ポリシャ11.12には電磁石を設けてもよ
い。
Note that the polishers 11 and 12 may be provided with an electromagnet.

電磁石は反発力の調節が容易である。The repulsive force of electromagnets can be easily adjusted.

また、キャリヤ13等には非磁性、または弱磁性材料が
使用されることはいうまでもない。
Further, it goes without saying that non-magnetic or weakly magnetic materials are used for the carrier 13 and the like.

加工は、ポリシャ12を移動して被加工物Wをキャリヤ
13の保持孔19にセットする。
For processing, the polisher 12 is moved and the workpiece W is set in the holding hole 19 of the carrier 13.

しかしてこの被加工物Wの上にこのポリシャ12を載置
すると両ポリシャ11.12には矢印Bで示す反発力が
作用して上記ポリシャ12はポリシャ11から重力につ
り合う高さに浮上する。
However, when this polisher 12 is placed on the workpiece W of the lever, a repulsive force shown by an arrow B acts on both polishers 11 and 12, and the polisher 12 floats up from the polisher 11 to a height that balances the gravity.

この浮上により生じるポリシャ11.12間の間隙gは
おもりを用いて一定の値に保つことができる。
The gap g between the polishers 11 and 12 caused by this floating can be kept at a constant value using a weight.

そこで一対のポリシャ11.12およびピニオン17を
回転する。
The pair of polishers 11, 12 and pinion 17 are then rotated.

するとこれらのポリシャ11.12の対向面14.16
に設けられている溝15が加工液に作用して上記被加工
物Wにその上面と下面から動圧を加える。
Then, the opposing surfaces 14, 16 of these polishers 11, 12
Grooves 15 provided therein act on the machining fluid to apply dynamic pressure to the workpiece W from its upper and lower surfaces.

この動圧の大きさはポリシャ11.12の回転速度を変
えて調節することができ、したがって上記被加工物Wを
上記間隙2間の適等位置に浮上させておくことができる
The magnitude of this dynamic pressure can be adjusted by changing the rotational speed of the polisher 11, 12, so that the workpiece W can be levitated at an appropriate position between the gaps 2.

一方被加工物Wはこの間加工液の流動および回転駆動さ
れるピニオン17に噛合しているキャリヤ13の回転が
作用して回転される。
Meanwhile, the workpiece W is rotated by the flow of the machining fluid and the rotation of the carrier 13 meshing with the rotationally driven pinion 17.

しかしてポリシャ11.12から遊離して回転する被加
工物Wに、流動している加工液の砥粒が摩擦してポリシ
ング加工が進行する。
The abrasive grains of the flowing working fluid rub against the rotating workpiece W separated from the polisher 11, 12, thereby progressing the polishing process.

この加工中上記ポリシャ11.12は磁力の作用によっ
て間隙gが保たれる関係上この間隙gは動圧のみで間隙
が作られるものと比べて安定する。
During this processing, the polisher 11, 12 maintains the gap g due to the action of magnetic force, so this gap g is more stable than when the gap is created only by dynamic pressure.

なお、この間隙gは磁力の反発力により一次的に形成さ
れ動圧は二次的に関与するにすぎないものである。
Note that this gap g is primarily formed by the repulsive force of the magnetic force, and the dynamic pressure is only secondarily involved.

しかし必要によりポリシャ11.12の回転速度とか、
その対向面14.16の溝15の形状を変えてこの動圧
を上記間隙gの形成に大きく関与させることも可能であ
る。
However, if necessary, the rotation speed of polisher 11, 12, etc.
It is also possible to make this dynamic pressure largely contribute to the formation of the gap g by changing the shape of the grooves 15 on the opposing surfaces 14 and 16.

なお、本考案は上記実施例に限定されるものではなく、
たとえば両ポリシャ11.12もしくはポリシャ11が
軸方向にスライドするようにしてもよい。
Note that the present invention is not limited to the above embodiments,
For example, it is also possible for both polishers 11, 12 or polisher 11 to slide in the axial direction.

また、キャリヤ13の自転はインタナルギヤ18を使用
しない他の機構によって行なうことも考えられる。
Further, it is also conceivable that the rotation of the carrier 13 is performed by another mechanism that does not use the internal gear 18.

更にまた、キャリヤ13には偏心した保持孔もしくは複
数の保持孔を設ける等、その要旨を逸脱しない範囲にお
いて種々変形可能であることはいうまでもない。
Furthermore, it goes without saying that the carrier 13 can be modified in various ways without departing from the spirit of the invention, such as by providing an eccentric holding hole or a plurality of holding holes.

