JPS58152304A - Silver coated conductor - Google Patents
Silver coated conductorInfo
- Publication number
- JPS58152304A JPS58152304A JP3459282A JP3459282A JPS58152304A JP S58152304 A JPS58152304 A JP S58152304A JP 3459282 A JP3459282 A JP 3459282A JP 3459282 A JP3459282 A JP 3459282A JP S58152304 A JPS58152304 A JP S58152304A
- Authority
- JP
- Japan
- Prior art keywords
- thickness
- plating
- alloy
- conductor
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 229910052709 silver Inorganic materials 0.000 title claims description 26
- 239000004020 conductor Substances 0.000 title claims description 19
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 title claims 2
- 239000004332 silver Substances 0.000 title claims 2
- 229910001316 Ag alloy Inorganic materials 0.000 claims description 8
- 239000000758 substrate Substances 0.000 claims description 6
- 229910000881 Cu alloy Inorganic materials 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 229910001128 Sn alloy Inorganic materials 0.000 claims description 2
- 239000011247 coating layer Substances 0.000 claims 1
- 238000007747 plating Methods 0.000 description 24
- 238000000576 coating method Methods 0.000 description 13
- 239000011248 coating agent Substances 0.000 description 12
- 229910045601 alloy Inorganic materials 0.000 description 6
- 239000000956 alloy Substances 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- 229910000679 solder Inorganic materials 0.000 description 5
- 229910052718 tin Inorganic materials 0.000 description 4
- 238000005452 bending Methods 0.000 description 3
- 238000005476 soldering Methods 0.000 description 3
- 230000006866 deterioration Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- 229910002696 Ag-Au Inorganic materials 0.000 description 1
- -1 Ag-B1 combination Inorganic materials 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 235000000177 Indigofera tinctoria Nutrition 0.000 description 1
- 240000007594 Oryza sativa Species 0.000 description 1
- 235000007164 Oryza sativa Nutrition 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- 241000270666 Testudines Species 0.000 description 1
- 229910001297 Zn alloy Inorganic materials 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O ammonium group Chemical group [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 235000013339 cereals Nutrition 0.000 description 1
- 238000004581 coalescence Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229940097275 indigo Drugs 0.000 description 1
- COHYTHOBJLSHDF-UHFFFAOYSA-N indigo powder Natural products N1C2=CC=CC=C2C(=O)C1=C1C(=O)C2=CC=CC=C2N1 COHYTHOBJLSHDF-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005272 metallurgy Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000008188 pellet Substances 0.000 description 1
- 235000009566 rice Nutrition 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Non-Insulated Conductors (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
不発萌はAg又はAg合盆?被覆した導′嘔体に関Tる
もので、特に尚占処理によるAgXはAg合斂被&層の
萌良性及び宿看性の劣化を防止したものである。[Detailed Description of the Invention] Is misexploded moe Ag or Ag combination? This relates to the coated body, and in particular, the AgX treatment is one that prevents the deterioration of the growth properties and storage properties of the Ag coalescence coating and layer.
一般に飯被at44体ハ、 Cu、 Cu合金、AA、
AA合忙、Fe、 i’e合斂、Nj、Ni合金等か
らなる導′亀基体上に、Ag又はAg−8b@彼、Ag
−Cu合金、Ag−B1合斂、Ag−Au合盆、Ag−
F3n@r並等を#復したもので、導′屯基俸の潰れた
17Ii度とAg又はAg合址特有の俊れた導′岨性、
一度性、半田付は性寺な併せ有し、電気、電子機器の部
品1例えはコネクター、スイッチ、リレー、端子、半導
体等の製造、組立に広く用いられている。これ等−S電
体は部品加工や組立工程で半田付け、そ−ルデイング、
乾燥等の商温処理が打なわ4、更に機器に組み込まれて
からも長期間を二亘り室温よ11商い昇温状態で使用さ
ねるため面淘に則えることが要求さねている。In general, there are 44 types of rice coverings, Cu, Cu alloy, AA,
Ag or Ag-8b@he, Ag
-Cu alloy, Ag-B1 combination, Ag-Au combination, Ag-
It is a restoration of F3n@r, etc., with the crushed 17Ii degree of the conductor base and the excellent conductor characteristic peculiar to Ag or Ag joints,
Soldering is a once-in-a-lifetime process, and is widely used in the manufacture and assembly of electrical and electronic equipment parts such as connectors, switches, relays, terminals, and semiconductors. These S electric bodies are soldered, soldered, and soldered in the parts processing and assembly process.
