JPS57118665A - Semiconductor integrated circuit device - Google Patents
Semiconductor integrated circuit deviceInfo
- Publication number
- JPS57118665A JPS57118665A JP56005705A JP570581A JPS57118665A JP S57118665 A JPS57118665 A JP S57118665A JP 56005705 A JP56005705 A JP 56005705A JP 570581 A JP570581 A JP 570581A JP S57118665 A JPS57118665 A JP S57118665A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- specific resistance
- power transistor
- circuit element
- signal circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D84/00—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers
- H10D84/60—Integrated devices formed in or on semiconductor substrates that comprise only semiconducting layers, e.g. on Si wafers or on GaAs-on-Si wafers characterised by the integration of at least one component covered by groups H10D10/00 or H10D18/00, e.g. integration of BJTs
- H10D84/641—Combinations of only vertical BJTs
- H10D84/642—Combinations of non-inverted vertical BJTs of the same conductivity type having different characteristics, e.g. Darlington transistors
Landscapes
- Bipolar Transistors (AREA)
- Bipolar Integrated Circuits (AREA)
Abstract
PURPOSE:To improve the characteristics of the minor signal circuit element for the subject device without deteriorating the characteristics of a power transistor by a method wherein a double-layer epitaxial layer, having different specific resistance, is provided. CONSTITUTION:In the bipolar type integrated circuit element wherein a power transistor and a minor signal circuit element are constituted on the same chip, an N<-> layer 22 of a high specific resistance is provided on an N type silicon substrate 21, and an N-layer 23 of a low specific resistance is epitaxially grown on the above N-layer 22. Subsequently, a P type base region 24 is formed at the section where the power transistor will be formed, and then an N type emitter 25 is formed. Also, the minor signal circuit element is provided on the other region of the N-layer 23 of low specific resistance. Then, a contact hole is opened on an insulating layer 26, a base electrode, emitter electrodes 27 and 28 are formed, and then a collector 29 is provided on the reverse side of the substrate. Accordngly, the characteristics of the minor signal circuit can be improved without deteriorating the withstand voltage characteristics of the power transistor.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56005705A JPS57118665A (en) | 1981-01-16 | 1981-01-16 | Semiconductor integrated circuit device |
DE19813117837 DE3117837A1 (en) | 1980-05-16 | 1981-05-06 | Universal joint |
FR8109596A FR2482684A1 (en) | 1980-05-16 | 1981-05-14 | UNIVERSAL CROSSED JOINT |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP56005705A JPS57118665A (en) | 1981-01-16 | 1981-01-16 | Semiconductor integrated circuit device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57118665A true JPS57118665A (en) | 1982-07-23 |
Family
ID=11618521
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP56005705A Pending JPS57118665A (en) | 1980-05-16 | 1981-01-16 | Semiconductor integrated circuit device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57118665A (en) |
-
1981
- 1981-01-16 JP JP56005705A patent/JPS57118665A/en active Pending
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