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JPS5669625A - Minute pattern forming method - Google Patents

Minute pattern forming method

Info

Publication number
JPS5669625A
JPS5669625A JP14617479A JP14617479A JPS5669625A JP S5669625 A JPS5669625 A JP S5669625A JP 14617479 A JP14617479 A JP 14617479A JP 14617479 A JP14617479 A JP 14617479A JP S5669625 A JPS5669625 A JP S5669625A
Authority
JP
Japan
Prior art keywords
copolymer
cross
minute pattern
phenyl methacrylate
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14617479A
Other languages
Japanese (ja)
Other versions
JPS6134660B2 (en
Inventor
Jiro Naito
Yasuhiro Yoneda
Tateo Kitamura
Toshisuke Kitakoji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP14617479A priority Critical patent/JPS5669625A/en
Publication of JPS5669625A publication Critical patent/JPS5669625A/en
Publication of JPS6134660B2 publication Critical patent/JPS6134660B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

PURPOSE:To form a positive type minute pattern of high sensitivity and high resolution by applying a copolymer of phenyl methacrylate and a cross-linking monomer to a substrate, heat treating the applied copolymer to form a three-dimensional network structure, and carrying out exposure, development, etc. CONSTITUTION:Phenyl methacrylate or a phenyl methacrylate copolymer and a cross-linking monomer such as methacrylic acid or methacrylic acid chloride are solution polymerized to prepare a copolymer with about 10,000-1 million mol.wt. This copolymer is applied to a substrate to form a resist layer, and this layer is cross-linked by heating to about 120-250 deg.C. The cross-linked layer is then patternwise exposed to radiation such as electron beams, X-rays or far ultraviolet rays by a known method and developed to form a minute pattern.
JP14617479A 1979-11-12 1979-11-12 Minute pattern forming method Granted JPS5669625A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14617479A JPS5669625A (en) 1979-11-12 1979-11-12 Minute pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14617479A JPS5669625A (en) 1979-11-12 1979-11-12 Minute pattern forming method

Publications (2)

Publication Number Publication Date
JPS5669625A true JPS5669625A (en) 1981-06-11
JPS6134660B2 JPS6134660B2 (en) 1986-08-08

Family

ID=15401802

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14617479A Granted JPS5669625A (en) 1979-11-12 1979-11-12 Minute pattern forming method

Country Status (1)

Country Link
JP (1) JPS5669625A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61293211A (en) * 1985-06-07 1986-12-24 Sumitomo Chem Co Ltd Optical information recording substrate made of methacrylic resin
JP2014058598A (en) * 2012-09-14 2014-04-03 Showa Denko Kk Photosensitive resin for patterning
JP2014058599A (en) * 2012-09-14 2014-04-03 Showa Denko Kk Production method of member subject

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61293211A (en) * 1985-06-07 1986-12-24 Sumitomo Chem Co Ltd Optical information recording substrate made of methacrylic resin
JP2014058598A (en) * 2012-09-14 2014-04-03 Showa Denko Kk Photosensitive resin for patterning
JP2014058599A (en) * 2012-09-14 2014-04-03 Showa Denko Kk Production method of member subject

Also Published As

Publication number Publication date
JPS6134660B2 (en) 1986-08-08

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