Commercial temperature treatments such as drying are no longer necessary4, and furthermore, even after being incorporated into a device, the product is not used at a temperature that is 11 times higher than room temperature for a long period of time, so it is required to comply with the standard.
Ag又はAg合遊は尚価なため、経隣的理由から被覆厚
さケできるだけ趨くTることが求められているが、#電
基体l二よっては基体金属1例えは銅や黄銅ではこれ等
の位属がAg又はAg@斂増内に拡散進入し、Ag又は
Ag@蛍本米の化学的安定性を損ない、酸化により′嘔
気接続性や半田イ=1け性を急激に低ドする。このよう
なAgXは紹合曽盾の劣化は尚扇で加速的に促進し、は
なはだ゛しい場合には外観変色を起1゜こねン勿止−「
るため、#亀基体とAg又はAg@蛍被覆と0〕曲にI
NtlTta′4r′形成している。へiはAgと反応
しないため0.1/i捏反の厚さで人きなバリヤー幼果
を発伸するが、置部、例えば180℃以上の1度では大
気中のr#、累がAg又はAg合金層を浸透してNiが
酸化さね、その結果、Ag又はAg合金層の密肴性が低
ドし、曲げなど0)変形で剥離な起Tはかりか、半田句
は性にも影響する。即ちAgは半田的に迅連に溶解する
ため、酸化した1N重而が露出して半田浴に按するよう
になると篩ね性が租沓されることになる。Since Ag or Ag combination is expensive, it is required for the coating thickness to be as uniform as possible for economical reasons. etc. diffuse into Ag or Ag@condensation, impairing the chemical stability of Ag or Ag@Hotarumotomai, and oxidation rapidly lowers the connectivity and solderability. do. Such AgX accelerates the deterioration of the shoai soshi, and in severe cases it may cause discoloration of the appearance.
#Turtle substrate and Ag or Ag@firefly coating and 0]
NtlTta'4r' is formed. Since hei does not react with Ag, it develops attractive barrier seedlings at a thickness of 0.1/i, but at temperatures above 180°C, for example, r# in the atmosphere, Ni penetrates the Ag or Ag alloy layer and oxidizes, resulting in poor adhesiveness of the Ag or Ag alloy layer, resulting in peeling due to bending, etc. is also affected. That is, since Ag rapidly dissolves in soldering, when the oxidized 1N solids are exposed and placed in the solder bath, the sieving properties are reduced.
このような塊象は導電基体に上1e、 Fe合盆■\ζ
N1合位を用いた場合も同様に起るため、尚占C耐える
必要があるAg又はAg@金被復被覆体では、Ag又は
Ag合金層の厚さを3〜5μ、時にはそれ以上の厚い被
覆が施される場合がある。Such an agglomerate is formed on the conductive substrate by the upper 1e and the Fe joint ■\ζ
The same problem occurs when N1 alignment is used, so for Ag or Ag@gold coatings that need to withstand C, the thickness of the Ag or Ag alloy layer must be increased to 3 to 5 μm, sometimes even thicker. May be coated.
本発明はこi 1′−龜み棟々検討の結果、尚1度にI
II)jえる銀w槍尋″屯体を開発したもので1表向か
上’e、Ni、CO又はその合金からなる専電基体上シ
ミAg又はAg合金を被覆した専醸俸において、該基体
とAg又はAg合金被援層との闇に岸さ0.1)1μ以
上のSn又はSn合金層を設けたことを特徴とするもの
である。The present invention is based on this invention.
