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JPS5739536A - Method of electron beam exposure - Google Patents

Method of electron beam exposure

Info

Publication number
JPS5739536A
JPS5739536A JP11525680A JP11525680A JPS5739536A JP S5739536 A JPS5739536 A JP S5739536A JP 11525680 A JP11525680 A JP 11525680A JP 11525680 A JP11525680 A JP 11525680A JP S5739536 A JPS5739536 A JP S5739536A
Authority
JP
Japan
Prior art keywords
electron beam
dimension
faraday
cup
nominal value
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11525680A
Other languages
Japanese (ja)
Other versions
JPH0334646B2 (en
Inventor
Tatsuhiko Yamao
Kazumitsu Tanaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Nippon Telegraph and Telephone Corp
Panasonic Holdings Corp
Original Assignee
Jeol Ltd
Matsushita Electronics Corp
Nihon Denshi KK
Nippon Telegraph and Telephone Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Matsushita Electronics Corp, Nihon Denshi KK, Nippon Telegraph and Telephone Corp, Matsushita Electric Industrial Co Ltd filed Critical Jeol Ltd
Priority to JP11525680A priority Critical patent/JPS5739536A/en
Publication of JPS5739536A publication Critical patent/JPS5739536A/en
Publication of JPH0334646B2 publication Critical patent/JPH0334646B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To obtain high accuracy of drawing without irregularity, by a method wherein the longitudinal dimension is determined by the variable cross sectional dimension method and the dosage of an electron beam is measured, and the cross sectional dimension is controlled so that the dosage may be equal to the nominal value. CONSTITUTION:A Faraday-cup 12 is positioned in place of a specimen. Then a dimension specifying signal which controls the dimension of the cross section of an electron beam is transmitted to a deflector 7. A trimmed electron beam is collected by the Faraday-cup 12 and the electron beam current is memorized. Then another signal which specifies the X-axis dimension is transmitted and the electron beam current is measured by the Faraday-cup 12. Then the nominal value of the electron beam current is calculated from the ratio of the electron beam current to the dimension and the nominal value is compared with the measured value. Then Y-axis dimension is controlled in a manner that the difference between that measured value and the nominal value becomes zero so that a suitable Y-axis dimension is obtained. Finally the Faraday-cup is replaced by the specimen and the specimen is exposed to the electron beam.
JP11525680A 1980-08-20 1980-08-20 Method of electron beam exposure Granted JPS5739536A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11525680A JPS5739536A (en) 1980-08-20 1980-08-20 Method of electron beam exposure

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11525680A JPS5739536A (en) 1980-08-20 1980-08-20 Method of electron beam exposure

Publications (2)

Publication Number Publication Date
JPS5739536A true JPS5739536A (en) 1982-03-04
JPH0334646B2 JPH0334646B2 (en) 1991-05-23

Family

ID=14658171

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11525680A Granted JPS5739536A (en) 1980-08-20 1980-08-20 Method of electron beam exposure

Country Status (1)

Country Link
JP (1) JPS5739536A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5435680A (en) * 1977-08-25 1979-03-15 Cho Lsi Gijutsu Kenkyu Kumiai Device for exposing electron beam
JPS54128680A (en) * 1978-03-30 1979-10-05 Jeol Ltd Exposure method for electron rays
JPS5679432A (en) * 1979-12-04 1981-06-30 Jeol Ltd Electron beam exposure process

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5435680A (en) * 1977-08-25 1979-03-15 Cho Lsi Gijutsu Kenkyu Kumiai Device for exposing electron beam
JPS54128680A (en) * 1978-03-30 1979-10-05 Jeol Ltd Exposure method for electron rays
JPS5679432A (en) * 1979-12-04 1981-06-30 Jeol Ltd Electron beam exposure process

Also Published As

Publication number Publication date
JPH0334646B2 (en) 1991-05-23

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