JPS57199251A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS57199251A JPS57199251A JP56085234A JP8523481A JPS57199251A JP S57199251 A JPS57199251 A JP S57199251A JP 56085234 A JP56085234 A JP 56085234A JP 8523481 A JP8523481 A JP 8523481A JP S57199251 A JPS57199251 A JP S57199251A
- Authority
- JP
- Japan
- Prior art keywords
- type
- region
- substrate
- potential
- electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D89/00—Aspects of integrated devices not covered by groups H10D84/00 - H10D88/00
- H10D89/211—Design considerations for internal polarisation
- H10D89/311—Design considerations for internal polarisation in bipolar devices
Landscapes
- Element Separation (AREA)
- Semiconductor Integrated Circuits (AREA)
- Bipolar Transistors (AREA)
Abstract
PURPOSE:To supply a potential to a substrate without additional manufacturing process by a method wherein a base region which has the same type of conductivity as the substrate is formed on an epitaxial layer and netal electrodes are formed on the base region and the potential is to those electrodes. CONSTITUTION:After a buried N<+> type collector region 2 of the first N-P-N transistor 3 and a buried N<+> type collector region 9 of the second N-P-N transistor 8 are formed on a P type semiconductor substrat 1, an N<-> type epitaxial layer 22 is formed in a region 27. And grooves which reach the substrate 1 are provided to the main surface 20 and dielectric regions 15-18 are formed. Then a P type base region 11 of the transistor 8 and a P type region 23 are formed. And N<+> type emitter regions 6 and 12, N<+> type collector electrode diffusion regions 7 and 13 and on N<+> type region 24 are formed. Then metal electrodes 25 and 26 are formed on the regions 23 and 24. When a specified potential is given to the electrodes 25 and 26, the potential is given to the substrate 1.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56085234A JPS57199251A (en) | 1981-06-01 | 1981-06-01 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56085234A JPS57199251A (en) | 1981-06-01 | 1981-06-01 | Semiconductor device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57199251A true JPS57199251A (en) | 1982-12-07 |
JPS634715B2 JPS634715B2 (en) | 1988-01-30 |
Family
ID=13852866
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56085234A Granted JPS57199251A (en) | 1981-06-01 | 1981-06-01 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57199251A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4951102A (en) * | 1988-08-24 | 1990-08-21 | Harris Corporation | Trench gate VCMOS |
US5032529A (en) * | 1988-08-24 | 1991-07-16 | Harris Corporation | Trench gate VCMOS method of manufacture |
-
1981
- 1981-06-01 JP JP56085234A patent/JPS57199251A/en active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4951102A (en) * | 1988-08-24 | 1990-08-21 | Harris Corporation | Trench gate VCMOS |
US5032529A (en) * | 1988-08-24 | 1991-07-16 | Harris Corporation | Trench gate VCMOS method of manufacture |
Also Published As
Publication number | Publication date |
---|---|
JPS634715B2 (en) | 1988-01-30 |
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