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JPS5636132A - Sample shifter for electron ray exposing device, etc. - Google Patents

Sample shifter for electron ray exposing device, etc.

Info

Publication number
JPS5636132A
JPS5636132A JP11152979A JP11152979A JPS5636132A JP S5636132 A JPS5636132 A JP S5636132A JP 11152979 A JP11152979 A JP 11152979A JP 11152979 A JP11152979 A JP 11152979A JP S5636132 A JPS5636132 A JP S5636132A
Authority
JP
Japan
Prior art keywords
sample
stage
electron beams
electron
ferromagnetic material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11152979A
Other languages
Japanese (ja)
Other versions
JPS5741814B2 (en
Inventor
Eiji Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Nihon Denshi KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd, Nihon Denshi KK filed Critical Jeol Ltd
Priority to JP11152979A priority Critical patent/JPS5636132A/en
Publication of JPS5636132A publication Critical patent/JPS5636132A/en
Publication of JPS5741814B2 publication Critical patent/JPS5741814B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To eliminate the deflection of electron beams by a method wherein a sample chamber formed by a ferromagnetic material and a sample stage, whose upper surface portion is formed by a high permeability material, are magnetically connected and a closed magnetic path is made up. CONSTITUTION:A sample chamber 1 on which an electron optical camera 3 containing a projecting lens 2, other lens systems and an electron gun is placed is built up by a ferromagnetic material such as soft steel while a stage 5, to which a nonmagnetic holder 7 is attached through a high viscous material 6 such as Teflon and on which a sample 4 is set, a stage 8, guide rails 9, 14, etc. are formed by a high permeability material such as pure iron. Thus, a closed magnetic path shown in a broken line is made up, the deflection of electron beams is prevented even when a driving mechanism, etc. contain a ferromagnetic material, and exposure by the electron beams having higher speed and high accuracy can be conducted.
JP11152979A 1979-08-31 1979-08-31 Sample shifter for electron ray exposing device, etc. Granted JPS5636132A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11152979A JPS5636132A (en) 1979-08-31 1979-08-31 Sample shifter for electron ray exposing device, etc.

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11152979A JPS5636132A (en) 1979-08-31 1979-08-31 Sample shifter for electron ray exposing device, etc.

Publications (2)

Publication Number Publication Date
JPS5636132A true JPS5636132A (en) 1981-04-09
JPS5741814B2 JPS5741814B2 (en) 1982-09-04

Family

ID=14563641

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11152979A Granted JPS5636132A (en) 1979-08-31 1979-08-31 Sample shifter for electron ray exposing device, etc.

Country Status (1)

Country Link
JP (1) JPS5636132A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58140336A (en) * 1982-02-12 1983-08-20 Shin Etsu Chem Co Ltd Method for manufacturing base material for optical fiber
JPS59137337A (en) * 1983-01-21 1984-08-07 Sumitomo Electric Ind Ltd Manufacture of glass base material for optical fiber
JPS6046938A (en) * 1983-08-19 1985-03-14 Hitachi Cable Ltd Manufacture of optical fiber preform
JPS61174146A (en) * 1985-01-25 1986-08-05 Sumitomo Electric Ind Ltd Optical fiber and its manufacturing method
JPS62114438U (en) * 1986-01-10 1987-07-21
US6730916B1 (en) 1999-10-22 2004-05-04 Canon Kabushiki Kaisha Electron beam lithography apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58140336A (en) * 1982-02-12 1983-08-20 Shin Etsu Chem Co Ltd Method for manufacturing base material for optical fiber
JPS59137337A (en) * 1983-01-21 1984-08-07 Sumitomo Electric Ind Ltd Manufacture of glass base material for optical fiber
JPS6046938A (en) * 1983-08-19 1985-03-14 Hitachi Cable Ltd Manufacture of optical fiber preform
JPS61174146A (en) * 1985-01-25 1986-08-05 Sumitomo Electric Ind Ltd Optical fiber and its manufacturing method
JPS62114438U (en) * 1986-01-10 1987-07-21
US6730916B1 (en) 1999-10-22 2004-05-04 Canon Kabushiki Kaisha Electron beam lithography apparatus

Also Published As

Publication number Publication date
JPS5741814B2 (en) 1982-09-04

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