JPS57153432A - Reducing projecting exposing device - Google Patents
Reducing projecting exposing deviceInfo
- Publication number
- JPS57153432A JPS57153432A JP56037975A JP3797581A JPS57153432A JP S57153432 A JPS57153432 A JP S57153432A JP 56037975 A JP56037975 A JP 56037975A JP 3797581 A JP3797581 A JP 3797581A JP S57153432 A JPS57153432 A JP S57153432A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- error
- patterns
- arrangement
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Projection-Type Copiers In General (AREA)
Abstract
PURPOSE:To enable the positioning of a pattern with high accuracy by mounting a pattern arrangement error detecting function disposed onto a wafer in a two- dimensional shape and a function correcting the error of arrangement in response to the results of detection to the reducing projecting exposing device. CONSTITUTION:A reticle 3 as the original figure of the circuit patterns is illuminated by an illuminating system 1 for exposure, and the patterns are transferred onto the wafer 7 through a reducing glass 5. When a mirror 6 mounted to a two-dimensional moving base 8 has the alpha error of an orthogonal degree at that time, the alpha error of the orthogonal degree error is also generated in a pattern arrangement transferred to the wafer 7. Accordingly, the wafer 7 is rotated in a 90 deg. arc in order to detect the error alpha and placed onto the moving base 8 again, and the arrangement of opposing patterns 9a, 9c is detected from peripheral patterns 9a-9d formed onto the wafer 7. That is, the patterns on the wafer 7 are detected by means of a pattern detector 2 through the reducing glass 5 and the reticle 3, coordinates as targets are calculated by means of a laser length measuring system 4, and the moving base 8 is adjusted.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56037975A JPS57153432A (en) | 1981-03-18 | 1981-03-18 | Reducing projecting exposing device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56037975A JPS57153432A (en) | 1981-03-18 | 1981-03-18 | Reducing projecting exposing device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS57153432A true JPS57153432A (en) | 1982-09-22 |
Family
ID=12512563
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56037975A Pending JPS57153432A (en) | 1981-03-18 | 1981-03-18 | Reducing projecting exposing device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57153432A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59101830A (en) * | 1982-12-01 | 1984-06-12 | Canon Inc | Printing and exposure device for semiconductor |
| JPS62277504A (en) * | 1986-05-27 | 1987-12-02 | Canon Inc | Positioning device |
-
1981
- 1981-03-18 JP JP56037975A patent/JPS57153432A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59101830A (en) * | 1982-12-01 | 1984-06-12 | Canon Inc | Printing and exposure device for semiconductor |
| JPH0141012B2 (en) * | 1982-12-01 | 1989-09-01 | Canon Kk | |
| JPS62277504A (en) * | 1986-05-27 | 1987-12-02 | Canon Inc | Positioning device |
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