JPS58153242A - Manufacture of original disk for phonographic or recording disk - Google Patents
Manufacture of original disk for phonographic or recording diskInfo
- Publication number
- JPS58153242A JPS58153242A JP57035789A JP3578982A JPS58153242A JP S58153242 A JPS58153242 A JP S58153242A JP 57035789 A JP57035789 A JP 57035789A JP 3578982 A JP3578982 A JP 3578982A JP S58153242 A JPS58153242 A JP S58153242A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- resist
- disc
- layer
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 13
- 239000000758 substrate Substances 0.000 claims abstract description 26
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 20
- 238000000034 method Methods 0.000 claims description 11
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 241000219112 Cucumis Species 0.000 claims 1
- 235000015510 Cucumis melo subsp melo Nutrition 0.000 claims 1
- FJJCIZWZNKZHII-UHFFFAOYSA-N [4,6-bis(cyanoamino)-1,3,5-triazin-2-yl]cyanamide Chemical compound N#CNC1=NC(NC#N)=NC(NC#N)=N1 FJJCIZWZNKZHII-UHFFFAOYSA-N 0.000 claims 1
- 239000010408 film Substances 0.000 abstract description 19
- 238000004132 cross linking Methods 0.000 abstract description 6
- 238000006116 polymerization reaction Methods 0.000 abstract description 6
- 230000003287 optical effect Effects 0.000 abstract description 4
- 230000015572 biosynthetic process Effects 0.000 abstract description 3
- 239000010409 thin film Substances 0.000 abstract description 3
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 abstract description 2
- 239000000853 adhesive Substances 0.000 abstract 3
- 230000001070 adhesive effect Effects 0.000 abstract 3
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 abstract 2
- YACLQRRMGMJLJV-UHFFFAOYSA-N chloroprene Chemical compound ClC(=C)C=C YACLQRRMGMJLJV-UHFFFAOYSA-N 0.000 abstract 1
- 150000002825 nitriles Chemical class 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 33
- 230000007547 defect Effects 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- -1 acrylic ester Chemical class 0.000 description 3
- 206010011878 Deafness Diseases 0.000 description 2
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000010137 moulding (plastic) Methods 0.000 description 2
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N Butyraldehyde Chemical compound CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- 229920001800 Shellac Polymers 0.000 description 1
- 239000002174 Styrene-butadiene Substances 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- UUAGAQFQZIEFAH-UHFFFAOYSA-N chlorotrifluoroethylene Chemical group FC(F)=C(F)Cl UUAGAQFQZIEFAH-UHFFFAOYSA-N 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 230000003362 replicative effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000004208 shellac Substances 0.000 description 1
- ZLGIYFNHBLSMPS-ATJNOEHPSA-N shellac Chemical compound OCCCCCC(O)C(O)CCCCCCCC(O)=O.C1C23[C@H](C(O)=O)CCC2[C@](C)(CO)[C@@H]1C(C(O)=O)=C[C@@H]3O ZLGIYFNHBLSMPS-ATJNOEHPSA-N 0.000 description 1
- 229940113147 shellac Drugs 0.000 description 1
- 235000013874 shellac Nutrition 0.000 description 1
- 239000011115 styrene butadiene Substances 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
- G11B23/0057—Intermediate mediums, i.e. mediums provided with an information structure not specific to the method of reproducing or duplication such as matrixes for mechanical pressing of an information structure ; record carriers having a relief information structure provided with or included in layers not specific for a single reproducing method; apparatus or processes specially adapted for their manufacture
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】
〔発明の属する技術分野〕
この発明は高密度情報が記録される音盤・記録盤用原盤
の製造方法に関するものである。q#に、この発明は、
音盤、或いは記録盤用原盤を作成するに先立ってガラス
基盤の表面に被覆されるフォトレジスト膜の形成方法に
関するものである。DETAILED DESCRIPTION OF THE INVENTION [Technical field to which the invention pertains] The present invention relates to a method for manufacturing a master disc for a sound disc or recording disc on which high-density information is recorded. q#, this invention is
The present invention relates to a method for forming a photoresist film to be coated on the surface of a glass substrate before producing a master disc for a sound disc or a recording disc.
