JPS57183029A - Formation of pattern in electron beam exposing device - Google Patents
Formation of pattern in electron beam exposing deviceInfo
- Publication number
- JPS57183029A JPS57183029A JP6765581A JP6765581A JPS57183029A JP S57183029 A JPS57183029 A JP S57183029A JP 6765581 A JP6765581 A JP 6765581A JP 6765581 A JP6765581 A JP 6765581A JP S57183029 A JPS57183029 A JP S57183029A
- Authority
- JP
- Japan
- Prior art keywords
- data
- patterning
- common
- exposing device
- memory
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000015572 biosynthetic process Effects 0.000 title 1
- 238000010894 electron beam technology Methods 0.000 title 1
- 238000000059 patterning Methods 0.000 abstract 6
- 230000005055 memory storage Effects 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 230000006870 function Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To increase the patterning speed remarkably by a method wherein the common data which will be repeatedly used is memorized in the common data memory storage which was provided on the side of the exposing device in advance. CONSTITUTION:The common patterning data which will be repeatedly used is transferred to and memorized in a data memory storage 4a before the start of patterning process. When the drawing pattern data is transferred to an interface 4g by a control computer 1, this data is inputted to a patterning data buffer memory 4b. This data is decoded by a function generator 4c and wrote in a dot pattern memory 4d, and at the same time, the data is read out by read-out section 4e and then blanking-controlled by the exposing device. Then, when a subroutine call command, which will be used to accomplish the assignment of the common patterning data for the memory 4b, is given, the generator 4c successively decodes the common patterning data from the assigned address of the device 4a. Then, the data is used for the blanking of the exposing device in the same mode as above, and the drawing pattern can be formed based on the above-mentioned data.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6765581A JPS57183029A (en) | 1981-05-07 | 1981-05-07 | Formation of pattern in electron beam exposing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6765581A JPS57183029A (en) | 1981-05-07 | 1981-05-07 | Formation of pattern in electron beam exposing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS57183029A true JPS57183029A (en) | 1982-11-11 |
Family
ID=13351245
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6765581A Pending JPS57183029A (en) | 1981-05-07 | 1981-05-07 | Formation of pattern in electron beam exposing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57183029A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61255019A (en) * | 1985-05-07 | 1986-11-12 | Toshiba Corp | Charged beam exposing device |
-
1981
- 1981-05-07 JP JP6765581A patent/JPS57183029A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61255019A (en) * | 1985-05-07 | 1986-11-12 | Toshiba Corp | Charged beam exposing device |
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