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JPS582241A - Manufacture of transparent patterned electrode - Google Patents

Manufacture of transparent patterned electrode

Info

Publication number
JPS582241A
JPS582241A JP9832581A JP9832581A JPS582241A JP S582241 A JPS582241 A JP S582241A JP 9832581 A JP9832581 A JP 9832581A JP 9832581 A JP9832581 A JP 9832581A JP S582241 A JPS582241 A JP S582241A
Authority
JP
Japan
Prior art keywords
metal
transparent
patterned electrode
pattern
salt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9832581A
Other languages
Japanese (ja)
Inventor
Takeshi Ikeda
毅 池田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP9832581A priority Critical patent/JPS582241A/en
Publication of JPS582241A publication Critical patent/JPS582241A/en
Pending legal-status Critical Current

Links

Landscapes

  • Liquid Crystal (AREA)
  • Surface Treatment Of Glass (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Manufacturing Of Electric Cables (AREA)

Abstract

PURPOSE:To form a transparent patterned electrode with high precision in simplified stages by depositing an electrically conductive metal on a substrate, patternwise irradiating the metal with electron beams, locally exfoliating it, and oxidizing the remaining metal. CONSTITUTION:An electrically conductive metal or metallic salt 2' which is made transparent by oxidation, e.g., tin or tin chloride is deposited on a substrate 1 of glass or the like. The metal (salt) is irradiated with electron beams 9 through a negative pattern, and the unnecessary part is locally exfoliated. The patternwise remaining metal (salt) 2' is then oxidized by heating to a high temp. in an oxidizing atmosphere to obtain a transparent patterned electrode. By this method the distance between lines of a patterned electrode and the width of the lines can be controlled easily, and a patterned electrode with high precision can be obtd.

Description

【発明の詳細な説明】 この発明は、液晶表示器などで使用する絶縁基板上の透
明パターン電極の製造方法に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing transparent pattern electrodes on insulating substrates used in liquid crystal displays and the like.

酸化錫や酸化インジウムのような金属の酸化物は、化学
的性質が安定であり、かつ、透明であるから透明電極に
最適であるが、化学的性質が安定なるが故に、エツチン
グなどの加工が困難であって、複雑な工程を経なげれば
透明パターン電極を得ることができなかった。
Metal oxides such as tin oxide and indium oxide have stable chemical properties and are transparent, making them ideal for transparent electrodes. It was difficult to obtain a transparent patterned electrode without going through a complicated process.

たとえば、従来の酸化錫の透明パターン電極の形成方法
は、第1図に示すように、 (5) ガラス基板filを用意し、 Q31  このガラス基板(1)上に塩化錫(2)を塗
布し、C) これを酸素中のような酸化雰囲気中で高温
度に加熱して、塩化錫(211!:酸化錫(3)に変え
、D) この酸化錫膜(3)上に感光剤(4)を塗布し
て乾燥したのち、 E)パターンのポジ像を投影して感光剤(4)t一部分
的に硬化せしめ、現偉処理してマスク・パターン(5)
を形成し、 ■ 水素のような還元雰囲気中で、霧出している酸化錫
膜(3)を金属錫(6)に変え、0 エツチングによっ
て金属錫(6)を削除し、I そして、最仮にマスク・
パターン(5)を剥離することにより、酸化錫(3)の
透明バター/電極を得ていた。
For example, the conventional method for forming a transparent pattern electrode of tin oxide is as shown in Fig. 1: (5) Prepare a glass substrate fil, and apply tin chloride (2) on this glass substrate (1). , C) This is heated to high temperature in an oxidizing atmosphere such as oxygen to convert it into tin chloride (211!: tin oxide (3), and D) A photosensitive agent (4) is applied on this tin oxide film (3). ) is coated and dried, then a positive image of the pattern (E) is projected, the photosensitive agent (4) is partially cured, and the mask pattern (5) is exposed.
■ In a reducing atmosphere such as hydrogen, change the tin oxide film (3) that is coming out into metallic tin (6), remove the metallic tin (6) by etching, and then temporarily mask·
By peeling off the pattern (5), a transparent butter/electrode of tin oxide (3) was obtained.

しかし、このような従来の製造方法によると、感光剤(
4)を用いてマスク・パターン(5)を形成したり、酸
化工程や還元工程を必要とするなどの多玉の工程を経な
ければならなかった。
However, according to such conventional manufacturing methods, the photosensitizer (
4) to form a mask pattern (5), and required oxidation and reduction processes.

そこで、この発明は、このような製造工程上の問題点を
解決するために考えられたものであって、ガラス基板上
に、酸化後、透明で導電性を有する金属または金属の塩
類を付着し、この金属または金属の塩類へネガ・パター
ン状に電子ビームを照射して局部的に剥離し、そCて、
ポジ・パターン状に残存した金属または金属の塩類を酸
素中のような酸化雰囲気中で高温度に加熱して透明パタ
ーン電極を形成することにより、製造工程を簡略化して
製造コストの低減をはかると共に、パターン■・ 精度の向上を実現したものである。
Therefore, the present invention was devised to solve these manufacturing process problems, and involves attaching transparent and conductive metals or metal salts to a glass substrate after oxidation. , irradiate this metal or metal salts with an electron beam in a negative pattern to locally peel them off, and then
By heating the remaining metal or metal salts in a positive pattern to high temperature in an oxidizing atmosphere such as oxygen to form a transparent pattern electrode, the manufacturing process can be simplified and manufacturing costs can be reduced. , pattern■・ Improved accuracy has been achieved.