従来音盤・記録盤用原盤の製造は、次のように行なわれ
てきた。ガラス基盤にポジ型レジスト膜を設けた後、プ
リベーキングを行なう。高密度情報を記録するに当って
は、ネガ塵レジストは基盤との密着性、接着性が優れる
反面、高密度即ち高解儂度のパターンが得難く、通常高
密度のパターンが容品に得られるポジ型レジストが用い
られる。Conventionally, master discs for sound discs and recording discs have been manufactured as follows. After providing a positive resist film on a glass substrate, prebaking is performed. When recording high-density information, negative dust resists have excellent adhesion and adhesion to the substrate, but on the other hand, it is difficult to obtain patterns with high density, that is, high resolution. A mold resist is used.
しかしポジ型レジストは基盤との密着性、接着性が小さ
く、シばしばクロム膜など金属薄膜の下引き層が用いら
れる。レジストで被覆されたガラス基盤を回転させなが
ら、レーザの微細スポットに露光し、レジストに感光す
る。次いで現像し、アフターベーキングされたものが音
盤・記録盤用原盤として供される。However, positive resists have poor adhesion and adhesion to the substrate, and often use a subbing layer of a thin metal film such as a chromium film. While rotating the glass substrate coated with resist, it is exposed to a fine laser spot and the resist is exposed to light. The material is then developed and after-baked and used as a master disc for sound discs and recording discs.
しかしながら下引きの金属膜中のピンホールや、それに
伴うポジ型レジスト層のガラス基盤からの脱離など、原
盤の雑音源となり、ピンホールのない一様な膜を設ける
ことが必須であった。このことは音盤・記録盤用原盤(
7)に書き込まれた情報が高密度になればなる程、また
レジスト膜の厚さが薄くなればなる鵬、ピンホールなど
の欠陥になる影響が著しくなる。さらに原盤に生じた欠
陥はスタンパを複製する際の電鋳が繰り返される度に助
長され、一層8/N比の低下をきたす。However, pinholes in the undercoat metal film and associated detachment of the positive resist layer from the glass substrate become a source of noise in the master, so it was essential to provide a uniform film without pinholes. This means that the master disc for sound discs and recording discs (
7) The higher the density of the information written on the resist film, the thinner the resist film, the more noticeable the effects of defects such as holes and pinholes. Furthermore, the defects generated in the master disk are aggravated each time electroforming is repeated when replicating the stamper, further reducing the 8/N ratio.
例えば静止画傷情報ファイル用原盤(第2−b図)では
、トラッキング用の案内溝(9)が設けられている。ス
タンパへの複製、プラスチック成形等がはり理想的に行
なわれると仮定し、成形後のディスクが、アクリル樹脂
(屈折率1,5)で形成さ蜆He−Neレーザ(632
8K )で書み取る場合入^即ち790 Xの案内溝の
深さが最もトラッキングが容易となる。アクリル基盤を
介して書み取るには、527 X程度の深さに匹敵する
。この値は半導体製造の分野で既に行なわれている塗工
技術と比べ極めて高精細な薄膜塗工技術が必要となって
いる。For example, the master disc for the still image flaw information file (FIG. 2-b) is provided with a guide groove (9) for tracking. Assuming that copying to a stamper, plastic molding, etc. are carried out ideally, the molded disk is made of acrylic resin (refractive index 1.5) and a He-Ne laser (632
When writing at 8K), tracking is easiest when the depth of the guide groove is 790X. For writing through acrylic substrates, this corresponds to a depth of about 527X. This value requires extremely high-definition thin film coating technology compared to the coating technology already in use in the field of semiconductor manufacturing.
