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JPS59134776A - Novel thioester compound - Google Patents

Novel thioester compound

Info

Publication number
JPS59134776A
JPS59134776A JP964883A JP964883A JPS59134776A JP S59134776 A JPS59134776 A JP S59134776A JP 964883 A JP964883 A JP 964883A JP 964883 A JP964883 A JP 964883A JP S59134776 A JPS59134776 A JP S59134776A
Authority
JP
Japan
Prior art keywords
compound
triphenylmethyl
thioester compound
mercaptan
equimolar
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP964883A
Other languages
Japanese (ja)
Other versions
JPH0357893B2 (en
Inventor
Yoshio Okamoto
佳男 岡本
Koichi Hatada
畑田 耕一
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daicel Corp
Original Assignee
Daicel Chemical Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Chemical Industries Ltd filed Critical Daicel Chemical Industries Ltd
Priority to JP964883A priority Critical patent/JPS59134776A/en
Publication of JPS59134776A publication Critical patent/JPS59134776A/en
Publication of JPH0357893B2 publication Critical patent/JPH0357893B2/ja
Granted legal-status Critical Current

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  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)

Abstract

NEW MATERIAL:The thioester compound of formula (R is H or CH3). EXAMPLE:S-Triphenylmethyl thiomethacrylate. USE:Useful as a raw material for the preparation of a functional polymer having optical resolution activity. The obtained polymer has high resistance to hydrolysis and solvolysis. PROCESS:The titled compound can be prepared by dissolving triphenylmethyl mercaptan in a solvent such as diethyl ether, THF, etc., reacting with equimolar or somewhat excess NaH, and adding equimolar or somewhat excess methacryloyl chloride or acryloyl chloride based on the mercaptan.

Description

【発明の詳細な説明】 本発明は新規なチオエステル化合物に関する0即ち、本
発明は一般式 (式中、RはH又はOH,である) で表わされる新規なチオエステル化合物を提供するもの
である。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a novel thioester compound.That is, the present invention provides a novel thioester compound represented by the general formula (wherein R is H or OH).

本発明の化合物はビニル基を有するため重合及び共重合
が可能で有用な重合体を与えうるものである。
Since the compound of the present invention has a vinyl group, it can be polymerized and copolymerized to give a useful polymer.

本発明の化合物は、通常のチオエステルの合成法を適用
することによシ合成することができる。例えば、トリフ
ェニルメチルメルカプタンをジエチルエーテル、テトラ
ヒドロフラン等の溶媒に溶解させ、これ忙等モルか若干
過剰の水素化ナトリウムを加えて反応させた後、トリフ
ェニルメチルメルカプタンに対して等モルか若干過剰の
メタクリル酸クロリド又は、アクリル酸クロリドを添加
することによシ、本発明の化合物であるチオメタクリル
酸s−hリフェニルメチル又はチオアクリル酸S−)リ
フェニルメチルが容易に得られる。
The compound of the present invention can be synthesized by applying a conventional thioester synthesis method. For example, triphenylmethyl mercaptan is dissolved in a solvent such as diethyl ether or tetrahydrofuran, and then an equimolar or slightly excess amount of sodium hydride is added and reacted. By adding methacrylic acid chloride or acrylic acid chloride, the compound of the present invention, s-hliphenylmethyl thiomethacrylate or S-)liphenylmethyl thioacrylate, can be easily obtained.

本発明の化合物は、メタクリル酸トリノエニルメチル又
はアクリル酸トリフェニルメチルのようなエステル化合
物と比較して、酸性および中性条件下での加水分解速度
ならびにアルコールによる加溶媒分解速度が遅く、本発
明の化合物を重合して得られた高分子物質も耐加水分解
性、耐加溶媒分解性に富むことが期待される。
The compounds of the present invention have a lower rate of hydrolysis under acidic and neutral conditions and a slower rate of solvolysis with alcohol than ester compounds such as trinoenylmethyl methacrylate or triphenylmethyl acrylate, and the present invention It is expected that the polymeric substance obtained by polymerizing the compound will also have high hydrolysis resistance and solvolysis resistance.

本発明の化合物は、例えば光学活性なアニオン重合開始
剤を用いてイオン重合を行うと、光学活性な重合体を与
える。また、同様の方法でコモノマーとしてメタクリル
酸トリフェニル等のメタクリル酸エステルやアクリル酸
エステル化合物と任意の割合で共重合できる。さらにス
チレン誘導体、共役ジエン類等とはブロック共重合体、
グラフト共重合体を合成することが可能である。
When the compound of the present invention is subjected to ionic polymerization using, for example, an optically active anionic polymerization initiator, an optically active polymer is obtained. Further, in a similar manner, it can be copolymerized with a methacrylic acid ester such as triphenyl methacrylate or an acrylic acid ester compound as a comonomer in any ratio. Furthermore, styrene derivatives, conjugated dienes, etc. are block copolymers,
It is possible to synthesize graft copolymers.

