JPS57127455A - Reproduction of ion exchange resin layer - Google Patents
Reproduction of ion exchange resin layerInfo
- Publication number
- JPS57127455A JPS57127455A JP56010682A JP1068281A JPS57127455A JP S57127455 A JPS57127455 A JP S57127455A JP 56010682 A JP56010682 A JP 56010682A JP 1068281 A JP1068281 A JP 1068281A JP S57127455 A JPS57127455 A JP S57127455A
- Authority
- JP
- Japan
- Prior art keywords
- resin layer
- reproduction
- stream side
- water
- ion exchange
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Treatment Of Water By Ion Exchange (AREA)
Abstract
PURPOSE: To improve the efficiency of reproduction by passing a weak basic negative ion exchange resin layer, which has degenerated in function by passing through a solution of starch sugar at a downward stream side, through a reproduction liquid at an upward stream side after being stirred and mixed with water or air at the upward stream side.
CONSTITUTION: A weak basic negative ion exchange resin layer which has degenerated in function by passing through a starch sugar liquid at a downward stream side is passed through water to substitute the sugar solution, remaining in the layer, with the water. Then, water or air is supplied from below the resin layer, which is stirred and mixed. After the resin layer is settled by being left still, a reproduction liquid is flowed at an upward stream side from the lower part of the resin layer, while pressurized water or air is introduced from the upper part of a tower, so as to prevent the fluidization of the resin layer, thus reproducing the resin layer. This method nearly eliminates the generation of air bubbles even when the reproduction liquid is flowed at the upward stream side, so neither the floating nor fluidization of the resin layer occurs. Therefore, counterflow reproduction treatment is performed efficiently.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56010682A JPS5940064B2 (en) | 1981-01-27 | 1981-01-27 | How to regenerate ion exchange resin layer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56010682A JPS5940064B2 (en) | 1981-01-27 | 1981-01-27 | How to regenerate ion exchange resin layer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57127455A true JPS57127455A (en) | 1982-08-07 |
| JPS5940064B2 JPS5940064B2 (en) | 1984-09-27 |
Family
ID=11757025
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56010682A Expired JPS5940064B2 (en) | 1981-01-27 | 1981-01-27 | How to regenerate ion exchange resin layer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5940064B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0330059Y2 (en) * | 1985-06-24 | 1991-06-26 | ||
| JPH0619653U (en) * | 1992-08-21 | 1994-03-15 | 株式会社武藤化成工業所 | Hanger |
-
1981
- 1981-01-27 JP JP56010682A patent/JPS5940064B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5940064B2 (en) | 1984-09-27 |
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