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JPS5758316A - Photorepeater - Google Patents

Photorepeater

Info

Publication number
JPS5758316A
JPS5758316A JP55132533A JP13253380A JPS5758316A JP S5758316 A JPS5758316 A JP S5758316A JP 55132533 A JP55132533 A JP 55132533A JP 13253380 A JP13253380 A JP 13253380A JP S5758316 A JPS5758316 A JP S5758316A
Authority
JP
Japan
Prior art keywords
mirror
reticle
transmitted
light
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55132533A
Other languages
Japanese (ja)
Inventor
Takao Nishiguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP55132533A priority Critical patent/JPS5758316A/en
Publication of JPS5758316A publication Critical patent/JPS5758316A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Projection-Type Copiers In General (AREA)

Abstract

PURPOSE:To prepare a plurality of master masks in one repeating operation by splitting a light path of reticle image. CONSTITUTION:The image of reticle 12 is split by a half transmitting mirror. One is transmitted through a mirror 17 and goes to a reflecting mirror 18, and the other is reflected by the mirror 17 and goes to a reflecting mirror 20. The transmitted light is bent by the mirror 18, further bent by a reflecting mirror 19, and transmitted through a reducing lens. Then the reticle image is focussed on the surface of a dry plate 15 on an XY stage 16. On the other hand, the light reflected by the mirror 17 is bent by the mirror 20, passes through a light path compensating glass 21 and a light amount adjusting ND filter 22, and is transmitted through a reducing lens 14'. The reticle image is focussed on the surface of a dry plate 15'. In this constitution, two master masks can be prepared from one reticle at the same time.
JP55132533A 1980-09-24 1980-09-24 Photorepeater Pending JPS5758316A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55132533A JPS5758316A (en) 1980-09-24 1980-09-24 Photorepeater

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55132533A JPS5758316A (en) 1980-09-24 1980-09-24 Photorepeater

Publications (1)

Publication Number Publication Date
JPS5758316A true JPS5758316A (en) 1982-04-08

Family

ID=15083496

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55132533A Pending JPS5758316A (en) 1980-09-24 1980-09-24 Photorepeater

Country Status (1)

Country Link
JP (1) JPS5758316A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5929973A (en) * 1995-11-06 1999-07-27 Nikon Corporation Apparatus and method for simultaneously transferring a mask pattern to both sides of a substrate
US5933216A (en) * 1997-10-16 1999-08-03 Anvik Corporation Double-sided patterning system using dual-wavelength output of an excimer laser
EP1259842A1 (en) * 2000-01-15 2002-11-27 Corning Incorporated System and method for writing fiber gratings

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5929973A (en) * 1995-11-06 1999-07-27 Nikon Corporation Apparatus and method for simultaneously transferring a mask pattern to both sides of a substrate
US5933216A (en) * 1997-10-16 1999-08-03 Anvik Corporation Double-sided patterning system using dual-wavelength output of an excimer laser
EP1259842A1 (en) * 2000-01-15 2002-11-27 Corning Incorporated System and method for writing fiber gratings
EP1259842A4 (en) * 2000-01-15 2005-05-04 Corning Inc System and method for writing fiber gratings

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