すなわちj@1図は従来の音盤・記録盤用原盤の製造方
法の工程k (a)〜(C)を示し、0図は得られた原
盤の縦断面図、萬2図は得られた原盤の平間図である。That is, Figure j@1 shows the steps k (a) to (C) of the conventional manufacturing method for master discs for sound discs and recording discs, Figure 0 is a longitudinal cross-sectional view of the obtained master disc, and Figure 2 is the obtained master disc. It is a Hirama diagram.
図(a)は、ビデオ用、或いはデジタルオーディオ用原
盤のそれで、図(b)は静止画傷情報ファイル用原盤の
一例で、トラッキング用の案内溝をを有している。第1
図(a)において(1)は基板、(2)はポジ型レジス
ト層(3)と基板との密着性、接着性を向上させるため
の金属薄膜から成る下引き層である。同図すにおいて光
学系(4)を通して集束されたレーザ光線(5)をポジ
型レジスト層(3)に露光し感光化を行う。現像により
、ポジ型レジスト層(3)の未感光斌は不溶のためレジ
ストが残り、露光部のレジストは、3J儂剤によって除
去α謙されるため基盤(1)上には凹凸パターン(6)
が生じる。(同C図参照)従来の音盤・記録盤用原盤の
製造の際、用いられてきたポジ型レジストには次のよう
な欠点があった。Figure (a) shows an example of a master disc for video or digital audio, and Figure (b) shows an example of a master disc for still image flaw information files, which has guide grooves for tracking. 1st
In Figure (a), (1) is a substrate, and (2) is an undercoat layer made of a metal thin film for improving the adhesion and adhesion between the positive resist layer (3) and the substrate. In the figure, the positive resist layer (3) is exposed to a focused laser beam (5) through an optical system (4) to sensitize it. Due to development, the unexposed portions of the positive resist layer (3) are insoluble and the resist remains, and the resist in the exposed areas is removed by the 3J agent, leaving a concavo-convex pattern (6) on the substrate (1).
occurs. (See Figure C) The positive resists that have been used in the production of conventional master discs for sound discs and recording discs have the following drawbacks.
(イ)感度が低い。(O)材料の種類が少ない。(ハ)
基板との接着力に劣る。に)ネガ型に比べ、ピンホール
が多い。(b) Sensitivity is low. (O) There are few types of materials. (c)
Poor adhesion to the substrate. ) There are more pinholes than negative types.
他方、他分野で使われているネガ型レジストには、次の
ような欠点がある。(イ)分解能が低い。On the other hand, negative resists used in other fields have the following drawbacks. (b) Resolution is low.
I:
本発明は上記欠点鵞鑑みて改良したものでガラス基盤と
ポジ屋レジスト膜の中間層として両者と接着性に優れる
誘電体層、例えばネガ型レジスト膜が設けられており、
ポジ型レジスト層の厚さがSOO〜1500 A 、好
ましくは500〜800にであり、ピ□ンホール欠陥の
ない高密度配録が可能な廿盤・記録盤用原盤の製造方法
に関する。I: The present invention has been improved in view of the above drawbacks, and includes a dielectric layer, such as a negative resist film, which has excellent adhesion to the glass substrate and the positive resist film as an intermediate layer between the glass substrate and the positive resist film.
The present invention relates to a method for producing a master disc for a disc/recording disc in which the thickness of the positive resist layer is SOO~1500 Å, preferably 500~800 Å, and enables high-density recording without pinhole defects.
音盤、或いは記録盤用原盤を作成するに先立って、ガデ
ス基盤の表面に被覆されるポジ雛フォトレジスト膜と基
盤間に接着層を、その−例としてネガ型レジストの長所
、例えば(イ)感度が高い。(に)ピンホールが少ない
。(ハ)材料の種類が多い0等とポジ型レジストの長所
、例えばピ)解像力が優れている。(ロ)現像時の寸法
精度が良い。等を組み合わせて、ポジ型レジストを単独
で使用する際の欠点を補っている。Before creating a master disc for a sound disc or recording disc, an adhesive layer is applied between the positive photoresist film coated on the surface of the Gaddess base and the base. is high. (in) Fewer pinholes. (c) Advantages of 0 etc. and positive type resists, which have many types of materials, such as (b) excellent resolution. (b) Good dimensional accuracy during development. These are used in combination to compensate for the drawbacks of using a positive resist alone.