II) In the case of a special electric base made of Ni, CO or an alloy thereof, which is coated with Ag or an Ag alloy on the upper side, It is characterized by providing a Sn or Sn alloy layer with a thickness of 0.1) 1μ or more between the substrate and the Ag or Ag alloy supported layer.
即ち本発明導電体は、 ilI”e、 N i、 Co
又はそQ〕合斂からなる導磁基体、或いはCu、 Cu
合金等の基体上にNi、Co又はその合址を被覆した#
竜基俸を用い、その上(二Sn又は8n合釡を被覆し、
その上C二A、l(又はAg合金を被覆したものである
。こハ弄θ)被覆には、#有、スパッタリング、メッキ
、機械的圧右寺、各種の方法か用いられるが、゛嘔気メ
ッキにより被覆することか実用的に最も実施し易い場合
が多い。特にSn又はS 11 @i fi2の被覆に
はアルカリ冶、値酸冶、ボウフッ化浴等公知のメッキ浴
を用いて(T7よえはよい。またSn@址としては5n
−Pb、 5n−Zn、 5n−fNi%か自’9.J
r −Cアロ。That is, the conductor of the present invention has the following characteristics: ilI"e, Ni, Co
or
# Coated with Ni, Co or a combination thereof on a substrate such as an alloy
Using a dragon base, cover it with a 2Sn or 8N pot,
Moreover, C2A, L (or Ag alloy coating) can be coated using various methods such as # coating, sputtering, plating, mechanical compression, etc. Covering with plating is often the easiest practical method to implement. In particular, for coating Sn or S 11 @i fi2, a known plating bath such as alkaline plating, value acid plating, or fluoride bath is used (T7 is good.
-Pb, 5n-Zn, 5n-fNi% or self'9. J
r-C allo.
Sn又はSn@蛍の被覆厚さに001μ以上、望ましく
は0.1〜0.5声とし、被覆厚さか0.01t未満で
は外ダを中の02の献透醒化を防止する効果が期待でき
ない。またbn又はBn合址の被覆厚さの上限ハAg又
はAg台位の被彼岸さ≦二より異なるか、辿′吊は1〜
2μの厚さでその効果が飽和するから、それ以上0)過
剰の被覆は経隘的でないはかりカー簡諷栄件によっては
8nかAg層中に過剰(二拡散合金化して、Ag本本来
0附附性な佃なう場合もあil、実用上は01〜0.5
μ侃が呈よしい。The coating thickness of Sn or Sn@firefly should be 001μ or more, preferably 0.1 to 0.5μ, and if the coating thickness is less than 0.01t, it is expected to be effective in preventing the outer layer from becoming transparent. Can not. Also, the upper limit of the coating thickness of BN or Bn joint site is different from Ag or the equinox of Ag platform ≦2, or the trace thickness is 1~
Since the effect is saturated at a thickness of 2 μm, excess coating beyond this point may be caused by 8n or 8n depending on the convenience of the weighing machine. There may be cases where there is an additional charge, but in practice it is 01 to 0.5.
The mu side looks good.
面、Sn合位とはSnを主成分とする合金で、t1Mn
含有量が多い程旬効であ11、その童は合金の柚知を二
よっても異なるか、約4(」%以上の合金を用いること
が望ましい。plane, Sn alignment is an alloy whose main component is Sn, and t1Mn
The higher the content, the more effective it is11, so it is desirable to use an alloy with a content of about 4% or more.
思ド、本発明4電体な実施例1二ついて説明する。Now, two embodiments of the present invention will be explained.
