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JPS5752132A - Manufacturing apparatus for semiconductor - Google Patents

Manufacturing apparatus for semiconductor

Info

Publication number
JPS5752132A
JPS5752132A JP55127188A JP12718880A JPS5752132A JP S5752132 A JPS5752132 A JP S5752132A JP 55127188 A JP55127188 A JP 55127188A JP 12718880 A JP12718880 A JP 12718880A JP S5752132 A JPS5752132 A JP S5752132A
Authority
JP
Japan
Prior art keywords
supplied
rotary head
solution
semiconductor
high speed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP55127188A
Other languages
Japanese (ja)
Inventor
Terumi Rokushiya
Tatsumi Suganuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP55127188A priority Critical patent/JPS5752132A/en
Publication of JPS5752132A publication Critical patent/JPS5752132A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To accurately perform the developing treatment of a semiconductor in a short time after exposing a photoresist film. CONSTITUTION:Exposed semiconductor wafer 1 is placed on a rotary head 12, and a developer is supplied from a treating liquid reservoir 5 through a valve 6, a shower nozzle 4' to the wafer. During the development, the rotary head 12 is rotated at a low speed of 50-100r.p.m. The supply of a developing solution is controlled by a memory 13 and a CPU11 and is intermittently controlled by a flow rate controller 14. On the other hand, the rotary head 12 is supplied with the solution via a rotation controller 10, motors 3', 3'' and switching mechanism 3a and scatters and removes the developing solution which decreases in the capacity by high speed rotation at 1,000r.p.m. before next solution is supplied after the prescribed period. In this manner, it can develop at high speed accurately.
JP55127188A 1980-09-16 1980-09-16 Manufacturing apparatus for semiconductor Pending JPS5752132A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55127188A JPS5752132A (en) 1980-09-16 1980-09-16 Manufacturing apparatus for semiconductor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55127188A JPS5752132A (en) 1980-09-16 1980-09-16 Manufacturing apparatus for semiconductor

Publications (1)

Publication Number Publication Date
JPS5752132A true JPS5752132A (en) 1982-03-27

Family

ID=14953855

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55127188A Pending JPS5752132A (en) 1980-09-16 1980-09-16 Manufacturing apparatus for semiconductor

Country Status (1)

Country Link
JP (1) JPS5752132A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57118827A (en) * 1981-01-14 1982-07-23 Hitachi Ltd Bulging equipment
JPS58200537A (en) * 1982-05-18 1983-11-22 Toshiba Corp Applying method for resist
DE3612692A1 (en) * 1985-06-05 1986-12-11 Mitsubishi Denki K.K., Tokio/Tokyo NEGATIVE PHOTO PAINT DEVELOPMENT DEVICE
US5252137A (en) * 1990-09-14 1993-10-12 Tokyo Electron Limited System and method for applying a liquid

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5596944A (en) * 1979-01-17 1980-07-23 Matsushita Electric Ind Co Ltd Developing method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5596944A (en) * 1979-01-17 1980-07-23 Matsushita Electric Ind Co Ltd Developing method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57118827A (en) * 1981-01-14 1982-07-23 Hitachi Ltd Bulging equipment
JPS58200537A (en) * 1982-05-18 1983-11-22 Toshiba Corp Applying method for resist
DE3612692A1 (en) * 1985-06-05 1986-12-11 Mitsubishi Denki K.K., Tokio/Tokyo NEGATIVE PHOTO PAINT DEVELOPMENT DEVICE
US5252137A (en) * 1990-09-14 1993-10-12 Tokyo Electron Limited System and method for applying a liquid

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