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JPS57187028A - High pressure vapor processing device - Google Patents

High pressure vapor processing device

Info

Publication number
JPS57187028A
JPS57187028A JP7233081A JP7233081A JPS57187028A JP S57187028 A JPS57187028 A JP S57187028A JP 7233081 A JP7233081 A JP 7233081A JP 7233081 A JP7233081 A JP 7233081A JP S57187028 A JPS57187028 A JP S57187028A
Authority
JP
Japan
Prior art keywords
high pressure
container
vapor
processing
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7233081A
Other languages
Japanese (ja)
Inventor
Hiroaki Nakamura
Eiichi Yamamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP7233081A priority Critical patent/JPS57187028A/en
Publication of JPS57187028A publication Critical patent/JPS57187028A/en
Pending legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/04—Pressure vessels, e.g. autoclaves

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

PURPOSE:To control reaction or processing temperature and vapor pressure freely and rapidly in a high pressure vapor processing device by installing a container for controlling vapor pressure in addition to a reaction processing container. CONSTITUTION:A high pressure container 11 for reaction processing and the second high pressure container 13 connected thereto and controllable in temperature are installed in a device that makes chemical reaction or processing in high pressure material vapor. The vapor pressure of the stored liquid in the second high pressure container is controlled by temperature, etc. and the vapor pressure and temperature in the first container 11 are set at will.
JP7233081A 1981-05-15 1981-05-15 High pressure vapor processing device Pending JPS57187028A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7233081A JPS57187028A (en) 1981-05-15 1981-05-15 High pressure vapor processing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7233081A JPS57187028A (en) 1981-05-15 1981-05-15 High pressure vapor processing device

Publications (1)

Publication Number Publication Date
JPS57187028A true JPS57187028A (en) 1982-11-17

Family

ID=13486165

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7233081A Pending JPS57187028A (en) 1981-05-15 1981-05-15 High pressure vapor processing device

Country Status (1)

Country Link
JP (1) JPS57187028A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01163433U (en) * 1988-04-22 1989-11-14

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01163433U (en) * 1988-04-22 1989-11-14

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