実施例(II
Dj’−’ia O,5JIia ]純Mnl k ’
a’ 常L CヨiJ Na01(20,V/A、(i
(1=に 0)温浴中で刀ソード脱+111 してか
らH28U4府、甲イニlO抄間デツプした良、へi
(SChNH2h30(M/ApH2,5Q) N i
メッキ!6を用い、′電流’eB 13t l OA/
dm2でメッキを行ない、純南条の表向に厚さ075μ
のN 11% y形成し、その上に5I04201/!
j、)1.80410011/!1%=カワ211/l
v>Snメッキ浴(除温18℃)を用い、屯#L密曳5
A/dmでメッキを社ない、厚さ0.25μo〕snノ
曽をjし成した。伏にこれC二4へ8Cへ2gイン。Example (II Dj'-'ia O, 5JIia] Pure Mnl k'
a' Regular L CyoiJ Na01 (20, V/A, (i
(1 = 0) After taking off the sword +111 in the hot bath, H28U4 Fu, Ko Ini lO Shouma Dep, Ryo, to i
(SChNH2h30(M/ApH2,5Q) N i
plating! 6, 'current'eB 13t l OA/
Plating is done in dm2, and the thickness is 075μ on the surface of pure Nanjo.
of N 11% y and on top of that 5I04201/!
j,) 1.80410011/! 1% = Kawa 211/l
v>Using a Sn plating bath (heat removed at 18°C), tun #L Mihiki 5
The plate was plated at A/dm to a thickness of 0.25 μo. 2g in on this C24 and 8C.
KCN 31)i/# 0) Agストライクメッキ冶
を用い、′鴫m 化度5A/dm 2でAgストライク
メッキし、続いて 5−
AgCN50.9/A、 KCN 10(1,9/A’
O) Ag厚メッキ浴を用い、゛4流密If 2.5
A/dm 2でAg厚メッキをイ丁なイ1,9n層上(
二厚さ約1.5μのAg膚を形成して本発明導電体を装
造した。 ′
実施例f2+
実施例(IIにおいて、sntツキ#)I 11にSn
80440 Ji’/13、ZnS0 7H204(
IJ@/A、りxンfg第2アンモニウム150I/i
:(1’JR4)280a i U (J l/A 、
アンモニア水(約35%〕701//L pH7,5の
5n−Zn合金/ツ+浴Ymい、竜@@ 度1.5A/
dm 2でS n Z n合y(Zn約20%)メッキ
を?Tない1N藍膚上シニ厚さ0.3μのSn−’l、
n合盆膚を形成し、その上に実施例tllと同様にして
厚さ約1.5μのAg膚を形成して本発明導電体を製造
し剋芙施例(3)
実A例tl+において、Snメッキ浴の賛りにNa28
rdJsiUO,V/A、INa(J)i15&/Vの
Snメッキ浴(給温’75℃)ン用い、嵐1lJlt密
度1.5 A/d mでδnメッキを打ないlNi1曽
上に厚さtl、075μのSnJ曽を16敗し、その上
に淳さ約1.5μのAg Inを形成して本発明1s竜
体を製造した。KCN 31) i/# 0) Using Ag strike plating metallurgy, Ag strike plating was applied at a plating degree of 5 A/dm2, followed by 5-AgCN50.9/A, KCN 10 (1,9/A').
O) Using Ag thick plating bath, ゛4 flow density If 2.5
Thick Ag plating was applied at A/dm 2 on the 1,9n layer (
A conductor of the present invention was fabricated by forming an Ag skin with a thickness of about 1.5 μm. 'Example f2+ Example (In II, snt luck #) I 11 Sn
80440 Ji'/13, ZnS0 7H204 (
IJ@/A, Rin fg secondary ammonium 150I/i
:(1'JR4)280a i U (J l/A,
Ammonia water (approx. 35%) 701//L 5n-Zn alloy with pH 7.5/Tsu + bath Ym, Dragon @ degree 1.5A/
S n Z n combination (approximately 20% Zn) plating with dm 2? T-1N indigo skin with a thickness of 0.3 μm,
A conductor of the present invention was manufactured by forming a conductor of the present invention by forming a conductor of the present invention by forming an Ag skin with a thickness of about 1.5 μm on it in the same manner as in Example tll. , Na28 in praise of Sn plating bath
rdJsiUO,V/A, INa(J)i15&/V using Sn plating bath (temperature '75℃), Arashi 1lJlt density 1.5 A/d m without δn plating, lNi1 thickness tl A 1s dragon body of the present invention was manufactured by depositing 16 layers of SnJ with a thickness of 0.075μ and forming Ag In with a thickness of about 1.5μ on it.
