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JPS5856428A - 半導体装置 - Google Patents

半導体装置

Info

Publication number
JPS5856428A
JPS5856428A JP56155036A JP15503681A JPS5856428A JP S5856428 A JPS5856428 A JP S5856428A JP 56155036 A JP56155036 A JP 56155036A JP 15503681 A JP15503681 A JP 15503681A JP S5856428 A JPS5856428 A JP S5856428A
Authority
JP
Japan
Prior art keywords
solder
frame
substrate
semiconductor
semiconductor element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56155036A
Other languages
English (en)
Inventor
Yoichiro Nabeshima
鍋島 陽一郎
Shigeaki Nawata
縄田 恵昭
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP56155036A priority Critical patent/JPS5856428A/ja
Publication of JPS5856428A publication Critical patent/JPS5856428A/ja
Pending legal-status Critical Current

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    • H01L24/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/31Structure, shape, material or disposition of the layer connectors after the connecting process
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    • H01L2224/27Manufacturing methods
    • H01L2224/27011Involving a permanent auxiliary member, i.e. a member which is left at least partly in the finished device, e.g. coating, dummy feature
    • H01L2224/27013Involving a permanent auxiliary member, i.e. a member which is left at least partly in the finished device, e.g. coating, dummy feature for holding or confining the layer connector, e.g. solder flow barrier
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    • H01L2224/29001Core members of the layer connector
    • H01L2224/29099Material
    • H01L2224/291Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
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    • H01L2224/484Connecting portions
    • H01L2224/4847Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
    • H01L2224/48472Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area also being a wedge bond, i.e. wedge-to-wedge
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Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。

