JPS59116374A - Vapor deposition device - Google Patents
Vapor deposition deviceInfo
- Publication number
- JPS59116374A JPS59116374A JP23243682A JP23243682A JPS59116374A JP S59116374 A JPS59116374 A JP S59116374A JP 23243682 A JP23243682 A JP 23243682A JP 23243682 A JP23243682 A JP 23243682A JP S59116374 A JPS59116374 A JP S59116374A
- Authority
- JP
- Japan
- Prior art keywords
- crucible
- vapor deposition
- cobalt
- raw material
- aperture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007740 vapor deposition Methods 0.000 title claims abstract description 20
- 238000001816 cooling Methods 0.000 claims abstract description 11
- 239000002994 raw material Substances 0.000 claims abstract description 11
- 239000002184 metal Substances 0.000 claims abstract description 10
- 229910052751 metal Inorganic materials 0.000 claims abstract description 10
- 239000000919 ceramic Substances 0.000 claims abstract description 6
- 230000002093 peripheral effect Effects 0.000 claims abstract 3
- 238000000034 method Methods 0.000 claims description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 abstract description 33
- 229910017052 cobalt Inorganic materials 0.000 abstract description 29
- 239000010941 cobalt Substances 0.000 abstract description 29
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052802 copper Inorganic materials 0.000 abstract description 2
- 239000010949 copper Substances 0.000 abstract description 2
- 239000003507 refrigerant Substances 0.000 abstract 1
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000006247 magnetic powder Substances 0.000 description 1
- -1 polyethylene terephthalate Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、例えば磁気テープを製造する際に用いて好適
な蒸着装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of the Invention The present invention relates to a vapor deposition apparatus suitable for use, for example, in manufacturing magnetic tape.
背景技術とその間顯点
従来、非磁性支持体上に所定の入射角の範囲内で金属磁
性材料を斜め蒸着しかかる非磁性支持体上に金R磁性層
を形成する磁気テープの蒸着装置としては第1図に示す
如きものが提案されていた。Background Art and Points of Interest Conventionally, a magnetic tape evaporation apparatus is used to obliquely evaporate a metal magnetic material onto a non-magnetic support within a predetermined incident angle range and form a gold R magnetic layer on the non-magnetic support. Something like the one shown in Figure 1 was proposed.
との第1図に於いて、(1)は所謂斜め蒸着により僅6
気テープを得る磁気テープの蒸着装置を全体として示し
、この磁気テープの蒸着装置(1)の内部(1&)は真
空ポンプ0(2)を甲いて真空とできるように々されて
いる。(3)は非磁性支持体例えば12μ厚のポリエチ
レンテレフタレートフイルムテープを示し、この非磁性
支持体(3)にはパックコートが施されている。まだ、
この非磁性支持体(3)は、回斬軸(4a)を枦として
回転して外観,円柱状で冷却されてその温度がさげられ
ているクーリングキャン(4)に、所定長だけ巻き掛け
られて、所定速度で矢印入方向に移動するようになされ
ている。ここで、非磁性支持体(3)は非磁性支持体供
給用ロール(3a)から供給され、所定長だけクーリン
グキャン(4)に巻き掛けられ、巻取ロール(3b)に
供給される如く々されている。(5)は溶融コバルトを
示し、この溶融コバルト(5)は熱伝導性金属例えば銅
製の坩堝(6)に入れられている。そして、電子銃(図
示せず)によりこの坩堝(6)の溶融コバルトが加熱さ
れた際に、真空ポンプ(2)によシ例えばin − ’
torrの真空層ト々された磁気テープの蒸着装置の
内部(1a)に溶融コバルト(5)が蒸発して飛び出し
、金属磁性材料としてのコバルトが非磁性支持体(3)
上に蒸着される如くなされている。また一方、クーリン
グキャン(4)の水平断面としての円周の法線方向と非
磁性支持体(3)へコバルト(5)が飛んでゆく方向と
のなす角としての入射角θを所定の入射角の範囲内に限
って、コバルトが斜め蒸頒されるようにするため、蒸着
領域規定マスク(7a )(7h )(7c )及び〃
ζ着碩域規定板(8a)(8b)(8c)が図示の如く
設けられている。ここで、規定板(8a)及び(8b)
は夫々蒸着領域のうち入射角の9・b囲を規定ずべくテ
ープ長手方向の間隔を規定し、功定板(8c)はテープ
幅方向下方を規定し、し1示せずも上方をttq、定す
る規定板も規定板(8c)に対応して設けられている。In FIG.
