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JPS5823157A - Mass spectrograph - Google Patents

Mass spectrograph

Info

Publication number
JPS5823157A
JPS5823157A JP56121020A JP12102081A JPS5823157A JP S5823157 A JPS5823157 A JP S5823157A JP 56121020 A JP56121020 A JP 56121020A JP 12102081 A JP12102081 A JP 12102081A JP S5823157 A JPS5823157 A JP S5823157A
Authority
JP
Japan
Prior art keywords
ion
hole
electrode
cylindrical
ions
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP56121020A
Other languages
Japanese (ja)
Other versions
JPS6217349B2 (en
Inventor
Tsunezo Takeda
武田 常蔵
Kouzou Miishi
御石 浩三
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Shimazu Seisakusho KK
Original Assignee
Shimadzu Corp
Shimazu Seisakusho KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp, Shimazu Seisakusho KK filed Critical Shimadzu Corp
Priority to JP56121020A priority Critical patent/JPS5823157A/en
Publication of JPS5823157A publication Critical patent/JPS5823157A/en
Publication of JPS6217349B2 publication Critical patent/JPS6217349B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/26Mass spectrometers or separator tubes
    • H01J49/34Dynamic spectrometers
    • H01J49/42Stability-of-path spectrometers, e.g. monopole, quadrupole, multipole, farvitrons

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
  • Electron Tubes For Measurement (AREA)

Abstract

PURPOSE:To detect ions with different masses with the maximum sensitivities, and to reduce the variation of the detection sensitivities caused according to the masses by providing a cylindrical or circular-hole electrode coaxially with an ion-introducing hole, and applying voluntary voltages independently to an ion- discharging hole and the cylindrical or circular-hole electrode. CONSTITUTION:A cylindrical electrode (CP) is placed between an ion-discharging hole plate (P1) and an ion-introducing hole plate (P2), and is located coaxially with an ion-introducing hole (En). The inner diameter of the electrode (CP) is adjusted so that it includes both an ion-discharging hole (Ex) and the hole (En). The hole plates (P1) and (P2) and the electrode (CP) can be earthed independently, and voluntary voltages can be applied to them. Ions, after passing through the hole (Ex), are deflected toward the center of a cylindrical electric field, and receive a divergence-suppressing effect existing within the above electric field before becoming incident upon the hole (En). As a result, since ion beams can be deflected while suppressing the divergence of ions, the transmittance of ions is increased.

Description

【発明の詳細な説明】 本発明は四電極型質量分析装置に関する。四電極型質量
分析装置では四電極(以後単にQ、Pと略記する)質量
分析部の電極の両端にできる電場即ち端縁電場が質量分
析装置の性能を決める要因の一つになっている。本発明
は上記した端縁電場のうちイオン出射側の電場の影響を
改善しようとするものである。またQP質量分析装置で
はイオン源から発せられる光等がイオン検出器に入射し
てノイズとなるのを防ぐためQPの中心軸とイオン検出
器の中心軸とをずらす検出器のオフアクシスP質量分析
装置のイオン出射側の端縁電場の影響の改善に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a four-electrode mass spectrometer. In a four-electrode mass spectrometer, the electric field created at both ends of the electrodes of the four-electrode (hereinafter abbreviated as Q and P) mass spectrometer section, that is, the edge electric field, is one of the factors that determines the performance of the mass spectrometer. The present invention aims to improve the influence of the electric field on the ion exit side of the above-mentioned edge electric field. In addition, in QP mass spectrometers, in order to prevent light emitted from the ion source from entering the ion detector and causing noise, off-axis P mass spectrometry is performed by shifting the center axis of the QP and the center axis of the ion detector. This invention relates to improving the influence of the edge electric field on the ion exit side of the device.

