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JPS56118340A - Pattern formation device by laser - Google Patents

Pattern formation device by laser

Info

Publication number
JPS56118340A
JPS56118340A JP2155580A JP2155580A JPS56118340A JP S56118340 A JPS56118340 A JP S56118340A JP 2155580 A JP2155580 A JP 2155580A JP 2155580 A JP2155580 A JP 2155580A JP S56118340 A JPS56118340 A JP S56118340A
Authority
JP
Japan
Prior art keywords
laser
power density
exposure
linearability
object lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2155580A
Other languages
Japanese (ja)
Inventor
Mikio Hongo
Hiroshi Yamaguchi
Takeoki Miyauchi
Katsuro Mizukoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2155580A priority Critical patent/JPS56118340A/en
Publication of JPS56118340A publication Critical patent/JPS56118340A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216Mask projection systems
    • G03F7/70358Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To facilitate exposure or work with excellent linearability and stable power density, by scanning a rectangular spot on a desired pattern configuration. CONSTITUTION:The diameter of the oscillated 1 laser beams 2 are enlarged 3 and a moveable rectangular opening part 6 is formed on the position 5 of the exposure by an object lens 4, which is adjusted by the motors 7a, 7b so that only the portion of the central part of the laser beams with uniform power density is made use of. The beams that penetrate are turned 8 and developed on a workpiece 11 on an XY table 13 through an object lens 12. The on/off of the laser, changes in the opening part configuration and the turning of the image are controlled by the control device and the projected images are scanned and exposed. With such an arrangement, the linearability of the outer parts of the pattern is realized in a better performance and because the power density is uniform exposure can be performed under the same condition.
JP2155580A 1980-02-25 1980-02-25 Pattern formation device by laser Pending JPS56118340A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2155580A JPS56118340A (en) 1980-02-25 1980-02-25 Pattern formation device by laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2155580A JPS56118340A (en) 1980-02-25 1980-02-25 Pattern formation device by laser

Publications (1)

Publication Number Publication Date
JPS56118340A true JPS56118340A (en) 1981-09-17

Family

ID=12058246

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2155580A Pending JPS56118340A (en) 1980-02-25 1980-02-25 Pattern formation device by laser

Country Status (1)

Country Link
JP (1) JPS56118340A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01262623A (en) * 1988-04-14 1989-10-19 Dainippon Printing Co Ltd Pattern generator
JPH057073U (en) * 1992-06-04 1993-02-02 株式会社シマノ Fishing rod

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5128189A (en) * 1974-09-03 1976-03-09 Mitsui Petrochemical Ind KOKETSUSHOSEIHORIOREFUIN NO KOKATSUSEI JUGOHOHO
JPS5240954A (en) * 1975-09-26 1977-03-30 Olympus Optical Co Ltd Thyristor ignition circuit
JPS5314373A (en) * 1976-07-26 1978-02-08 Nippon Electric Co Drawing device

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5128189A (en) * 1974-09-03 1976-03-09 Mitsui Petrochemical Ind KOKETSUSHOSEIHORIOREFUIN NO KOKATSUSEI JUGOHOHO
JPS5240954A (en) * 1975-09-26 1977-03-30 Olympus Optical Co Ltd Thyristor ignition circuit
JPS5314373A (en) * 1976-07-26 1978-02-08 Nippon Electric Co Drawing device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01262623A (en) * 1988-04-14 1989-10-19 Dainippon Printing Co Ltd Pattern generator
JPH057073U (en) * 1992-06-04 1993-02-02 株式会社シマノ Fishing rod

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