JPS5793222A - Load cell element - Google Patents
Load cell elementInfo
- Publication number
- JPS5793222A JPS5793222A JP55169854A JP16985480A JPS5793222A JP S5793222 A JPS5793222 A JP S5793222A JP 55169854 A JP55169854 A JP 55169854A JP 16985480 A JP16985480 A JP 16985480A JP S5793222 A JPS5793222 A JP S5793222A
- Authority
- JP
- Japan
- Prior art keywords
- resistors
- strain
- thin
- compensating
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010408 film Substances 0.000 abstract 4
- 238000005259 measurement Methods 0.000 abstract 2
- 238000005530 etching Methods 0.000 abstract 1
- 239000010409 thin film Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
- G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
- G01L1/2287—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges constructional details of the strain gauges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/20—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress
- G01L1/22—Measuring force or stress, in general by measuring variations in ohmic resistance of solid materials or of electrically-conductive fluids; by making use of electrokinetic cells, i.e. liquid-containing cells wherein an electrical potential is produced or varied upon the application of stress using resistance strain gauges
- G01L1/2206—Special supports with preselected places to mount the resistance strain gauges; Mounting of supports
- G01L1/2243—Special supports with preselected places to mount the resistance strain gauges; Mounting of supports the supports being parallelogram-shaped
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Measurement Of Force In General (AREA)
Abstract
PURPOSE:To produce elements which can perform accurate measurement in large quantity by dividing at least one of resistors in a bridge circuit into two parts, arranging the resistors at the maximum elongated strain region and contracted strain region, providing variable compensating resistors at the location other than the strain region and connecting them. CONSTITUTION:An insulating film 10, a thin resistor film 11' and a thin connecting film 12' are formed on a strain generating part 5 of a beam body 1. Then etching is performed. A connecting line 12 remains intact as shown in the Figure. The thin connecting flow film 12' on the parts of resistors 11A1-11D2 and compensating resistors 13A-13B is removed. The thin films 11' and 12' on the other parts are removed. The bridge circuit wherein the resistors 11B1-11B2 are arranged with the divided resistors 11A1 and 11A2 is formed. A voltage is applied to one of two pairs of lead wires 16, and an output meter is connected to detect the strain to the other. The variable compensating resistos 13A and 13B are connected between the resistors 11A1 and 11A2 and between 11C1 and 11C2. In this constitution, the connecting wire 12 does not crosss and does not pass the strain region, accurate adjustment of balance can be performed by the compensating resistors, and the elements, which can perform highly accurate measurement can be produced in large quantity.
Priority Applications (12)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55169854A JPS5793222A (en) | 1980-12-02 | 1980-12-02 | Load cell element |
EP81109813A EP0053337B1 (en) | 1980-11-29 | 1981-11-21 | Load cell and method of manufacturing the same |
DE8181109813T DE3176209D1 (en) | 1980-11-29 | 1981-11-21 | Load cell and method of manufacturing the same |
US06/323,726 US4432247A (en) | 1980-11-29 | 1981-11-23 | Load cell having thin film strain gauges |
KR1019810004553A KR860000047B1 (en) | 1980-12-02 | 1981-11-25 | Low cell and manufacturing method |
AU77880/81A AU528989B2 (en) | 1980-11-29 | 1981-11-25 | Load cell and method of manufacturing |
DK524881A DK161215C (en) | 1980-11-29 | 1981-11-26 | LOAD CELL AND PROCEDURE FOR PREPARING IT |
ES507539A ES8303689A1 (en) | 1980-11-29 | 1981-11-27 | Force meter device. (Machine-translation by Google Translate, not legally binding) |
CA000391106A CA1176075A (en) | 1980-11-29 | 1981-11-27 | Load cell and method of manufacturing the same |
ES516545A ES516545A0 (en) | 1980-11-29 | 1982-10-15 | MANUFACTURE METHOD OF A FORCE MEASURING DEVICE. |
KR1019850006622A KR860000048B1 (en) | 1980-12-02 | 1985-09-11 | Load sell and its manufacturing process |
HK988/88A HK98888A (en) | 1980-11-29 | 1988-12-08 | Load cell and method of manufacturing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55169854A JPS5793222A (en) | 1980-12-02 | 1980-12-02 | Load cell element |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5793222A true JPS5793222A (en) | 1982-06-10 |
Family
ID=15894163
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55169854A Pending JPS5793222A (en) | 1980-11-29 | 1980-12-02 | Load cell element |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS5793222A (en) |
KR (1) | KR860000047B1 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4777826A (en) * | 1985-06-20 | 1988-10-18 | Rosemount Inc. | Twin film strain gauge system |
JP2016507742A (en) * | 2013-01-03 | 2016-03-10 | ヴィシャイ プレシジョン グループ, インコーポレイテッドVishay Precision Group, Inc. | Electrical resistance strain gauge with discrete electrical resistance trimming function |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100862848B1 (en) * | 2007-07-04 | 2008-10-09 | 주식회사 포스코 | Molten metal weight detection device using deformation physical quantity measurement of structure |
-
1980
- 1980-12-02 JP JP55169854A patent/JPS5793222A/en active Pending
-
1981
- 1981-11-25 KR KR1019810004553A patent/KR860000047B1/en not_active Expired
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4777826A (en) * | 1985-06-20 | 1988-10-18 | Rosemount Inc. | Twin film strain gauge system |
JP2016507742A (en) * | 2013-01-03 | 2016-03-10 | ヴィシャイ プレシジョン グループ, インコーポレイテッドVishay Precision Group, Inc. | Electrical resistance strain gauge with discrete electrical resistance trimming function |
Also Published As
Publication number | Publication date |
---|---|
KR860000047B1 (en) | 1986-01-30 |
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