JPS57192461A - Photosensitive resin composition - Google Patents
Photosensitive resin compositionInfo
- Publication number
- JPS57192461A JPS57192461A JP7831681A JP7831681A JPS57192461A JP S57192461 A JPS57192461 A JP S57192461A JP 7831681 A JP7831681 A JP 7831681A JP 7831681 A JP7831681 A JP 7831681A JP S57192461 A JPS57192461 A JP S57192461A
- Authority
- JP
- Japan
- Prior art keywords
- printing
- monomer
- compound
- group
- formula
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Polymerisation Methods In General (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
PURPOSE: To provide the titled composition excellent in moisture resistance, solvent resistance and abrasion resistance, further developable with water, by compounding a basic nitrogen containing polyamide, a monomer having photopolymerizable unsaturated bonds wherein part or the whole of the monomer being a specified compound, and a photopolymerization initiator.
CONSTITUTION: A basic nitrogen containing polyamide (a) (e.g. a polymer of N, N'-bis(γ-aminopropyl)piperazine), a monomer (B) having photopolymerizable unsaturated bonds, and a photopolymerization initiator (C) are blended, wherein part or the whole of component B is a compound of formulaI(where X is a divalent 1W24C hydrocarbon group or one having therein an -O-, -COO- or -NHCO- group; Y is a group of formula II, III or IV; R is a 1W10C alkyl or phenyl) (e.g. a compound of the formula V or VI). The cured product obtained therefrom is soft and no uneveness of printing is observed when the product is used in high speed printing or printing for a coarse paper, and excellent mechanical strength and printing abrasion resistance are attained.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7831681A JPS57192461A (en) | 1981-05-22 | 1981-05-22 | Photosensitive resin composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7831681A JPS57192461A (en) | 1981-05-22 | 1981-05-22 | Photosensitive resin composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57192461A true JPS57192461A (en) | 1982-11-26 |
| JPS6367176B2 JPS6367176B2 (en) | 1988-12-23 |
Family
ID=13658526
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7831681A Granted JPS57192461A (en) | 1981-05-22 | 1981-05-22 | Photosensitive resin composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57192461A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61246742A (en) * | 1985-02-12 | 1986-11-04 | 日本ペイント株式会社 | Photosensitive resin composition |
| JPS6392618A (en) * | 1986-10-07 | 1988-04-23 | Sumitomo Chem Co Ltd | Photocurable composition containing phosphate ester |
| JPH02285353A (en) * | 1989-04-27 | 1990-11-22 | Fuji Photo Film Co Ltd | Photosensitive composition |
| JP2000327914A (en) * | 1999-05-24 | 2000-11-28 | Tomoegawa Paper Co Ltd | Aromatic polyamide resin composition |
| JP2001253916A (en) * | 2000-03-10 | 2001-09-18 | Nippon Chem Ind Co Ltd | Fluoroalkyl group-containing phosphonic acid oligomers, method for producing the same, and use thereof |
-
1981
- 1981-05-22 JP JP7831681A patent/JPS57192461A/en active Granted
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61246742A (en) * | 1985-02-12 | 1986-11-04 | 日本ペイント株式会社 | Photosensitive resin composition |
| JPS6392618A (en) * | 1986-10-07 | 1988-04-23 | Sumitomo Chem Co Ltd | Photocurable composition containing phosphate ester |
| JPH02285353A (en) * | 1989-04-27 | 1990-11-22 | Fuji Photo Film Co Ltd | Photosensitive composition |
| JP2000327914A (en) * | 1999-05-24 | 2000-11-28 | Tomoegawa Paper Co Ltd | Aromatic polyamide resin composition |
| JP2001253916A (en) * | 2000-03-10 | 2001-09-18 | Nippon Chem Ind Co Ltd | Fluoroalkyl group-containing phosphonic acid oligomers, method for producing the same, and use thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6367176B2 (en) | 1988-12-23 |
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