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JPS5754319A - DENSHIBIIMUROKOSOCHI - Google Patents

DENSHIBIIMUROKOSOCHI

Info

Publication number
JPS5754319A
JPS5754319A JP12965680A JP12965680A JPS5754319A JP S5754319 A JPS5754319 A JP S5754319A JP 12965680 A JP12965680 A JP 12965680A JP 12965680 A JP12965680 A JP 12965680A JP S5754319 A JPS5754319 A JP S5754319A
Authority
JP
Japan
Prior art keywords
sample table
exposure
cpu15
constitution
conducted
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12965680A
Other languages
Japanese (ja)
Inventor
Takashi Uchiyama
Tadashi Akita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP12965680A priority Critical patent/JPS5754319A/en
Publication of JPS5754319A publication Critical patent/JPS5754319A/en
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Analytical Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To eliminate a useless time for waiting drawing and thereby to conduct exposure of high efficiency by changing the speed of a movable sample table according to the drawing rate of an exposure pattern of a sample. CONSTITUTION:An electron beam 2 is focused on a substrate 7 placed on the movable sample table and is subjected to a position control by a polariscope 5 based on a position instructing signal from CPU15. The position of the sample table is detected by a laser interference length measuring unit 13 and the detection signal thereof is delivered to a motor through the intermediary of a motor controlling unit 14, whereby a feedback control is conducted. To the motor controlling unit 14 is inputted from CPU15 a speed instruction value 18 varying by real time in accordance with a position instruction value 17 and the drawing rate. By this constitution, a useless time is eliminated and thereby exposure of high efficiency can be conducted.
JP12965680A 1980-09-18 1980-09-18 DENSHIBIIMUROKOSOCHI Pending JPS5754319A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12965680A JPS5754319A (en) 1980-09-18 1980-09-18 DENSHIBIIMUROKOSOCHI

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12965680A JPS5754319A (en) 1980-09-18 1980-09-18 DENSHIBIIMUROKOSOCHI

Publications (1)

Publication Number Publication Date
JPS5754319A true JPS5754319A (en) 1982-03-31

Family

ID=15014895

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12965680A Pending JPS5754319A (en) 1980-09-18 1980-09-18 DENSHIBIIMUROKOSOCHI

Country Status (1)

Country Link
JP (1) JPS5754319A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4843563A (en) * 1985-03-25 1989-06-27 Canon Kabushiki Kaisha Step-and-repeat alignment and exposure method and apparatus
EP0878822A1 (en) * 1997-04-10 1998-11-18 Fujitsu Limited Charged Particle beam exposure apparatus having a stage position measurement device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4843563A (en) * 1985-03-25 1989-06-27 Canon Kabushiki Kaisha Step-and-repeat alignment and exposure method and apparatus
US4910679A (en) * 1985-03-25 1990-03-20 Canon Kabushiki Kaisha Step-and-repeat alignment and exposure method and apparatus
EP0878822A1 (en) * 1997-04-10 1998-11-18 Fujitsu Limited Charged Particle beam exposure apparatus having a stage position measurement device

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