JPS5595367A - Method of fabricating mos transistor - Google Patents
Method of fabricating mos transistorInfo
- Publication number
- JPS5595367A JPS5595367A JP15628579A JP15628579A JPS5595367A JP S5595367 A JPS5595367 A JP S5595367A JP 15628579 A JP15628579 A JP 15628579A JP 15628579 A JP15628579 A JP 15628579A JP S5595367 A JPS5595367 A JP S5595367A
- Authority
- JP
- Japan
- Prior art keywords
- mos transistor
- fabricating mos
- fabricating
- transistor
- mos
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Element Separation (AREA)
- Local Oxidation Of Silicon (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US32367273A | 1973-01-15 | 1973-01-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5595367A true JPS5595367A (en) | 1980-07-19 |
Family
ID=23260226
Family Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP715574A Pending JPS49110280A (ja) | 1973-01-15 | 1974-01-16 | |
JP15628679A Granted JPS5595368A (en) | 1973-01-15 | 1979-11-30 | Method of fabricating mos transistor |
JP15628579A Pending JPS5595367A (en) | 1973-01-15 | 1979-11-30 | Method of fabricating mos transistor |
Family Applications Before (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP715574A Pending JPS49110280A (ja) | 1973-01-15 | 1974-01-16 | |
JP15628679A Granted JPS5595368A (en) | 1973-01-15 | 1979-11-30 | Method of fabricating mos transistor |
Country Status (6)
Country | Link |
---|---|
JP (3) | JPS49110280A (ja) |
DD (1) | DD110386A5 (ja) |
HK (1) | HK6580A (ja) |
HU (1) | HU171264B (ja) |
IT (1) | IT999786B (ja) |
PL (1) | PL94622B1 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5171677A (en) * | 1974-12-18 | 1976-06-21 | Mitsubishi Electric Corp | Handotaisochino seizohoho |
JPS51142982A (en) * | 1975-05-05 | 1976-12-08 | Intel Corp | Method of producing single crystal silicon ic |
JPS5353275A (en) * | 1976-10-26 | 1978-05-15 | Seiko Epson Corp | Semiconductor device |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3475234A (en) * | 1967-03-27 | 1969-10-28 | Bell Telephone Labor Inc | Method for making mis structures |
-
1973
- 1973-11-22 IT IT7043573A patent/IT999786B/it active
-
1974
- 1974-01-02 HU HU74FA00000956A patent/HU171264B/hu unknown
- 1974-01-11 DD DD17596374A patent/DD110386A5/xx unknown
- 1974-01-14 PL PL16808774A patent/PL94622B1/pl unknown
- 1974-01-16 JP JP715574A patent/JPS49110280A/ja active Pending
-
1979
- 1979-11-30 JP JP15628679A patent/JPS5595368A/ja active Granted
- 1979-11-30 JP JP15628579A patent/JPS5595367A/ja active Pending
-
1980
- 1980-02-28 HK HK6580A patent/HK6580A/xx unknown
Also Published As
Publication number | Publication date |
---|---|
PL94622B1 (pl) | 1977-08-31 |
DD110386A5 (ja) | 1974-12-12 |
JPS5595368A (en) | 1980-07-19 |
JPS49110280A (ja) | 1974-10-21 |
HK6580A (en) | 1980-03-07 |
HU171264B (hu) | 1977-12-28 |
JPS5549426B2 (ja) | 1980-12-11 |
IT999786B (it) | 1976-03-10 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CA1001771A (en) | Method of mos transistor manufacture and resulting structure | |
JPS51135382A (en) | Mos transistor | |
CA1024266A (en) | Deep depletion insulated gate field effect transistors | |
HK28081A (en) | Process for fabricating insulated gate field effect transistor structure | |
CA928867A (en) | Method of making complementary field-effect transistors by single step diffusion | |
AU465819B2 (en) | Planar silicon gate mos process | |
JPS5635427A (en) | Method of manufacturing semiconductor device | |
CA1000872A (en) | Method of manufacturing of junction field effect transistor | |
CA995370A (en) | Method of making a planar graded channel mos transistor | |
CA1012658A (en) | Manufacture of an insulated gate field effect transistor | |
CA1005175A (en) | Method for the production of integrated circuits with complementary channel field effect transistors | |
KR780000084B1 (en) | Method of fabricating a planar avalanche transistor | |
JPS5269277A (en) | Method of producing planar transistor | |
HK27981A (en) | Process for fabricating complementary insulated gate field efect transistor structure and the structure fabricated by the process | |
JPS5595368A (en) | Method of fabricating mos transistor | |
CA991317A (en) | Method for the production of field effect transistors by the application of selective gettering | |
JPS5484567A (en) | Method of manufacturing novel steroids | |
JPS5488778A (en) | Method of fabricating complementary mos transistor | |
JPS5488780A (en) | Method of fabricating complementary mos transistor | |
JPS5264882A (en) | Method of producing complementary transistor | |
JPS54111288A (en) | Method of fabricating mos transistor | |
AU482826B2 (en) | Method of mos transistor manufacture and resulting structure | |
CA1008186A (en) | Method of manufacture of mos transistor with gate connected to source or drain | |
JPS54158177A (en) | Method of fabricating complementary mos transistor | |
AU4355972A (en) | Method of manufacturing afield effect transistor |