The inside of the magnetic tape deposition apparatus (1) is evacuated by a vacuum pump 0 (2). (3) indicates a non-magnetic support, for example a polyethylene terephthalate film tape having a thickness of 12 μm, and this non-magnetic support (3) is coated with a pack coat. still,
This non-magnetic support (3) is wound around a cooling can (4) for a predetermined length, which rotates around a rotation shaft (4a) and is cylindrical in appearance and cooled to lower its temperature. and moves in the direction indicated by the arrow at a predetermined speed. Here, the non-magnetic support (3) is supplied from the non-magnetic support supply roll (3a), wound around the cooling can (4) by a predetermined length, and then supplied to the take-up roll (3b). has been done. (5) represents molten cobalt, and this molten cobalt (5) is placed in a crucible (6) made of a thermally conductive metal, such as copper. When the molten cobalt in the crucible (6) is heated by an electron gun (not shown), the vacuum pump (2)
Molten cobalt (5) evaporates and jumps out inside the magnetic tape evaporator (1a) in which a vacuum layer of torr is applied, and the cobalt as a metal magnetic material is transferred to the non-magnetic support (3).
It is made to be vapor deposited on top. On the other hand, the incident angle θ, which is the angle between the normal direction of the circumference as a horizontal cross section of the cooling can (4) and the direction in which cobalt (5) flies to the non-magnetic support (3), is determined as the predetermined incident angle. In order to obliquely evaporate cobalt only within the corner range, evaporation area defining masks (7a) (7h) (7c) and
ζ arrival area defining plates (8a), (8b), and (8c) are provided as shown. Here, the regulation plates (8a) and (8b)
define the interval in the longitudinal direction of the tape so as to define the area around the incident angle of 9·b in the vapor deposition region, the gradation plate (8c) defines the lower part in the tape width direction, and the upper part is ttq, not shown. A regulating plate is also provided corresponding to the regulating plate (8c).
また、マスク(7a)(7b)(7c ) (d: 、
+ g件支持体に近接して円弧状に設けられ、マスク(
7λ)及び(7b)にて入射角の範囲を規定すべく長手
方向のi41隔を夫見定すると共にマスク(7c)はテ
ープ幅方向の一方を知定し、図示せずもチー7°幅方向
のもう一方を規定するマスクがマスク(7c)に対応し
て設けられている。そのため、これら規定板(8a)(
8b)(8c)及びマスク(7a)(7b)(7c)と
クーリングキャン(4)と坩堝(6)との相対体層によ
り、非磁性支持体(3)上−\のコ・ぐルトの入射角を
限定でき、所望の斜め蒸着がなされることになる。この
旧め蒸着の手法によれば、針状比の良い磁性粉の金属磁
性層が形成され、製造される磁気テープの保磁力Hcが
」二がって短波長信号の記録が可能となり高密度記録が
実現できるようになる等、磁気テープの性能が向上され
ることが知られている。Also, masks (7a) (7b) (7c) (d: ,
+ g Provided in an arc shape close to the support body, with a mask (
7λ) and (7b) to determine the i41 interval in the longitudinal direction in order to define the range of the incident angle, and the mask (7c) determines one side in the tape width direction. A mask defining the other direction is provided corresponding to the mask (7c). Therefore, these regulation plates (8a) (
8b) (8c) and the opposing layers of the mask (7a) (7b) (7c), the cooling can (4), and the crucible (6), the co-gurt on the non-magnetic support (3) is The incident angle can be limited and desired oblique deposition can be achieved. According to this old vapor deposition method, a metal magnetic layer of magnetic powder with a good acicular ratio is formed, and the coercive force Hc of the manufactured magnetic tape is reduced, making it possible to record short wavelength signals and achieve high density. It is known that the performance of magnetic tapes can be improved, such as by making recording possible.
ところで、かかる蒸着装置にあっては原料としてのコバ
ルトの補給が坩堝(6)上部から行われるため、坩堝(
6)を蒸着装置内に百1′買−する際に配買上の制約を
きたし、最迦の位置間係での斜め蒸着が実籾でき々い場
合も生じた。そのため、坩堝(6)の底部Dr定位置に
開口部を設け、かかる開口部から棒状の固形物となされ
たコバルトのロッドを挿入する試みがなされた。しかし
、」u堝(6)内で一旦溶融したコバルトが再び開口部
から漏洩しないようにするため、外場(6)を形成する
伝導性金属内に冷a手段を旅す構成が必要と方り、コバ
ルトを蒸発させる熱の熱効率が悪化してしまい製造コス
トがかさむ問題があった。また、坩堝(6)内の温度が
不安定になり、従ってコバルトの蒸発h1が不安定にな
り、蒸着により製造される磁気テープの品質のばらつき
を生じる問題があった。By the way, in such a vapor deposition apparatus, cobalt as a raw material is replenished from the upper part of the crucible (6).