第1図は従来のQP質量分析装置のQP電極のイオン出
射端からイオン検出器までの間の構成の一例を示す。R
1,R2はQ、Pの中の一対の電極棒であシ、PIはイ
オン出射孔板でExはイオン出射孔である。P2はイオ
ン入射孔板でEnはイオン検出器へのイオン入射孔であ
る。EMPはイオン入射孔Enの後に配置されたエレク
トロンマルチプライヤである。図に示されているように
イオン入射孔Knの中心軸はQ、P質量分析部の中心軸
Axよシ側方へずらせである。Dfはイオン出射孔板P
1とイオン入射孔板P2との間に配置されたイオン偏向
電極で適当な電圧を印加しイオン出射孔Exから出射さ
れたイオンをイオン入射孔Enの方へ偏向させる。この
場合偏向電極Dfにはイオン重砲と同符号の電圧が印加
され、イオンを入射孔Enの方へ偏向させる。QP電極
間を安定軌道によって通過したイオンはQP電極の端に
おいて形成されている端縁電場の作用でイオンビームが
発散し、イオン検出器への入射効率が低下する。この作
用の程度はイオンが端縁電場内に滞在している時間に依
存する。従って端縁場の長さと、イオン質量、イオン打
込電圧に依存する。偏向電極Dfはイオンビームをイオ
ン入射孔Enの方へ偏向させることにょシイオン検出器
へのイオン入射効率をある程度向上させるが、上述した
イオンビームの発散に対する入射効率の改善の作用がな
い。この端縁場の作用は上述したようにイオン質量の大
なる程大きい。第2図はこの関係を示している。第2図
は第1図の構成で偏向電極Dfの電圧を変えたときのイ
オン検出強度をイオン質量をパラメータにとって示1シ
たもので、イオン検出強度が最大になる最適偏向電極電
圧がイオン質量によって異ると共にイオン検出強度も質
量によって異り質量の大なるイオンの方が検出感度が低
い。換言すれば第1図に示す従来構成では質量分析装置
全体としてのイオン透過室が悪いだめ感度が低く、しか
も質量によって感度が不同であると云った問題がある。
FIG. 1 shows an example of the configuration of a conventional QP mass spectrometer from the ion exit end of the QP electrode to the ion detector. R
1 and R2 are a pair of electrode rods in Q and P, PI is an ion exit hole plate, and Ex is an ion exit hole. P2 is an ion entrance hole plate, and En is an ion entrance hole into the ion detector. EMP is an electron multiplier placed after the ion entrance hole En. As shown in the figure, the central axis of the ion injection hole Kn is shifted laterally from the central axis Ax of the Q, P mass spectrometer. Df is the ion exit hole plate P
An appropriate voltage is applied by an ion deflection electrode disposed between the ion injection aperture plate P2 and the ion injection aperture plate P2, thereby deflecting the ions emitted from the ion emission aperture Ex toward the ion injection aperture En. In this case, a voltage having the same sign as that of the ion heavy gun is applied to the deflection electrode Df, thereby deflecting the ions toward the entrance hole En. Ions that have passed between the QP electrodes in a stable orbit are diverged into ion beams due to the action of the edge electric field formed at the ends of the QP electrodes, reducing the efficiency of incidence into the ion detector. The extent of this effect depends on the time the ions spend in the edge field. Therefore, it depends on the edge field length, ion mass, and ion implantation voltage. Although the deflection electrode Df improves the efficiency of ion injection into the ion detector to some extent by deflecting the ion beam toward the ion injection hole En, it does not have the effect of improving the injection efficiency against the above-mentioned divergence of the ion beam. As mentioned above, the effect of this edge field increases as the ion mass increases. Figure 2 shows this relationship. Figure 2 shows the ion detection intensity using the ion mass as a parameter when changing the voltage of the deflection electrode Df in the configuration shown in Figure 1.The optimum deflection electrode voltage that maximizes the ion detection intensity is the ion mass. The ion detection intensity also differs depending on the mass, and the detection sensitivity is lower for ions with larger masses. In other words, the conventional configuration shown in FIG. 1 has a problem in that the ion transmission chamber of the entire mass spectrometer is poor and the sensitivity is low, and the sensitivity is not the same depending on the mass.

本発明はこのような問題を改善することを目的とするも
のである。
The present invention aims to improve such problems.