Description

【発明の詳細な説明】 本発明の半導体装置より詳しくは容器基体への半導体素
子の固着構造に関する。
従来の半導体装置の一例は第1図に示される如き構造を
有する◎同図において、1は金属製の基板(ステム)2
にろう材3にようてろう付けされた半導体素子、4は該
半導体素子1の電極と、基板2にガラス材5により植立
開蓋された外部接続端子6とを接続するリード線、7は
ス密封止用金属キヤ、プである。
このような構造を実現するにあたり、半導体素子1の接
層は、基板2の上にろう材をのせ、その上に半導体素子
1を置き、次に基板2を炉の内に入れ、約300 (C
3の温度でろう材を溶融し、次いでステム2を炉から取
り出して冷却することにより行なわれ、しかる後に前記
したワイヤ取り付けなどの作業が行なわれる。
かかる従来の半導体装置においては、基板2のチ、デ取
付は面は、半導体素子lの面積に相対的にかなり余裕を
もつた面積になっている。このためこの取付は面に半導
体素子lを取付けた場合、半導体素子は一定の場所に定
まらず例えば同図に点線で示す位置に固着されることが
ある。かかる固着状態にあってはリード!4の取付け、
キャップ7の固着等の後の工程に支障をきたす、かかる
工程を人手によってなす場合は、それ相応の手間はかか
るとしてもとにかく半導体素子を収納することはできよ
うが、このことは工程時間の増大、すなわち歩留りの低
下となる。最も重大な問題は、半導体素子が一足の位置
に正しく接着されないとき、工程の自動化を実現し得な
い仁とである。
本発明の目的は上記した従来技術の問題点を解決するk
あり、そのために半導体素子が基体上にろう材により固
着され、前記半導体素子の電極が前記基体に植立固着さ
れた外部接続端子に接続されてなる半導体装置において
、前記基体の素子固着部の周囲に前記ろう材と親和性の
低い物質からなる枠体が配設されてなることを特徴とす
る半導体装置が提供される。
以下、本発明の半導体装置の実施例を添付図面を参照し
て説明する。
第2図以下に本発明にかかる半導体装置が示される。こ
れらの図において、第1図に示された部分と同じ部分は
同一符号を付して示す、かかる半導体装置を断面図と平
面図で示す、なお、半導体素子lは、1辺が0.5 v
m〜15 mm角の大きさ、厚さが200〜300(μ
m〕のもので、基板(ステム)2は例えば銅にニッケル
メッキしたものである。
本発明によれば基板20半導体累子1が接層さるべき位
置の周囲に、ろう材と親和しなi例兄はアルミニウムの
薄膜の枠8を数〔μm〕の膜厚に図示の如き形状に蒸層
等によりて形匠する・この結果、基板20表面には、ろ
う材に親和す不面すなわち半導体素子接着位置と、ろう
材に親和しない部分すなわち枠8の部分とが形成される
。ろう材にき半導体素子の寸法に応じて数〔μm〕の範
囲内で適宜定める。
枠8の内側寸法は半導体素子の外部輪郭より僅かに大と
し、枠8の幅は、半導体素子の1辺の長さの約20%!
1度に定める・ 半導体素子1の接着は上記工程で行なわれる。
かかる接着工程にお−て、半導体素子1と基板2との間
忙は配置されたろう材3が加熱により溶融した場合でも
、かかるろう材は枠8の材料と親和しないから、枠8を
超えて外部に流出することがなく、枠8内に留まる。こ
のため該ろう材3の表面張力によって半導体素子lはそ
の接層されるべき位置に正確に位置ぎめされる。以後か
くの如く正確に位置ぎめされた状態を保ったtま冷却し
て固定される。
かくして、以後の工程での例えば給電用のり一トI線4
の取り付は作業に訃いて、位置調整作業が簡略化され、
自動化が容易になし得るので、製造時間が大いに短縮さ
れるだけでなく、リード線接続などが設計通りに正しく
なされ得るので、製品の信頼性の向上に寄与するところ
大である。
本発明にかかる半導体装置は、基板2に複数個の半導体
素子が接着されるべき場合に特に効果的である。第4図
を参照すると、3個の半導体素子lが同一基板2に接着
され、各半導体素子1は、相互にリード線14によって
接続されている。なお第4図において、既に図示した部
分と同じ部分は同一符号で示す。
半導体素子1は総合的に小型のものでその各々集積回路
が形成されているのであるから、リード線14の各半導
体素子への取り付けKThけるトレランス(許容度)は
きわめて厳しい、かかる実施例において、・同時に溶融
したろう材3はそれぞれ薄膜の枠8内に留まって半導体
素子1の位置を正しく位置ぎめするので、位置ぎめの作
業性に顕著な効果がある。更に、リードl!4.14の
取が付は作業の精度も向上し、複数個の半導体素子の基
板への接着およびそれ以後の工程の自動化が可能になる
以上に説明した如く、本発明にかかる半導体装置におい
ては、半導体素子を基板にろう付けによって接着する場
合に、かかる半導体素子が接層されるべき位置を囲んで
、当該ろう材に親和しない材料で薄膜から成る枠を形成
することにより、当該半導体素子の接層が正しい位置に
なされることを可能にし、その結果、かかる半導体素子
の接着および以後の工程を簡略化しそれが自動的になさ
れることを可能にするだけでなく、半導体素子の接着、
リード線の接続などがきわめて正確になされることを可
能和するので、完成された製品の信頼性の向上に寄与す
る。なお、上記の説明においては半導体素子の接着を例
にとったが、本発明の適用範囲はその場合に駆足される
ものでなく、その他の半導体装fatを基板に接置すべ
き場合にも及ぶ、ま恵、8Mされるべき半導体装置の数
も図示され説明された場合に限られるものではなく、よ
り多くの数のものを接!する場合も本発明の範囲に含ま
れる。
【図面の簡単な説明】
第1図は従来の半導体装置の断面図、第2図と第3図と
は本発明にかかる半導体装置の断面図と平面図、第4図
は本発明の他の実施例の平面図である。 1・・・半導体素子、2・一基板(ステム)、3・・・
ろう材、4.14・・・リード融、5−プラス材、6−
外部接続端子、7・・・キャップ、8−・薄膜の枠・特
許出願人 富士通株式金社 第2図 第3図

Claims (1)

    【特許請求の範囲】
  1. 半導体素子が基体上にろう材により固着され、前記半導
    体素子の電極が前記基体に植立固着された外部接続端子
    に接続されてなる半導体装置において、前記基体の素子
    固着部の周囲に前記ろう材と親和性の低い物質からなる
    枠体が配設されてなることを特徴とする半導体装置。
JP56155036A 1981-09-30 1981-09-30 半導体装置 Pending JPS5856428A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56155036A JPS5856428A (ja) 1981-09-30 1981-09-30 半導体装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56155036A JPS5856428A (ja) 1981-09-30 1981-09-30 半導体装置

Publications (1)

Publication Number Publication Date
JPS5856428A true JPS5856428A (ja) 1983-04-04

Family

ID=15597265

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56155036A Pending JPS5856428A (ja) 1981-09-30 1981-09-30 半導体装置

Country Status (1)

Country Link
JP (1) JPS5856428A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59205730A (ja) * 1983-05-09 1984-11-21 Mitsubishi Electric Corp 半導体装置の製造方法
US4661835A (en) * 1984-01-17 1987-04-28 Robert Bosch Gmbh Semiconductor structure and method of its manufacture

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59205730A (ja) * 1983-05-09 1984-11-21 Mitsubishi Electric Corp 半導体装置の製造方法
US4661835A (en) * 1984-01-17 1987-04-28 Robert Bosch Gmbh Semiconductor structure and method of its manufacture

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