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JPS59178646U - exposure equipment - Google Patents

exposure equipment

Info

Publication number
JPS59178646U
JPS59178646U JP7340183U JP7340183U JPS59178646U JP S59178646 U JPS59178646 U JP S59178646U JP 7340183 U JP7340183 U JP 7340183U JP 7340183 U JP7340183 U JP 7340183U JP S59178646 U JPS59178646 U JP S59178646U
Authority
JP
Japan
Prior art keywords
convex lens
space
exposure apparatus
gas
pattern mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7340183U
Other languages
Japanese (ja)
Inventor
園山 康保
勝部 俊道
Original Assignee
シャープ株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by シャープ株式会社 filed Critical シャープ株式会社
Priority to JP7340183U priority Critical patent/JPS59178646U/en
Publication of JPS59178646U publication Critical patent/JPS59178646U/en
Pending legal-status Critical Current

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  • Light Sources And Details Of Projection-Printing Devices (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は従来の露光装置の構成説明図、第2図は本考案
に係る露光装置の一実施例の構成説明図を示す。  。 図中、1:ランプハウス、2:水銀ランプ、3:凸レン
ズ、4:パターンマスク、5:カラス基板、6:″ラン
プハウス、7:水銀ランプ、8:凸レンズ、9:□’Q
IJング、10:リフレクタ−,11:パターンマスク
、12:パターンマスク固定用ホルダー、13:下板、
14:0リング、15:密閉空間、16:ガラス基板、
17:バルブ、18ニアダブター、19:シャワーノズ
ル、20:排気孔、21ニアダブター、22:バルブ、
23:排気ポンプ。
FIG. 1 is an explanatory diagram of the configuration of a conventional exposure apparatus, and FIG. 2 is an explanatory diagram of the configuration of an embodiment of the exposure apparatus according to the present invention. . In the figure, 1: lamp house, 2: mercury lamp, 3: convex lens, 4: pattern mask, 5: glass substrate, 6: "lamp house, 7: mercury lamp, 8: convex lens, 9: □'Q
IJ ring, 10: Reflector, 11: Pattern mask, 12: Pattern mask fixing holder, 13: Lower plate,
14: 0 ring, 15: closed space, 16: glass substrate,
17: Valve, 18 Near doublet, 19: Shower nozzle, 20: Exhaust hole, 21 Near doublet, 22: Valve,
23: Exhaust pump.

Claims (1)

【実用新案登録請求の範囲】 1 光源となる水銀ランプと、該光銀ランプの照射光を
集束せしめる凸レンズと、パターンマスクと、感光剤を
塗布した転写物とがこの順に配置され、 前記凸レンズと前記パターンマスクの間の空間か塵埃に
対して密閉されてなることを特徴とする露光装置。 2 前記凸レンズと前記パターンマスクの間の空間にH
2ガス若しくはクリーンエアーを導入する機構及び前記
空間から前記N2ガス若しくはクリーンエアーを強制的
に排気する機構とを備えてなることを特徴とする実用新
案登録請求の範囲第1項記載の露光装置。
[Claims for Utility Model Registration] 1. A mercury lamp serving as a light source, a convex lens that focuses the irradiation light of the silver lamp, a pattern mask, and a transfer material coated with a photosensitizer are arranged in this order, and the convex lens and An exposure apparatus characterized in that the space between the pattern masks is sealed against dust. 2 H in the space between the convex lens and the pattern mask
2. The exposure apparatus according to claim 1, further comprising a mechanism for introducing N2 gas or clean air, and a mechanism for forcibly exhausting the N2 gas or clean air from the space.
JP7340183U 1983-05-16 1983-05-16 exposure equipment Pending JPS59178646U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7340183U JPS59178646U (en) 1983-05-16 1983-05-16 exposure equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7340183U JPS59178646U (en) 1983-05-16 1983-05-16 exposure equipment

Publications (1)

Publication Number Publication Date
JPS59178646U true JPS59178646U (en) 1984-11-29

Family

ID=30203524

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7340183U Pending JPS59178646U (en) 1983-05-16 1983-05-16 exposure equipment

Country Status (1)

Country Link
JP (1) JPS59178646U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07201728A (en) * 1993-12-03 1995-08-04 Asm Lithography Bv Illumination unit
JP2015126044A (en) * 2013-12-26 2015-07-06 ウシオ電機株式会社 Vacuum-ultraviolet light irradiation processing apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07201728A (en) * 1993-12-03 1995-08-04 Asm Lithography Bv Illumination unit
JP2015126044A (en) * 2013-12-26 2015-07-06 ウシオ電機株式会社 Vacuum-ultraviolet light irradiation processing apparatus

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