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JPS5683981A - Semiconductor device and manufacture - Google Patents

Semiconductor device and manufacture

Info

Publication number
JPS5683981A
JPS5683981A JP16247279A JP16247279A JPS5683981A JP S5683981 A JPS5683981 A JP S5683981A JP 16247279 A JP16247279 A JP 16247279A JP 16247279 A JP16247279 A JP 16247279A JP S5683981 A JPS5683981 A JP S5683981A
Authority
JP
Japan
Prior art keywords
defective part
substrate
oxidized
leak
current
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16247279A
Other languages
Japanese (ja)
Inventor
Takamichi Wada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP16247279A priority Critical patent/JPS5683981A/en
Publication of JPS5683981A publication Critical patent/JPS5683981A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass

Landscapes

  • Solid State Image Pick-Up Elements (AREA)

Abstract

PURPOSE:To prevent a leak from being caused by a defect of a diffusion region by a method wherein a defective part is made an insulator by a means of oxidation or the like. CONSTITUTION:An Si substrate 23 is placed in a vessel 15 and the part of the vessel on the surface side thereof is filled with an electrolyte 31 and the same on the reverse side with HF liquid 32. Electrodes 33, 34 are installed in the electrolytes 31, 32 to apply a positive electricity to the electrode 33 and a negative one to the electrode 34. In such a condition, P-N junction on the substrate 23 is put in a reverse bias state, so that no other current than a dark current flows to a normal P-N junction. However, a leak current flows to the defective part 27. Accordingly, a current passage 31 is formed, and the substrate 23 is gradually made porous from the reverse side thereof toward the defective part 27. Then, the substrate 23 would be oxidized along the porous layer, if it be placed in an oxidized atmosphere. Accordingly, the defective part is oxidized so that the leak current will not flow. Thus, the defective part 27 is oxidized and the leak can be arrested.
JP16247279A 1979-12-13 1979-12-13 Semiconductor device and manufacture Pending JPS5683981A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16247279A JPS5683981A (en) 1979-12-13 1979-12-13 Semiconductor device and manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16247279A JPS5683981A (en) 1979-12-13 1979-12-13 Semiconductor device and manufacture

Publications (1)

Publication Number Publication Date
JPS5683981A true JPS5683981A (en) 1981-07-08

Family

ID=15755268

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16247279A Pending JPS5683981A (en) 1979-12-13 1979-12-13 Semiconductor device and manufacture

Country Status (1)

Country Link
JP (1) JPS5683981A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2508708A1 (en) * 1981-06-26 1982-12-31 Rca Corp ELECTROLYTIC PROCESS FOR ELIMINATING SHORT CIRCUITS AND SHUNTS IN SOLAR CELLS
EP0134364A2 (en) * 1983-08-03 1985-03-20 Energy Conversion Devices, Inc. System and method for eliminating short and latent short circuit current paths in photovoltaic devices
US6228662B1 (en) 1999-03-24 2001-05-08 Kaneka Corporation Method for removing short-circuited sections of a solar cell

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2508708A1 (en) * 1981-06-26 1982-12-31 Rca Corp ELECTROLYTIC PROCESS FOR ELIMINATING SHORT CIRCUITS AND SHUNTS IN SOLAR CELLS
EP0134364A2 (en) * 1983-08-03 1985-03-20 Energy Conversion Devices, Inc. System and method for eliminating short and latent short circuit current paths in photovoltaic devices
EP0134364A3 (en) * 1983-08-03 1986-06-04 Energy Conversion Devices, Inc. System and method for eliminating short and latent short circuit current paths in photovoltaic devices
US6228662B1 (en) 1999-03-24 2001-05-08 Kaneka Corporation Method for removing short-circuited sections of a solar cell

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