6) was placed in the vapor deposition apparatus, which caused constraints in terms of distribution, and there were cases in which diagonal vapor deposition at the last position was difficult to perform on actual rice. Therefore, an attempt was made to provide an opening at the bottom Dr position of the crucible (6) and insert a cobalt rod in the form of a solid rod through the opening. However, in order to prevent the cobalt once melted in the u-shaped chamber (6) from leaking out from the opening again, a configuration is required in which the cooling means travels through the conductive metal forming the external field (6). However, there was a problem in that the thermal efficiency of the heat used to evaporate cobalt deteriorated, increasing manufacturing costs. Furthermore, the temperature inside the crucible (6) becomes unstable, and therefore the evaporation h1 of cobalt becomes unstable, causing a problem of variations in quality of magnetic tapes manufactured by vapor deposition.
発明の目的
本発明はかかる点に鑑み、安定した温間状態で熱効率良
好に試着できる蒸着装置を提供せんとするものである。OBJECTS OF THE INVENTION In view of the above-mentioned problems, the present invention aims to provide a vapor deposition apparatus that allows trial fitting in a stable warm state with good thermal efficiency.
発明の概要
オ発明所着装置は、冷却手段を施すると共に底部所定位
置に原料供給用開口部を設けた熱伝導性金属よりなる坩
堝を有し、坩堝内周面にセラミック層を形成するように
したもので、安定した温度状態で熱力1率自好に蒸着で
きるようにしたものである。Summary of the Invention E The inventive mounting device has a crucible made of a thermally conductive metal that is provided with a cooling means and has an opening for supplying raw materials at a predetermined position at the bottom, and is configured to form a ceramic layer on the inner circumferential surface of the crucible. It is designed to allow vapor deposition to occur at a constant rate of thermal power under a stable temperature condition.
実施例
り下・飢2図を参照して木発明蒸着装置の一方7ijl
i例について峠明しよう。このが2図において第1図に
対応する部分には同一符号を付しそれらのn:細々説明
は省略する。7ijl of the wood invention vapor deposition apparatus with reference to Figure 2 below.
Let's talk about example i. In FIG. 2, parts corresponding to those in FIG. 1 are designated by the same reference numerals, and detailed explanation thereof will be omitted.
この@2図は、本実施例における坩堝(9)を全体とし
て示す。(9a)は冷却手段を施した熱伝導性金属成す
る。ここで、(9c)は冷砂循環甲の孔である。This Figure @2 shows the crucible (9) in this example as a whole. (9a) is made of a thermally conductive metal provided with cooling means. Here, (9c) is a hole in the cold sand circulation shell.
また(9d)は坩堝(9)の底部所定位置に設けた原料
供給用開口部を示し、この原料供給用開口部より棒状の
固形物となされた蒸着物廼としてのコバルトのロッド(
9e)を所定速度で挿入できるようにする。In addition, (9d) shows a raw material supply opening provided at a predetermined position on the bottom of the crucible (9), and a cobalt rod (
9e) can be inserted at a predetermined speed.
171示せずも一つの電子銃の電子ビームによシこの坩
堝(9)のコバルトを加熱してコバルトのロッド(9e
)を溶融すると共にこの溶融コバルト(5)ヲ蒼発させ
て飛び出させるようにする。尚、他の部分は彷来の完p
装杵と同様に構成するものとする。171 Cobalt in this crucible (9) is heated by the electron beam of one electron gun (not shown) to form a cobalt rod (9e).
) is melted and this molten cobalt (5) is made to emit blue light and fly out. In addition, the other parts are Akira's complete page.
It shall be constructed in the same way as a punch.
このように綿成された本実施例においても従来同様坩堝
(9)より溶融コバルトが蒸発して真空76着がなされ
るが1、従来と界なりコバルトのロッド(9e)が坩堝
の底部から坤料としてtW;入されて坩堝(9)ひとつ
が加熱されることにより、コバルトが坩堝(9)内部で
一旦溶融される。ここで、一旦溶融したコバルトは鍋坩
堝(9)が冷却手段を備えているため原料供給用−口部
(9d)から漏洩するととe」、なり0そして、さらに
同一の坩堝(9)内で所定湯度まで加熱されたコバルト
が蒸発して飛び出すととになる。In this embodiment, the molten cobalt is evaporated from the crucible (9) and vacuum bonding is performed as in the conventional method, but unlike the conventional method, the cobalt rod (9e) is released from the bottom of the crucible Cobalt is once melted inside the crucible (9) by heating one of the crucibles (9). Here, since the pot crucible (9) is equipped with a cooling means, the cobalt once melted leaks from the raw material supply opening (9d). When the cobalt is heated to a predetermined temperature, it evaporates and flies out.