この発明の透明パターン電極の製造方法は、第2図に示
すように、 (4) ガラス基板(1)を用意し、 田) このガラス基板(1)上に錫または塩化錫のよう
な酸化後、透明で導電性を有する金属または金属の塩類
f2)1を付着し、 IcI  この金属または金属の塩類(2)“に対して
、ネガ・ノくターン状に電子ビーム(9)を照射して不
要な部分を局部的に剥離し、 ■) ボン・パターン状に残存した金属または金属の塩
類(2)°を酸素中のような酸化雰囲気中で高温度に加
熱して酸化せしめれば、透明パターン電極を得ることが
できる。
As shown in FIG. 2, the method for manufacturing a transparent pattern electrode of the present invention includes: (4) preparing a glass substrate (1); , a transparent and conductive metal or metal salt f2)1 is attached, and an electron beam (9) is irradiated onto the metal or metal salt (2) in a negative cross-section. If unnecessary parts are locally peeled off and the remaining metal or metal salts (2)° in a Bon pattern are oxidized by heating to high temperature in an oxidizing atmosphere such as oxygen, it becomes transparent. A patterned electrode can be obtained.

なお、電子ビー−1,+9)の偏向および変!#は、陰
極線管と同様な原理により容易に実施することができる
In addition, the deflection and change of electronic beam-1, +9)! # can be easily implemented using the same principle as a cathode ray tube.

以上で説明したように、この発明の製造方法によると、
製造工程が簡略化されるので製造コストの低減をはかる
ことができる。
As explained above, according to the manufacturing method of this invention,
Since the manufacturing process is simplified, manufacturing costs can be reduced.

さらに、電子ビームは集束し、加速することにより高い
エネルギーが得られ、短時間に不要な金属または金属の
塩類を剥離することができ、パターン電極の線間、線幅
の制御が容易になシ、ずれのない高精度のパターン電極
を得ることができる。
Furthermore, high energy can be obtained by focusing and accelerating the electron beam, making it possible to remove unnecessary metals or metal salts in a short time, and making it easier to control the line spacing and line width of pattern electrodes. , it is possible to obtain highly accurate patterned electrodes without deviation.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は、従来の透明パターン電極の製造方法を工程順
に示した断面図、第2図は、この発明の製造方法の実施
例を工sHK示し走断面図である。 1・・・・・・ガラス基板 2°・・・・・・酸化後、透明で導電性を有する金属ま
たは金属の塩類 3・・・・・・透明導電膜 9・・・・・・電子ビーム ほか1名
FIG. 1 is a sectional view showing a conventional method for manufacturing a transparent pattern electrode in the order of steps, and FIG. 2 is a cross-sectional view showing an embodiment of the manufacturing method of the present invention. 1...Glass substrate 2°...Metal or metal salts that are transparent and conductive after oxidation 3...Transparent conductive film 9...Electron beam 1 other person

Claims (1)

【特許請求の範囲】 ガラスなどの絶縁基板上に、酸化後、透明で導電性を有
する金属または金属の塩類を付着する第1の工程と、 上記金属または金属の塩類へパターン状に電子ビームを
照射して局部的に剥離する第2の工程と、上記第2の工
程において剥離されずに残存した上記金属または金属の
塩類を酸化させる第6の工程と、 よりなることを特徴とする透明パターン電極の製造方法
[Claims] A first step of depositing a transparent and conductive metal or metal salts on an insulating substrate such as glass after oxidation, and applying an electron beam to the metal or metal salts in a pattern. A transparent pattern characterized by comprising: a second step of locally peeling off by irradiation; and a sixth step of oxidizing the metal or metal salts remaining without being peeled off in the second step. Method of manufacturing electrodes.
JP9832581A 1981-06-26 1981-06-26 Manufacture of transparent patterned electrode Pending JPS582241A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9832581A JPS582241A (en) 1981-06-26 1981-06-26 Manufacture of transparent patterned electrode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9832581A JPS582241A (en) 1981-06-26 1981-06-26 Manufacture of transparent patterned electrode

Publications (1)

Publication Number Publication Date
JPS582241A true JPS582241A (en) 1983-01-07

Family

ID=14216745

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9832581A Pending JPS582241A (en) 1981-06-26 1981-06-26 Manufacture of transparent patterned electrode

Country Status (1)

Country Link
JP (1) JPS582241A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4835061A (en) * 1984-11-09 1989-05-30 Konishiroku Photo Industry Co., Ltd. Conductive laminate
CN116093175A (en) * 2023-03-21 2023-05-09 泉州师范学院 Normal-temperature preparation method of large-area patterned tin metal gate line electrode

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4835061A (en) * 1984-11-09 1989-05-30 Konishiroku Photo Industry Co., Ltd. Conductive laminate
CN116093175A (en) * 2023-03-21 2023-05-09 泉州师范学院 Normal-temperature preparation method of large-area patterned tin metal gate line electrode
CN116093175B (en) * 2023-03-21 2023-11-03 泉州师范学院 Normal-temperature preparation method of large-area patterned tin metal gate line electrode

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