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JPS5587142A - Positive type resist polymer composition - Google Patents

Positive type resist polymer composition

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Publication number
JPS5587142A
JPS5587142A JP15914078A JP15914078A JPS5587142A JP S5587142 A JPS5587142 A JP S5587142A JP 15914078 A JP15914078 A JP 15914078A JP 15914078 A JP15914078 A JP 15914078A JP S5587142 A JPS5587142 A JP S5587142A
Authority
JP
Japan
Prior art keywords
carboxylic acid
polymer composition
average molecular
molecular weight
positive type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15914078A
Other languages
Japanese (ja)
Inventor
Toshisuke Kitakoji
Yasuhiro Yoneda
Tateo Kitamura
Jiro Naito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15914078A priority Critical patent/JPS5587142A/en
Publication of JPS5587142A publication Critical patent/JPS5587142A/en
Pending legal-status Critical Current

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  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

PURPOSE: To enhance heat resistance, resolution, and sensitivity, by using a polymer composition containing methyl methacrylate units, unsaturated carboxylic acid units, and unsaturated carboxylic acid chloride units.
CONSTITUTION: Methyl methacrylate (a), carboxylic acid (b) represented by formula I (R1 is 1W5C alkylene), such as 3-methyl-3-butenoic acid, and carboxylic acid chloride (c) represented by formula II (R2 is 1W5C alkylene), such as 3-methyl- 3-butenoyl chloride are compolymerized to form a positive type resist polymer composition for radiation lithography using electron beam, X ray, or the like. The above polymer preferably hes a weight average molecular weight of about 50W500 thousand, and a weight average molecular weight to a number average molecular weight ratio of about 1.5W3.5.
COPYRIGHT: (C)1980,JPO&Japio
JP15914078A 1978-12-26 1978-12-26 Positive type resist polymer composition Pending JPS5587142A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15914078A JPS5587142A (en) 1978-12-26 1978-12-26 Positive type resist polymer composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15914078A JPS5587142A (en) 1978-12-26 1978-12-26 Positive type resist polymer composition

Publications (1)

Publication Number Publication Date
JPS5587142A true JPS5587142A (en) 1980-07-01

Family

ID=15687117

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15914078A Pending JPS5587142A (en) 1978-12-26 1978-12-26 Positive type resist polymer composition

Country Status (1)

Country Link
JP (1) JPS5587142A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006222350A (en) * 2005-02-14 2006-08-24 Kyocera Corp Electronic apparatus and its production method
US20160053062A1 (en) * 2013-04-12 2016-02-25 Kuraray Co., Ltd. Acrylic resin film

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006222350A (en) * 2005-02-14 2006-08-24 Kyocera Corp Electronic apparatus and its production method
US20160053062A1 (en) * 2013-04-12 2016-02-25 Kuraray Co., Ltd. Acrylic resin film

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