JPS57100434A - Electrostatic recording body - Google Patents
Electrostatic recording bodyInfo
- Publication number
- JPS57100434A JPS57100434A JP55177373A JP17737380A JPS57100434A JP S57100434 A JPS57100434 A JP S57100434A JP 55177373 A JP55177373 A JP 55177373A JP 17737380 A JP17737380 A JP 17737380A JP S57100434 A JPS57100434 A JP S57100434A
- Authority
- JP
- Japan
- Prior art keywords
- dielectric layer
- low resistance
- electrostatic recording
- recording body
- resistance layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/10—Bases for charge-receiving or other layers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/0202—Dielectric layers for electrography
- G03G5/0205—Macromolecular components
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photoreceptors In Electrophotography (AREA)
- Polymerisation Methods In General (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Fax Reproducing Arrangements (AREA)
Abstract
PURPOSE:To improve the durability of a recording body and a coating and drying process for a dielectric layer by constituting the dielectric layer of a photosettable material. CONSTITUTION:A low resistance layer 6 is provided on cylindrical ''Pyrex '' glass 8, and further a photopolymerizable composition such as novolack type epoxy acrylate, trimethyrol propane triacrylate, diethylene glycol diacrylate is coated on the low resistance layer, and UV rays are irradiated thereto, whereby a photoset dielectric layer 7 is formed. It is also possible to add fine powder of polymers of <=5mum of low dielectric content such as nylon, ''Teflon '', satd. polyester and the like in the composition in order to prevent the electric discharge by an electrostatic recording head 10 and the degradation by corona in a distaticizing process.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55177373A JPS57100434A (en) | 1980-12-16 | 1980-12-16 | Electrostatic recording body |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55177373A JPS57100434A (en) | 1980-12-16 | 1980-12-16 | Electrostatic recording body |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57100434A true JPS57100434A (en) | 1982-06-22 |
Family
ID=16029812
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55177373A Pending JPS57100434A (en) | 1980-12-16 | 1980-12-16 | Electrostatic recording body |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57100434A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS611642A (en) * | 1984-06-13 | 1986-01-07 | Koei Chem Co Ltd | Acrylate compound |
JPS6214653A (en) * | 1985-07-12 | 1987-01-23 | Mitsubishi Rayon Co Ltd | Electrophotographic recording material |
WO1998024824A1 (en) * | 1996-12-03 | 1998-06-11 | Nippon Kayaku Kabushiki Kaisha | Photosensitive resin composition and articles |
-
1980
- 1980-12-16 JP JP55177373A patent/JPS57100434A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS611642A (en) * | 1984-06-13 | 1986-01-07 | Koei Chem Co Ltd | Acrylate compound |
JPH0475904B2 (en) * | 1984-06-13 | 1992-12-02 | Koei Chemical Co | |
JPS6214653A (en) * | 1985-07-12 | 1987-01-23 | Mitsubishi Rayon Co Ltd | Electrophotographic recording material |
WO1998024824A1 (en) * | 1996-12-03 | 1998-06-11 | Nippon Kayaku Kabushiki Kaisha | Photosensitive resin composition and articles |
US6254958B1 (en) | 1996-12-03 | 2001-07-03 | Nippon Kayaku Kabushiki Kaisha | Photosensitive resin composition and articles |
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