本考案は以上詳述したように、一対のポリシャの被加工
物を介して対向する対向面を、同磁極をもつとともに上
記ポリシャの回転により加工液を介して上記被加工物に
動圧を与える面に形成したもので、加工中ポリシャ間に
は安定した間隙が得られる関係上、被加工物に対する砥
粒の摩擦が一様に行なわれることになってひっかき傷お
よびむらのない加工を行なうことができる。
As described in detail above, in the present invention, the opposing surfaces of a pair of polishers facing each other across the workpiece have the same magnetic pole, and the rotation of the polisher applies dynamic pressure to the workpiece through the machining fluid. Because it is formed on the surface, a stable gap is obtained between the polishers during machining, so the friction of the abrasive grains against the workpiece is uniform, resulting in smooth machining without scratches or unevenness. Can be done.

また、ポリシャの間隙が任意に変えられる関係上、加工
速度と品質が調節しやすくなって所要の加工品質を容易
に得ることができる。
Further, since the gap between the polishers can be changed arbitrarily, the processing speed and quality can be easily adjusted, and the desired processing quality can be easily obtained.

なお、本考案はポリシング装置のみならずラッピング装
置にも容易に適用でき精密加工の分野に広く効果を奏す
るものである。
The present invention can be easily applied not only to polishing machines but also to lapping machines, and is widely effective in the field of precision machining.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は従来の片面ポリシング装置の正面図、第2図は
従来の両面ポリシング装置の正面断面図、第3図は本考
案の実施例の両面ポリシング装置の正面断面図、第4図
はその矢印C方向に見た縮小平面図、第5図はそのポリ
シャの一部切欠斜視図である。 11.12・・・・・・ポリシャ、13・・・・・・キ
ャリヤ、14,16・・・・・・対向面、W・・・・・
・被加工物。
FIG. 1 is a front view of a conventional single-sided polishing device, FIG. 2 is a front sectional view of a conventional double-sided polishing device, FIG. 3 is a front sectional view of a double-sided polishing device according to an embodiment of the present invention, and FIG. 4 is a front sectional view of the conventional double-sided polishing device. FIG. 5 is a reduced plan view viewed in the direction of arrow C and a partially cutaway perspective view of the polisher. 11.12...Polisher, 13...Carrier, 14,16...Opposing surface, W...
・Workpiece.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 被加工物を介して対向する対向面をもつ一対の回転ポリ
シャと、上記一対のポリシャ間に上記被加工物を保持し
回転により上記被加工物に回転を与えるキャリヤとを具
備し、上記一対のポリシャの少なくとも一つはそのポリ
シャの回転中心軸線の方向にスライド自在で゛ありかつ
それぞれの対向面は同磁極をもつとともに上記ポリシャ
゛の回転により加工液を介し上記被加工物に動圧を与え
る面に形成され、一方、上記被加工物は上記キャリヤに
上記一対のポリシャの対向面方向に拘束されないように
保持され、このキャリヤに保持された被加工物を回転す
る上記一対のポリシャの対向面から上記加工液を介して
遊離することを特徴とする両面ポリシング装置。
A pair of rotating polishers having opposing surfaces facing each other with a workpiece in between, and a carrier that holds the workpiece between the pair of polishers and rotates the workpiece by rotation, At least one of the polishers is slidable in the direction of the rotation center axis of the polisher, and each opposing surface has the same magnetic pole, and rotation of the polisher applies dynamic pressure to the workpiece through the machining fluid. On the other hand, the workpiece is held by the carrier so as not to be restrained in the direction of the opposing surfaces of the pair of polishers, and the opposing surfaces of the pair of polishers rotate the workpiece held by the carrier. A double-sided polishing device characterized in that the polishing liquid is released from the polishing liquid through the processing liquid.
JP1979027556U 1979-03-06 1979-03-06 Double-sided polishing equipment Expired JPS5936365Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1979027556U JPS5936365Y2 (en) 1979-03-06 1979-03-06 Double-sided polishing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1979027556U JPS5936365Y2 (en) 1979-03-06 1979-03-06 Double-sided polishing equipment

Publications (2)

Publication Number Publication Date
JPS55129763U JPS55129763U (en) 1980-09-13
JPS5936365Y2 true JPS5936365Y2 (en) 1984-10-06

Family

ID=28871893

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1979027556U Expired JPS5936365Y2 (en) 1979-03-06 1979-03-06 Double-sided polishing equipment

Country Status (1)

Country Link
JP (1) JPS5936365Y2 (en)

Also Published As

Publication number Publication date
JPS55129763U (en) 1980-09-13

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