[go: up one dir, main page]

JPS56105634A - X rays transcription device - Google Patents

X rays transcription device

Info

Publication number
JPS56105634A
JPS56105634A JP806980A JP806980A JPS56105634A JP S56105634 A JPS56105634 A JP S56105634A JP 806980 A JP806980 A JP 806980A JP 806980 A JP806980 A JP 806980A JP S56105634 A JPS56105634 A JP S56105634A
Authority
JP
Japan
Prior art keywords
rays
stage
detected
time
source
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP806980A
Other languages
Japanese (ja)
Inventor
Masahiro Okabe
Fumio Yamagishi
Yasuo Furukawa
Yushi Inagaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP806980A priority Critical patent/JPS56105634A/en
Publication of JPS56105634A publication Critical patent/JPS56105634A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To shorten broadly the necessary time for the device to transcribe a pattern by a method wherein a stage is made to transfer consecutively, and at the time when an exposing region to be exposed reaches to the prescribed position is caught during the transference, the X ray source is driven. CONSTITUTION:The stage 15 laying on it a sample to be exposed transfers consecutively being driven by both driving motors 17, 18 in the X, Y axial directions. At this time, the timing when the alignment marks 21, 22 on an X rays mask 3 and on an X rays resist 2 coincides is detected with a photo detector consisting of a photo projector 23, a photo receiver 24, and the detected output is applied to an X rays source 7 to make the X rays source 7 to radiate X rays 8. The radiated X rays expose precisely through the mask 3 the prescribed exposing region in the lump specified on the resist 2. Both X, Y stage position detectors 19, 20 are used for the positioning of respective exposing regions when the pattern is to be transcribed by the X rays exposure, and the position of the stage 15 is corrected by feeding back the detected outputs from the detectors 19, 20 to respectively corresponding monitors 17, 18.
JP806980A 1980-01-25 1980-01-25 X rays transcription device Pending JPS56105634A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP806980A JPS56105634A (en) 1980-01-25 1980-01-25 X rays transcription device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP806980A JPS56105634A (en) 1980-01-25 1980-01-25 X rays transcription device

Publications (1)

Publication Number Publication Date
JPS56105634A true JPS56105634A (en) 1981-08-22

Family

ID=11683046

Family Applications (1)

Application Number Title Priority Date Filing Date
JP806980A Pending JPS56105634A (en) 1980-01-25 1980-01-25 X rays transcription device

Country Status (1)

Country Link
JP (1) JPS56105634A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006003863A1 (en) * 2004-06-30 2006-01-12 Integrated Solutions Co., Ltd. Exposure equipment
WO2007069480A1 (en) * 2005-12-17 2007-06-21 Sharp Kabushiki Kaisha Aligner and aligning method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4830875A (en) * 1971-08-25 1973-04-23
JPS5021232A (en) * 1973-06-28 1975-03-06
JPS541553A (en) * 1977-06-07 1979-01-08 Toshiba Corp Group management control method of elevator

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4830875A (en) * 1971-08-25 1973-04-23
JPS5021232A (en) * 1973-06-28 1975-03-06
JPS541553A (en) * 1977-06-07 1979-01-08 Toshiba Corp Group management control method of elevator

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006003863A1 (en) * 2004-06-30 2006-01-12 Integrated Solutions Co., Ltd. Exposure equipment
WO2007069480A1 (en) * 2005-12-17 2007-06-21 Sharp Kabushiki Kaisha Aligner and aligning method

Similar Documents

Publication Publication Date Title
JPS56105634A (en) X rays transcription device
JPS5339075A (en) Step and repeat exposure method of masks
JPS6468926A (en) Measurement of image distortion in projection optical system
JPS56111218A (en) Projection and exposuring device
JPS52143773A (en) Reduction projecting and printing apparatus
JPS54141573A (en) Mask for exposure
JPS5464971A (en) Forming method for light absorbing film of color picture tube
JPS5373073A (en) Treatment method for photo resist
JPS5381082A (en) Controlling method for holding extreme valies
JPS551107A (en) Exposure device
JPS5347825A (en) Photoresist exposure
JPS5318964A (en) X-ray projection and exposure system
JPS5286778A (en) Mask aligning method for x-ray exposure
JPS5396678A (en) Method and apparatus for mask pattern exposure
JPS51119227A (en) Method of preparing an uneven image formation
JPS5247719A (en) Data photographing device for the camera
JPS5255867A (en) Exposure method
JPS5349957A (en) Focusing method for electronic beam exposure device
JPS5241533A (en) Masking exposure method in scanning exposure system
JPS5217013A (en) Method for forming image on photosensitive material containing diazoamino compound
JPS57167619A (en) Number indication of semiconductor substrate
JPS5482966A (en) Exposure method for fluorescent screen of color braun tube
JPS5327035A (en) Optical system of document transport type copier
JPS51126129A (en) Simultaneous photographing of letters and patterns, etc.
JPS556324A (en) Photographing method