6−
比較例(II
実力也例it二おいて、Snメッキ浴によるbnメツキ
ケ価略し、へ1層上シニ曲接厚さ約1.5μのAJ曽な
プレ成して碑屯俸を製送した。6- Comparative Example (II) In Example 2, the BN plating value was omitted using a Sn plating bath, and AJ Sona pre-forming with a thickness of about 1.5 μm was made on the first layer and a monument plate was manufactured and shipped. did.
比較例(2)
Jj 軟例(11において、N1勝」二に直接厚さ3μ
のAg1−を形成して導電体を製造した。Comparative example (2) Jj Soft example (N1 win in 11) Directly on the second thickness 3μ
A conductor was manufactured by forming Ag1-.
比軟例(X3)
比較例(1)において、Ni鳩上に直接厚さ5μのAg
層曽をプレ成して導゛屯体を装造した。Comparative Example (X3) In Comparative Example (1), a 5μ thick Ag layer was applied directly onto the Ni layer.
The conductor was constructed by pre-forming strata.
これ等の各導電体をそれぞれ大気中220℃の温度で2
4時間300℃の温度で1時曲加熱処理した後、180
℃の折番1曲げ加工をfTない、その折り曲げ部を50
倍の拡大鏡で観察し、剥離の有無を調べた。また刀1]
黙処理したものをロジンフラックス処理してから温度2
35℃の共晶半田府に5秒間デツプし、浸漬面に対Tる
半田部れ面積の比率を測足した。これ寺の結果を第1表
に示゛4−0
7−
第1表から明らかなように、本発明導電体は厚さ15μ
のAg被覆で従来導電体の胤さ5μのAg被覆と同等以
上の性能が得ら台ることが判る。Each of these conductors was heated to 220°C in the atmosphere.
After heating for 4 hours at 300℃ for 1 hour, 180℃
℃ fold number 1 bending process is fT, the bending part is 50
It was observed with a magnifying glass to check for peeling. Katana 1]
The silently treated material is treated with rosin flux and then heated to temperature 2.
It was immersed in a eutectic solder bath at 35° C. for 5 seconds, and the ratio of the solder area to the immersed surface was measured. The results are shown in Table 1.4-0 7- As is clear from Table 1, the conductor of the present invention has a thickness of
It can be seen that an Ag coating with a thickness of 5 μm can provide performance equivalent to or better than that of a conventional conductor with an Ag coating with a grain thickness of 5 μm.
実施例(4)
厚さQ、 5 amのNi48%−r’e F)2%合
せ条を常法に、Jl、 11 NaOH2(H1/L
60℃の′&A冶中でカソード脱脂してから15%HC
7(に30秒間デツプした後、5n(Hf!”e)25
0.9/11HBFe100#/AのSnメッキ袷(浴
温15℃)を用い゛亀流布度I OA7’ctm ”で
Mnメツギを行ない、Ni48%−F852%合址条の
表■(二厚さ約05μの9n層を形成し、その上に実施
例(11と同様のAgストライクメッキ浴とAg厚メッ
キ蔭な用いて厚さ2.5μのAg層を形成して本発明導
電体を製造した。Example (4) Thickness Q, 5 am Ni48%-r'e F) 2% bonded strip in the usual manner, Jl, 11 NaOH2 (H1/L
After cathodic degreasing in '&A furnace at 60℃, 15% HC
7(after 30 seconds, 5n(Hf!”e) 25
0.9/11HBFe100#/A Sn-plated liner (bath temperature 15°C) was used to conduct Mn plating at a "torque flow rate IOA7'ctm", and the surface of the Ni48%-F852% joint strip (two thickness A conductor of the present invention was manufactured by forming a 9n layer with a thickness of about 0.05 μm, and then forming an Ag layer with a thickness of 2.5 μm on it using the same Ag strike plating bath as in Example 11 (without using thick Ag plating). .