この際坩堝(9)の内層がセラミックにより形成されて
いるので温度が安定しておりh発41+−が安定な氷づ
18となる。At this time, since the inner layer of the crucible (9) is made of ceramic, the temperature is stable, and the h eruption 41+- becomes a stable ice cube 18.
このように、本@%1例に依れば坩堝(9)内周が一ヒ
ラミックゆえ淵11)’が安定17、コバルトのき発号
を安定とできる牙11益がある6また、都却手段を設け
たので月1を肩(9)へのコバルトの仲、給を相思(9
)2音l′、より行なえ、コ・マルトを坩堝(9)へ供
給するため(二溶融させるだめの加熱と、芹、発させる
ための加11同一坩堝できるので、熱効率を改善できる
牙!1益がある。寸だ、コバルトの坩堝(9)への供給
を、底部から混油なくすることができるので、坩堝(9
)の配置首がかかる(II 給を坩堝(6)上方よ9行
なわなHればなら々い場合に比して坩堝(6)の配、買
の自由度がj曽加する利益もある。In this way, according to this @%1 example, the inner circumference of the crucible (9) is one heramic, so the abyss 11)' is stable 17, and there is a benefit of 11 that can make the cobalt issue stable 6. Since we have set up a means, we will have Cobalt on our shoulders (9) once a month, and we will mutually agree on the salary (9).
) 2 sounds l', to supply the co-malt to the crucible (9) (2) to heat the pot to melt it, and to emit it (11), since the same crucible can be used, the thermal efficiency can be improved! There is a benefit. It is possible to supply cobalt to the crucible (9) without mixing oil from the bottom.
There is also the advantage that the degree of freedom in arranging and purchasing crucible (6) is increased compared to the case where the arrangement head of crucible (6) has to be placed above crucible (6).
尚、本発明は上述実施例に限らず本発明の捉旨を逸脱す
ることなくその他fjij hの構成が採り伜ることi
t勿商である。Note that the present invention is not limited to the above-described embodiments, but may be modified to other configurations without departing from the spirit of the present invention.
It's a no-brainer.
発明の効果
以上述べたように、本発明に依れば温度が安定した状態
で、熱効率よく蒸着できる利益がある。Effects of the Invention As described above, the present invention has the advantage of being able to perform vapor deposition with high thermal efficiency while keeping the temperature stable.
また、坩堝の配置に自由度のある蒸着装置の得られる利
益がある。Further, there is an advantage that a vapor deposition apparatus having a degree of freedom in the arrangement of the crucible can be obtained.
第単回説明来の蒸着装置の例を示す断面図、第2図は本
発明蒸着装置の一実施例の要部拡大断面図である。
(5)は溶融コバルト、(9)は坩堝、(9a)は士目
堝本体、(9b)はセラミックの層、(9d)は原料供
給用開口部、(9e )はコバルトのロッドである。
・0・y
1
第2図
東京都゛品川区北品川6丁目5番
6号ソニー・マグネ・プロダク
ツ株式会社内FIG. 2 is a cross-sectional view showing an example of a vapor deposition apparatus from the first explanation, and FIG. 2 is an enlarged cross-sectional view of a main part of an embodiment of the vapor deposition apparatus of the present invention. (5) is molten cobalt, (9) is a crucible, (9a) is a crucible body, (9b) is a ceramic layer, (9d) is a raw material supply opening, and (9e) is a cobalt rod.・0・y 1 Figure 2 Inside Sony Magne Products Co., Ltd., 6-5-6 Kitashinagawa, Shinagawa-ku, Tokyo
Claims (1)
を設けた熱伝導性金属よシなる坩堝を有し、該坩堝内周
面にセラミック層を形成するようにしたことを特徴とす
る蒸着装置。A vapor deposition method comprising a crucible made of a thermally conductive metal which is provided with a cooling means and has an opening for supplying raw material at a predetermined position in the hood, and a ceramic layer is formed on the inner peripheral surface of the crucible. Device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23243682A JPS59116374A (en) | 1982-12-23 | 1982-12-23 | Vapor deposition device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP23243682A JPS59116374A (en) | 1982-12-23 | 1982-12-23 | Vapor deposition device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS59116374A true JPS59116374A (en) | 1984-07-05 |
Family
ID=16939230
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP23243682A Pending JPS59116374A (en) | 1982-12-23 | 1982-12-23 | Vapor deposition device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59116374A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU652039B2 (en) * | 1991-04-12 | 1994-08-11 | Kuraray Co., Ltd. | Process for forming metal film, and aluminum film coated matter |
-
1982
- 1982-12-23 JP JP23243682A patent/JPS59116374A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
AU652039B2 (en) * | 1991-04-12 | 1994-08-11 | Kuraray Co., Ltd. | Process for forming metal film, and aluminum film coated matter |
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