第3図は本発明の一実施例におけるQPのイオン出射端
からイオン検出器に至る部分の構成を示す。R1,R2
はQPの一対の電極棒、Plはイオン出射孔板、P2は
イオン入射孔板で、Exがイオン出射孔、Enがイオン
入射孔でEMI)はエレクトロンマルチプライヤである
。以上の各部の配置は第1図に示した従来例と同じであ
る。この実施例は第1図に示した従来例における偏向電
極Dfに代えて円筒電極cpをイオン出射孔板P1とイ
オン入射孔板P2との間において、イオン入射孔Enと
同軸的に配置した点に特徴がある。円筒電極cpの代り
に円孔を穿った電極板を円孔中心軸がイオン入射孔、K
nの軸と一致するように配置してもよい。なおこの円筒
電極CPの内径(円孔電極の場合は円孔の直径)はイオ
ン出射孔Exとイオン入射孔Enの両方をCPの内径内
に含むような大きさとする。イオン出射孔板2田筒電極
FIG. 3 shows the configuration of the portion from the ion exit end of the QP to the ion detector in an embodiment of the present invention. R1, R2
are a pair of electrode rods of QP, Pl is an ion exit hole plate, P2 is an ion entrance hole plate, Ex is an ion exit hole, En is an ion entrance hole, and EMI) is an electron multiplier. The arrangement of the above parts is the same as the conventional example shown in FIG. In this embodiment, instead of the deflection electrode Df in the conventional example shown in FIG. 1, a cylindrical electrode cp is arranged coaxially with the ion entrance hole En between the ion exit aperture plate P1 and the ion entrance aperture plate P2. There are characteristics. Instead of the cylindrical electrode cp, the electrode plate with a circular hole is arranged so that the central axis of the circular hole is the ion incidence hole, K
It may be arranged so as to coincide with the axis of n. The inner diameter of this cylindrical electrode CP (the diameter of the circular hole in the case of a circular hole electrode) is set so that both the ion exit hole Ex and the ion entrance hole En are included within the inner diameter of the CP. Ion exit hole plate 2 cylinder electrodes.

イオン入射孔板は夫々互に独立にアースでき或は任意の
電圧が印加できるようにしである。
The ion entrance aperture plates can be grounded independently of each other or can be applied with any voltage.

円筒電極はイオンと同符号の電位を印加しているが、そ
の電場はイオン出射孔板やエレクトロンマルチプライヤ
のダイノードの電位の影響を受ける。特に円筒電極の中
心軸付近はイオン出射孔板とエレクトロンマルチプライ
ヤのダイノード電位(イオンと異符合)にほとんど依存
している。
The cylindrical electrode applies a potential of the same sign as the ions, but the electric field is affected by the potential of the ion exit aperture plate and the dynode of the electron multiplier. In particular, the vicinity of the central axis of the cylindrical electrode is almost dependent on the dynode potential (with the opposite sign of the ion) of the ion exit aperture plate and the electron multiplier.

Exを通過したイオンは円筒電場の中心がらずれだ位置
にあるので中心の方向へ偏向され、又この電場内の発散
をおさえる作用を受けEnに入射される。このようにイ
オンの発散をおさえつつイオンビームを偏向できるので
イオンの透過率を向上させることができる。
The ions that have passed through Ex are deflected toward the center because the center of the cylindrical electric field is shifted from the center of the cylindrical electric field, and are incident on En due to the effect of suppressing the divergence in this electric field. In this way, since the ion beam can be deflected while suppressing ion divergence, ion transmittance can be improved.

更(C本発明においては次のような効果が得られる。第
4図は円筒電極電圧を一定に保ちイオン出射孔板P1の
電圧を変えた場合のイオン検出強度をイオン質量をパラ
メータとして示したものである。この図から最大感度を
与えるイオン出射孔板P1の最適電圧がイオン質量に関
係なく略同じになっていることが判る。第5図は第1図
の構成で偏向電極Dfの電圧を一定に保ってイオン出射
孔板P1の電圧を変えた場合のイオン検出強度の関係を
示し、最大感度を与えるイオン出射孔板P1の電圧が質
量数によって異っている。このように本発明の構成によ
るときはイオン出射孔板PIの最適電圧がイオン質量に
よって変らないと云う効果も本発明構成がQ、Pの端縁
電場の影響を軽減する作用の表れと考えられ、Plの電
圧を適当に設定することにより異る質量のイオンを夫々
最大感度で検出でき、かつ夫々の質量のイオンが夫々最
大感度で検出されている結実質量による感度の違いも従
来構成より少くなる。
Furthermore, the following effects can be obtained in the present invention. Figure 4 shows the ion detection intensity using the ion mass as a parameter when the cylindrical electrode voltage is kept constant and the voltage of the ion exit aperture plate P1 is varied. From this figure, it can be seen that the optimum voltage of the ion exit aperture plate P1 that provides maximum sensitivity is approximately the same regardless of the ion mass.Figure 5 shows the voltage of the deflection electrode Df in the configuration of Figure 1. The relationship between the ion detection intensity when the voltage of the ion exit aperture plate P1 is changed while keeping the ion exit aperture plate P1 constant is shown, and the voltage of the ion exit aperture plate P1 that provides the maximum sensitivity differs depending on the mass number. The effect that the optimal voltage of the ion exit aperture plate PI does not change depending on the ion mass when using the configuration shown in FIG. By setting the configuration appropriately, ions of different masses can be detected with maximum sensitivity, and the difference in sensitivity due to the amount of condensate, in which ions of different masses are detected with maximum sensitivity, is also smaller than in the conventional configuration.