以下、この発明の一実施例を図によって説明する。l/
43図はこの発明による音盤・記録盤用原盤の製造方法
の一実施例の一部を示す縦断面図である。第3図におい
て、(t) 、 (a)は基盤及びポジ臘レジストを示
しており、Qllは誘電体層から成るネガ型レジスト層
である。Hereinafter, one embodiment of the present invention will be described with reference to the drawings. l/
FIG. 43 is a longitudinal sectional view showing a part of an embodiment of the method for manufacturing a master disc for a sound disc/recording disc according to the present invention. In FIG. 3, (t) and (a) show a substrate and a positive resist, and Qll is a negative resist layer consisting of a dielectric layer.
本発明に用いる誘電体層としては、ウレタン系。The dielectric layer used in the present invention is urethane-based.
クロロフレン系、ニトリルブタジェン系、スチレンブタ
ジエン系、アクリルエステル系材料の他。In addition to chlorophrene-based, nitrile-butadiene-based, styrene-butadiene-based, and acrylic ester-based materials.
エポキシ系9重合度の低い三弗化塩化エチレン。Epoxy 9 Trifluorochloroethylene with a low degree of polymerization.
多価アルコール、高級アルコール、熱可輩性ポリエステ
ル、塩化ビニリデン、塩化ビニル、酢酸ビニル、ポリエ
チレン、ポリエチレングリコール。Polyhydric alcohol, higher alcohol, thermoplastic polyester, vinylidene chloride, vinyl chloride, vinyl acetate, polyethylene, polyethylene glycol.
エチレンと酢酸ビニル0共重合体、ブチラール。Ethylene and vinyl acetate 0 copolymer, butyral.
アクリレート、ポリアミド、シェラツク、ロジン類、フ
ォトレジスト等が使用可能であり、基盤及びポジ蓋しジ
スト展との接着性が優れるものであれば何でもよい。Acrylate, polyamide, shellac, rosin, photoresist, etc. can be used, and any material can be used as long as it has excellent adhesion to the substrate, positive cover, and resist film.
なお基[(1)とネガ屋しジスト層顛との接着性を一層
高めるため6(Crなとの金属薄膜(1◆が挿入されて
もかまわない。次に光学系(4)を通して・集束された
レーザ光am>tポジ聾レジスト(3)に照射する。In order to further improve the adhesion between the base film (1) and the negative resist layer, a thin metal film (1◆ such as Cr) may be inserted. Next, the optical system (4) is used to The laser beam am>t is irradiated onto the positive deaf resist (3).
ポジ履用の現像剤で現像することによって、露光域のレ
ジスト層は除去されaの未露光域のレジスト層は、残り
al)凹凸パターン(へ)が形成される。By developing with a positive developer, the resist layer in the exposed area is removed, and the resist layer in the unexposed area (a) remains to form an uneven pattern (al).
フォトレジストが凹凸パターンα$を形成するのはH)
重合による分子量増加、(ロ)架橋による分子量増加、
31重合、架橋が同時に起こる架橋重合、に)分子量減
少のいずれかに基因する。The photoresist forms the uneven pattern α$H)
Molecular weight increase due to polymerization, (b) molecular weight increase due to crosslinking,
31 polymerization, cross-linking polymerization in which cross-linking occurs simultaneously; or) molecular weight reduction.
