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JPS57186333A - Projecting exposure device - Google Patents

Projecting exposure device

Info

Publication number
JPS57186333A
JPS57186333A JP56071654A JP7165481A JPS57186333A JP S57186333 A JPS57186333 A JP S57186333A JP 56071654 A JP56071654 A JP 56071654A JP 7165481 A JP7165481 A JP 7165481A JP S57186333 A JPS57186333 A JP S57186333A
Authority
JP
Japan
Prior art keywords
plate
barrel
exposure device
lens
image
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56071654A
Other languages
Japanese (ja)
Inventor
Hiroyuki Shigemura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP56071654A priority Critical patent/JPS57186333A/en
Publication of JPS57186333A publication Critical patent/JPS57186333A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/7005—Production of exposure light, i.e. light sources by multiple sources, e.g. light-emitting diodes [LED] or light source arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Projection-Type Copiers In General (AREA)

Abstract

PURPOSE:To enhance the yield of a product and to shorten the producing time of the product in an image projection exposure device by simultaneously exposing a plurality of original plates on a positive type photosensitive film to form a picture. CONSTITUTION:A dry plate 19 having positive type photosensitive film is placed on an X-Y stage 20 having a monitoring mechanism 23, and a barrel 13 is arranged at the prescribed distance on the plate 19. Two original plates 12, 12' havng the same patterns formed by an electron beam exposure device are set at the port of the upper surface of the barrel 13, and two laps 11, 11' are placed on the plates. In the barrel 13 are provided reflecting mirrors 14-16, a translucent mirror 17, an optical path correcting glass 21, and a light quantity regulating ND filter 22, and a contraction lens 18 is mounted on the surface faced with the plate 19. In the thus structure, the image on the plate 12 is focused through the mirrors 14, 15, 17 and the lens 18 and the image on the plate 12' is focused through the glass 21, the filter 22, the mirror 16, and the lens 18, together on the plate 19.
JP56071654A 1981-05-12 1981-05-12 Projecting exposure device Pending JPS57186333A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56071654A JPS57186333A (en) 1981-05-12 1981-05-12 Projecting exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56071654A JPS57186333A (en) 1981-05-12 1981-05-12 Projecting exposure device

Publications (1)

Publication Number Publication Date
JPS57186333A true JPS57186333A (en) 1982-11-16

Family

ID=13466805

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56071654A Pending JPS57186333A (en) 1981-05-12 1981-05-12 Projecting exposure device

Country Status (1)

Country Link
JP (1) JPS57186333A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5929973A (en) * 1995-11-06 1999-07-27 Nikon Corporation Apparatus and method for simultaneously transferring a mask pattern to both sides of a substrate
US5933216A (en) * 1997-10-16 1999-08-03 Anvik Corporation Double-sided patterning system using dual-wavelength output of an excimer laser
KR100325417B1 (en) * 1999-04-30 2002-02-21 최해용 Wide viewing angle projection system

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5929973A (en) * 1995-11-06 1999-07-27 Nikon Corporation Apparatus and method for simultaneously transferring a mask pattern to both sides of a substrate
US5933216A (en) * 1997-10-16 1999-08-03 Anvik Corporation Double-sided patterning system using dual-wavelength output of an excimer laser
KR100325417B1 (en) * 1999-04-30 2002-02-21 최해용 Wide viewing angle projection system

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