得られた光学活性な高分子物質は、光学分割能を持つ機
能性ポリマーとして有用である0次に本発明の化合物を
実施例に沿って詳述する○ 実施例1 トリフェニルメチルメルカプタン5りを、ジエチルエー
テル6r3mtに溶かし、これに水素イヒナ) IJウ
ム0.48 WをOCで加えた。生成j7たナトリウム
塩にメタクリル酸クロリド2vを添加し、75分反応さ
せた後、反応液に飽a炭酸ナトリウム水溶液を加えてエ
ーテルで抽出した。
The obtained optically active polymeric substance is useful as a functional polymer having optical resolving power. , dissolved in 6r3mt of diethyl ether, and 0.48 W of hydrogen was added thereto under OC. After adding 2v of methacrylic acid chloride to the sodium salt produced and reacting for 75 minutes, a saturated aqueous sodium carbonate solution was added to the reaction solution, and the mixture was extracted with ether.

エーテル層を硫酸マグネシウムで乾燥し、溶媒を留去し
た後、残渣をエタノールで抽出し、不溶部を除いた。エ
タノールを留去して得た粗生成物をエーテルより再結晶
した。収率1.5り(24%)、融点120〜121 
c0チオメタクリル酸s−トリフェニルメチルであるこ
との確認は’H−NM、R、IRスペクトルおよび元素
分析で行った。
The ether layer was dried over magnesium sulfate, the solvent was distilled off, and the residue was extracted with ethanol to remove the insoluble portion. The crude product obtained by distilling off the ethanol was recrystallized from ether. Yield 1.5 liters (24%), melting point 120-121
It was confirmed that it was c0 s-triphenylmethyl thiomethacrylate by 'H-NM, R, IR spectra and elemental analysis.

1H−N M R(100MHz! 0C1ll中、5
5r)α−CH,δt a 5(ppm) 二an25.45 、5.98 壜 7.15 ・工R測定 \0−0  1670on’ 0−0  1625 ・元素分析 測定値 計算値(C,H,、oO8) 0 : 80.21%   B 0.20多H:  5
.79     5.85 s:951     9.51 出願人代理人 古 谷    馨
1H-NMR (100MHz! 0C1ll, 5
5r) α-CH, δt a 5 (ppm) 2 an25.45, 5.98 Bottle 7.15 ・Eng R measurement\0-0 1670on' 0-0 1625 ・Elemental analysis measured value Calculated value (C, H, , oO8) 0: 80.21% B 0.20% H: 5
.. 79 5.85 s:951 9.51 Applicant's agent Kaoru Furuya

Claims (1)

【特許請求の範囲】 一般式 (式中、RはH又はCH,である) で表わされる新規なチオエステル化合物0[Claims] general formula (In the formula, R is H or CH.) A novel thioester compound represented by 0
JP964883A 1983-01-24 1983-01-24 Novel thioester compound Granted JPS59134776A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP964883A JPS59134776A (en) 1983-01-24 1983-01-24 Novel thioester compound

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP964883A JPS59134776A (en) 1983-01-24 1983-01-24 Novel thioester compound

Publications (2)

Publication Number Publication Date
JPS59134776A true JPS59134776A (en) 1984-08-02
JPH0357893B2 JPH0357893B2 (en) 1991-09-03

Family

ID=11726030

Family Applications (1)

Application Number Title Priority Date Filing Date
JP964883A Granted JPS59134776A (en) 1983-01-24 1983-01-24 Novel thioester compound

Country Status (1)

Country Link
JP (1) JPS59134776A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002067283A1 (en) * 2001-02-22 2002-08-29 Siemens Aktiengesellschaft Electromechanical component
US20130035414A1 (en) * 2010-03-01 2013-02-07 Contamac Limited High refractive index polymer composition for opthalmic applications
US10155879B2 (en) 2015-12-21 2018-12-18 AZ Electronic Materials (Luxembourg) S.à.r.l. Compositions and use thereof for modification of substrate surfaces

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002067283A1 (en) * 2001-02-22 2002-08-29 Siemens Aktiengesellschaft Electromechanical component
US20130035414A1 (en) * 2010-03-01 2013-02-07 Contamac Limited High refractive index polymer composition for opthalmic applications
US10155879B2 (en) 2015-12-21 2018-12-18 AZ Electronic Materials (Luxembourg) S.à.r.l. Compositions and use thereof for modification of substrate surfaces
JP2019505650A (en) * 2015-12-21 2019-02-28 アーゼッド・エレクトロニック・マテリアルズ(ルクセンブルグ)ソシエテ・ア・レスポンサビリテ・リミテ Novel composition and its use for modification of substrate surface

Also Published As

Publication number Publication date
JPH0357893B2 (en) 1991-09-03

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