本発明による方法では、glFiAに示す従来例に比較
して、レジスト層の基盤への接着力が大音いため、原盤
形成時のレジストの局所的な脱離に基ずく欠陥がないた
め、さらに電lsKよりスタンパを複製するにも極めて
安定であるため、原盤としてレーザで絖み出しを行った
ところ87N比が60倍、プラスチック成形ディスクで
100倍の改畳を図ることができた。In the method according to the present invention, the adhesion of the resist layer to the base is stronger than in the conventional example shown in glFiA, so there are no defects caused by local detachment of the resist during master formation, and there is no possibility of defects caused by local detachment of the resist during master formation. It is also extremely stable for copying stampers than lsK, so when we used a laser as a master to create a stamp, we were able to increase the 87N ratio by 60 times, and by using a plastic molded disk, we were able to improve it by a factor of 100.
以上、詳述したようにこの発明による音盤・紀#重用原
盤の製造方法においては、基盤上に被覆されるフォト・
レジスト層が基盤によく接着できるよう、高@直の凹凸
パターンを形成するポジ臘レジスト層と基盤との間に、
両者と接着性の優れた誘電層、例えばネガ蓋レジスト層
を設けている。As described above in detail, in the method for manufacturing a master disc for music discs and historical records according to the present invention, the photo-recording material coated on the base plate,
In order for the resist layer to adhere well to the substrate, there is a layer between the positive resist layer and the substrate that forms a highly uneven pattern.
A dielectric layer having excellent adhesion to both is provided, for example, a negative lid resist layer.
そのためレジスト層に欠陥、欠落が全く無い一様なレジ
スト層が得られている。従って原盤においても、プラス
チック成形後のアクリルディスクに2いても信号再生時
に極めて高い87N比を得ることができる効果がある。Therefore, a uniform resist layer with no defects or omissions can be obtained. Therefore, it is possible to obtain an extremely high 87N ratio during signal reproduction, whether it is on an original disc or on an acrylic disc after plastic molding.
第1図は従来の音盤・記録盤用原盤の製造方法を示し、
同(Jl)は、基盤上にレジスト層を設けた感光層の縦
断面図、同(b)は感光層への露光の工程を、同(C)
は、3jl像後の感光層のプロファイルの縦断面図、s
2図は音盤・記録盤用原盤の平面図を示し、同(りは、
ビデオ・ディスク、デジタル・オーディオ・ディスク用
原盤の信号ピットを示す図、同(b)は静止1mmソフ
ァイル用原盤トラッキング用の案内溝を示す図、第3図
は、本発明に基ずく音盤・記録盤用原盤の製造方法を示
し、同(a)は、基盤上にレジスト層を設けた感光層の
縦断面図、同(b)は感光層への露光の工程を、同(C
)は構儂後の感光層のプロファイルを示す図である。
(1)・・・基盤、(3)・・・ポジ橿レジスト膜、(
4)・・・光学系、(5)・・・レーザ光束、(6)、
αη・・・未露光域、@側碍・・・露光域、
H・・・ネガ聾レジスト膜(ill電層)第3図
々Figure 1 shows the conventional manufacturing method for master discs for sound discs and recording discs.
(Jl) is a longitudinal cross-sectional view of a photosensitive layer with a resist layer provided on a substrate, (b) shows the process of exposing the photosensitive layer, and (C) shows the process of exposing the photosensitive layer.
is a vertical cross-sectional view of the profile of the photosensitive layer after the 3jl image, s
Figure 2 shows a plan view of the master disc for sound discs and recording discs.
A diagram showing the signal pits of a master disc for video discs and digital audio discs, (b) is a diagram showing guide grooves for tracking the master disc for a stationary 1 mm sofile, and FIG. A method of manufacturing a master disc for recording discs is shown, in which (a) is a vertical cross-sectional view of a photosensitive layer with a resist layer provided on a substrate, and (b) is a longitudinal cross-sectional view of the photosensitive layer, and (C) shows the process of exposing the photosensitive layer.