【図面の簡単な説明】 第1図は従来例の要部側面図、第2図は上記従来例にお
ける偏向電極電圧とイオン検出強度との関係を示すグラ
フ、第3図は本発明の一実施例装置の要部側面図、第4
図は同実施例におけるイオン出射孔板PIの電圧とイオ
ン検出強度との関係を示すグラフ、第5図は同じ〈従来
例における同様の関係グラフである。 R1,R2・・・QP電極棒、Ex・・・イオン出射孔
、Pl・・・イオン出射孔板、En・・・イオン入射孔
、P2・・・イオン入射孔板、KMP・・・エレクトロ
ンマルチプライヤ、CP・・・円筒電極。 代理人 弁理士  縣   浩  介
[Brief Description of the Drawings] Fig. 1 is a side view of the main part of the conventional example, Fig. 2 is a graph showing the relationship between the deflection electrode voltage and ion detection intensity in the conventional example, and Fig. 3 is an embodiment of the present invention. Example: Main part side view of the device, No. 4
The figure is a graph showing the relationship between the voltage of the ion exit aperture plate PI and the ion detection intensity in the same embodiment, and FIG. 5 is a graph showing the same relationship in the conventional example. R1, R2...QP electrode rod, Ex...ion exit hole, Pl...ion exit hole plate, En...ion entrance hole, P2...ion entrance hole plate, KMP...electron multi Pliers, CP...Cylindrical electrode. Agent Patent Attorney Kosuke Agata

Claims (1)

【特許請求の範囲】[Claims] 四重極場の中心軸に対してイオン検出器のイオン入射孔
の中心をずらせた配置において、四重極場後部のイオン
出射孔と上記イオン検出器のイオン入射孔との間に、こ
のイオン入射孔と同軸的に円筒或は円孔電極を設け、上
記イオン出射孔と上記円筒或は円孔電極とに夫々独立し
て任意に電圧を印加し得るようにした質量分析装置。
In an arrangement where the center of the ion entrance hole of the ion detector is shifted from the central axis of the quadrupole field, the ion A mass spectrometer in which a cylindrical or circular hole electrode is provided coaxially with an entrance hole, and a voltage can be arbitrarily applied independently to the ion exit hole and the cylindrical or circular hole electrode.
JP56121020A 1981-07-31 1981-07-31 Mass spectrograph Granted JPS5823157A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56121020A JPS5823157A (en) 1981-07-31 1981-07-31 Mass spectrograph

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56121020A JPS5823157A (en) 1981-07-31 1981-07-31 Mass spectrograph

Publications (2)

Publication Number Publication Date
JPS5823157A true JPS5823157A (en) 1983-02-10
JPS6217349B2 JPS6217349B2 (en) 1987-04-17

Family

ID=14800814

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56121020A Granted JPS5823157A (en) 1981-07-31 1981-07-31 Mass spectrograph

Country Status (1)

Country Link
JP (1) JPS5823157A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6193545A (en) * 1984-10-12 1986-05-12 Japan Atom Energy Res Inst particle analyzer
JPS6170356U (en) * 1984-10-13 1986-05-14
JPS6174951U (en) * 1984-10-19 1986-05-21
JPH0375827U (en) * 1989-11-27 1991-07-30
CN108538703A (en) * 2018-04-23 2018-09-14 魔水科技(北京)有限公司 A kind of mass spectrometric pole bar component and mass spectrograph

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6193545A (en) * 1984-10-12 1986-05-12 Japan Atom Energy Res Inst particle analyzer
JPS6170356U (en) * 1984-10-13 1986-05-14
JPS6174951U (en) * 1984-10-19 1986-05-21
JPH0375827U (en) * 1989-11-27 1991-07-30
CN108538703A (en) * 2018-04-23 2018-09-14 魔水科技(北京)有限公司 A kind of mass spectrometric pole bar component and mass spectrograph
CN108538703B (en) * 2018-04-23 2020-07-03 魔水科技(北京)有限公司 Pole rod assembly of mass spectrometer and mass spectrometer

Also Published As

Publication number Publication date
JPS6217349B2 (en) 1987-04-17

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