比較例(41
¥廉例(4目二おいて、Mnメッキ浴による80メツキ
を1略し、N148%−に’652%合金条の表面に直
接厚さ2.5 /jのAg層をに/成して征米辱′岨体
を製造した。Comparative Example (41 ¥ Low Example) 80 plating by Mn plating bath was omitted, and an Ag layer with a thickness of 2.5 /j was directly applied to the surface of the N148%-'652% alloy strip. He then produced a humiliating body.
この両導電俸について、大気中350℃の温度 9−
で30分間加熱処理した後、その表面を50倍拡大鏡で
観察し、表面のフクレ発生を調べると共l二前記と同様
j二して半1l18#;れ性を試験した。Both conductive pellets were heat-treated in the atmosphere at a temperature of 350°C for 30 minutes, and then their surfaces were observed with a 50x magnifying glass to check for blistering. Half 1l18#; resistance was tested.
その結果、実施例(4)により製造した本発明導電体俸
にはフクレが全く認めらねす、半田罵れ性も93%をボ
した。こねに対し、dn膚の形成を1略した比較例(4
)により製造した従来導電体にはφ数のフクレか発止1
2、半田罵れ性は10%以トであった。As a result, no blisters were observed in the conductor of the present invention produced in Example (4), and the solder resistance was 93%. Comparative example (4) in which dn skin formation was omitted by 1
) The conventional conductor manufactured by
2. The solder resistance was 10% or more.
このように本発明導電体は、^高処理におけるAg又は
Ag合並板覆層の耐食性及び密右性の男゛化を防止し%
浚ねた半田付は性を示Tはか1】か、Ag又はAg合合
金金薄くすることかできる1輪的にも後ねたもので、工
業上順者な効果を奏Tるものである。In this way, the conductor of the present invention prevents the corrosion resistance and density of the Ag or Ag laminate cover layer from becoming masculinized during high-temperature processing.
The dredged soldering is a method that shows properties and can be used to thin Ag or Ag alloy alloys, and it has a favorable industrial effect. be.
−l 〇 −-l〇 -
Claims (1)
尋鴫基体上c Ag又はAg合金を#atした導電体に
おいて、該基体とAg又はhg@ 忙被覆層との間に厚
さ0.01 p以上の郭又はSn合金増を設けたことを
特徴とする銀被覆導電体。In a conductor whose surface is made of Ag or an Ag alloy on a substrate made of l'e, Ni, Co or a combination thereof, there is a thickness of 0 between the substrate and the Ag or hg coating layer. A silver-coated conductor characterized in that it is provided with a copper alloy or a Sn alloy of .01 p or more.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3459282A JPS58152304A (en) | 1982-03-05 | 1982-03-05 | Silver coated conductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP3459282A JPS58152304A (en) | 1982-03-05 | 1982-03-05 | Silver coated conductor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS58152304A true JPS58152304A (en) | 1983-09-09 |
Family
ID=12418594
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP3459282A Pending JPS58152304A (en) | 1982-03-05 | 1982-03-05 | Silver coated conductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS58152304A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0242753A (en) * | 1988-03-28 | 1990-02-13 | Texas Instr Inc <Ti> | Corrosion-resistant lead frame |
-
1982
- 1982-03-05 JP JP3459282A patent/JPS58152304A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0242753A (en) * | 1988-03-28 | 1990-02-13 | Texas Instr Inc <Ti> | Corrosion-resistant lead frame |
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