JPS56167712A - Production of methacryl resin composition having excellent impact resistance - Google Patents
Production of methacryl resin composition having excellent impact resistanceInfo
- Publication number
- JPS56167712A JPS56167712A JP7166880A JP7166880A JPS56167712A JP S56167712 A JPS56167712 A JP S56167712A JP 7166880 A JP7166880 A JP 7166880A JP 7166880 A JP7166880 A JP 7166880A JP S56167712 A JPS56167712 A JP S56167712A
- Authority
- JP
- Japan
- Prior art keywords
- mixture
- mma
- methyl methacrylate
- crosslinking monomer
- production
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000005641 methacryl group Chemical group 0.000 title 1
- 239000011342 resin composition Substances 0.000 title 1
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 abstract 6
- 239000000203 mixture Substances 0.000 abstract 4
- 239000000178 monomer Substances 0.000 abstract 4
- -1 acrylate ester Chemical class 0.000 abstract 3
- 238000004132 cross linking Methods 0.000 abstract 3
- 239000011347 resin Substances 0.000 abstract 3
- 229920005989 resin Polymers 0.000 abstract 3
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 abstract 2
- 229920001971 elastomer Polymers 0.000 abstract 2
- 239000000806 elastomer Substances 0.000 abstract 2
- 230000000379 polymerizing effect Effects 0.000 abstract 2
- 239000002932 luster Substances 0.000 abstract 1
- 229920000642 polymer Polymers 0.000 abstract 1
- 150000003440 styrenes Chemical class 0.000 abstract 1
Landscapes
- Polymerisation Methods In General (AREA)
- Graft Or Block Polymers (AREA)
Abstract
PURPOSE:To obtain titled resin without lowering its transparency and surface luster, by grafting first a mixture of a crosslinking monomer and methyl methacrylate and, then, methyl methacrylate onto an acrylate ester elastomer of a specified double structure. CONSTITUTION:Titled resin is obtained by polymerizing (c) 5-100pts.wt. monomer mixture consisting of (i') 80-99.9wt% methyl methacrylate (hereinbelow abbreviated as MMA) and (ii') 0.1-10wt% polyfunctional crosslinking monomer containing at least two C-C double bonds in the presence of 100pts.wt. double-structured acryl elastomer containing, in its interior, (A) 5-50pts.wt. rigid cured resin containing at least 80wt% of MMA and containing, in its exterior layer, (B) 95- 50pts.wt. polymer consisting of (i) 69.9-89.9wt% of 1-8C alkyl acrylate ester, (ii) 30-10wt% styrene or mixture thereof with a styrene derivative, and (iii) 0.1- 10wt% polyfunctional crosslinking monomer containing at least two C-C double bonds and, after addition of (D) 5-1,000pts.wt. MMA (D/C=0.5-200), polymerizing the mixture.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7166880A JPS56167712A (en) | 1980-05-29 | 1980-05-29 | Production of methacryl resin composition having excellent impact resistance |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7166880A JPS56167712A (en) | 1980-05-29 | 1980-05-29 | Production of methacryl resin composition having excellent impact resistance |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56167712A true JPS56167712A (en) | 1981-12-23 |
| JPS6245886B2 JPS6245886B2 (en) | 1987-09-29 |
Family
ID=13467197
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7166880A Granted JPS56167712A (en) | 1980-05-29 | 1980-05-29 | Production of methacryl resin composition having excellent impact resistance |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS56167712A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59136313A (en) * | 1983-01-10 | 1984-08-04 | レ−ム・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | Impact resistant improver and molding compound containing same |
| US4730023A (en) * | 1985-11-29 | 1988-03-08 | Mitsubishi Rayon Company, Ltd. | Impact resistant methacrylic resin composition |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| ES2014614A6 (en) * | 1989-05-10 | 1990-07-16 | Telefonica Nacional Espana Co | Screening edge mask for printed circuit board, with withdrawing-retaining mechanism |
-
1980
- 1980-05-29 JP JP7166880A patent/JPS56167712A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59136313A (en) * | 1983-01-10 | 1984-08-04 | レ−ム・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | Impact resistant improver and molding compound containing same |
| US4730023A (en) * | 1985-11-29 | 1988-03-08 | Mitsubishi Rayon Company, Ltd. | Impact resistant methacrylic resin composition |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6245886B2 (en) | 1987-09-29 |
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