) is a diagram showing the profile of the photosensitive layer after construction. (1)...Base, (3)...Positive resist film, (
4)...Optical system, (5)...Laser beam, (6),
αη...Unexposed area, @side...Exposed area, H...Negative deaf resist film (ill electric layer) 3rd figure
Claims (1)
レーザ露光現11により選択的に除去して情報を記録す
るもOKgいて、上記フォトレジスト膜と基盤間に両者
と接着性の優れた誘電層を形成して成ることを4I徴と
する音盤・記録盤用原盤の製造方法0 (2) レーザ露光、現像により選択的に除去される
前記フォト・レジスト膜がポジ型レジスト膜で、接着性
に優れた誘電層がネガ型レジスト膜で成り積層構造を形
成して成ることを特徴とする特許請求の範囲第一項記載
の音盤・記録盤用原盤の製造方法。 (3)基盤上にネガ屋レジストを被覆する第1の工程と
、前記ネガ型レジスト膜をベーキング後、ポジ履レジス
トを前記ネガ型レジスト上に被覆するj12o工程と、
前記基板上に積層されたレジスト膜をべ一牛ング後、レ
ーザー露光を行なうJI3の音盤・記録用原盤の製造方
法。 (4) ポジ瓜レジスト膜の厚さが、soo〜1so
o Xであることを特徴とする特許**’−囲萬−項記
載の音盤・記録盤用原盤の製造方法。[Claims] (υ It is also possible to selectively remove a part of the IMIIiK-coated photoresist film by laser exposure 11 to record information, and to provide excellent adhesion between the photoresist film and the substrate. (2) The photoresist film that is selectively removed by laser exposure and development is a positive resist film, A method for manufacturing a master disc for a sound disc or recording disc according to claim 1, characterized in that the dielectric layer with excellent adhesiveness is made of a negative resist film to form a laminated structure. (3) On the substrate a first step of coating a negative resist on the negative resist; and a j12o step of coating a positive resist on the negative resist after baking the negative resist film;
A method for manufacturing a JI3 sound disk/recording master, which comprises exposing a resist film laminated on the substrate to laser light. (4) The thickness of the positive melon resist film is soo~1so
A method for manufacturing a master disc for a sound disc/record disc as described in the patent **'-Koman- section, characterized in that: oX.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57035789A JPS58153242A (en) | 1982-03-09 | 1982-03-09 | Manufacture of original disk for phonographic or recording disk |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57035789A JPS58153242A (en) | 1982-03-09 | 1982-03-09 | Manufacture of original disk for phonographic or recording disk |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS58153242A true JPS58153242A (en) | 1983-09-12 |
Family
ID=12451674
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57035789A Pending JPS58153242A (en) | 1982-03-09 | 1982-03-09 | Manufacture of original disk for phonographic or recording disk |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58153242A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01143039A (en) * | 1987-11-28 | 1989-06-05 | Toppan Printing Co Ltd | Production of master plate |
JPH01309054A (en) * | 1988-06-07 | 1989-12-13 | Mitsubishi Electric Corp | Formation of fine pattern |
JPH0450845A (en) * | 1990-06-14 | 1992-02-19 | Toyo Ink Mfg Co Ltd | Relief resin printing plate |
US6927016B2 (en) | 2001-10-23 | 2005-08-09 | Matsushita Electric Industrial Co., Ltd. | Blank disc and direct stamper and its manufacturing method |
-
1982
- 1982-03-09 JP JP57035789A patent/JPS58153242A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01143039A (en) * | 1987-11-28 | 1989-06-05 | Toppan Printing Co Ltd | Production of master plate |
JPH01309054A (en) * | 1988-06-07 | 1989-12-13 | Mitsubishi Electric Corp | Formation of fine pattern |
JPH0450845A (en) * | 1990-06-14 | 1992-02-19 | Toyo Ink Mfg Co Ltd | Relief resin printing plate |
US6927016B2 (en) | 2001-10-23 | 2005-08-09 | Matsushita Electric Industrial Co., Ltd. | Blank disc and direct stamper and its manufacturing method |
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