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JPS56162748A - Defect correcting method for photomask - Google Patents

Defect correcting method for photomask

Info

Publication number
JPS56162748A
JPS56162748A JP6644180A JP6644180A JPS56162748A JP S56162748 A JPS56162748 A JP S56162748A JP 6644180 A JP6644180 A JP 6644180A JP 6644180 A JP6644180 A JP 6644180A JP S56162748 A JPS56162748 A JP S56162748A
Authority
JP
Japan
Prior art keywords
pulse
photomask
defective
pattern
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP6644180A
Other languages
Japanese (ja)
Inventor
Takeoki Miyauchi
Mikio Hongo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP6644180A priority Critical patent/JPS56162748A/en
Publication of JPS56162748A publication Critical patent/JPS56162748A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/72—Repair or correction of mask defects

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

PURPOSE:To make possible complete correction of defective parts with low laser power by projecting and irradiating a laser pulse beam of >=2 pulses to the defective part of a photomask in a rectangular aperture pattern and removing the defective part. CONSTITUTION:In a method for correcting the defective pattern 6 on a photomask 5, two-pulse laser beams is emitted by the double pulse generating circuit 8 in a control part 7 from a laser oscillator 1, and is condensed and irradiated to the defect pattern 6 via an ojective lens 4 through a rectangular aperture pattern 3. With one pulse irradiation, the light transmittance to the glass part does not attain required light transmittance even at around 2.5KW, but with the two-pulse irradiations, sufficiently high transmittance is obtained with the output by which the transmittance of just about 0.8 can be obtained by the one-pulse operation, thus the good defect correction is accomplished with the output about half that of the one-pulse irradiation.
JP6644180A 1980-05-21 1980-05-21 Defect correcting method for photomask Pending JPS56162748A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6644180A JPS56162748A (en) 1980-05-21 1980-05-21 Defect correcting method for photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6644180A JPS56162748A (en) 1980-05-21 1980-05-21 Defect correcting method for photomask

Publications (1)

Publication Number Publication Date
JPS56162748A true JPS56162748A (en) 1981-12-14

Family

ID=13315856

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6644180A Pending JPS56162748A (en) 1980-05-21 1980-05-21 Defect correcting method for photomask

Country Status (1)

Country Link
JP (1) JPS56162748A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0165685A2 (en) * 1984-06-20 1985-12-27 Gould Inc. Laser-based system for the total repair of photomasks
JPS62156958U (en) * 1986-03-28 1987-10-05
JP2007232964A (en) * 2006-02-28 2007-09-13 Laserfront Technologies Inc Photomask defect correcting method and defect correcting apparatus

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52109874A (en) * 1976-03-12 1977-09-14 Hitachi Ltd Photo mask correcting unit

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52109874A (en) * 1976-03-12 1977-09-14 Hitachi Ltd Photo mask correcting unit

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0165685A2 (en) * 1984-06-20 1985-12-27 Gould Inc. Laser-based system for the total repair of photomasks
JPS62156958U (en) * 1986-03-28 1987-10-05
JPH0121307Y2 (en) * 1986-03-28 1989-06-26
JP2007232964A (en) * 2006-02-28 2007-09-13 Laserfront Technologies Inc Photomask defect correcting method and defect correcting apparatus

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