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JPS558019A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS558019A
JPS558019A JP7965078A JP7965078A JPS558019A JP S558019 A JPS558019 A JP S558019A JP 7965078 A JP7965078 A JP 7965078A JP 7965078 A JP7965078 A JP 7965078A JP S558019 A JPS558019 A JP S558019A
Authority
JP
Japan
Prior art keywords
base plate
impurity concentration
epi
layer
semiconductor device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7965078A
Other languages
Japanese (ja)
Inventor
Ichiemon Sasaki
Takashi Taniura
Michihiro Ota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP7965078A priority Critical patent/JPS558019A/en
Publication of JPS558019A publication Critical patent/JPS558019A/en
Pending legal-status Critical Current

Links

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)

Abstract

PURPOSE: To prevent quality variation of Si base plate of large area by forming on the Si base plate an epi-layer of the same type of electroconductivity and of 2-fold concentration or more.
CONSTITUTION: A uniform N epi-layer 2 with impurity concentration of 1015cm-3 is formed on an N type Si base plate 1 with impurity concentration of 5×1014cm-3, and when thus prepared material is used as a base plate, variation or fluctuation of impurity concentration of the base plate becomes controlled within a fixed range of 15% or less almost irrespectively of area of the base plate.
COPYRIGHT: (C)1980,JPO&Japio
JP7965078A 1978-06-30 1978-06-30 Semiconductor device Pending JPS558019A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7965078A JPS558019A (en) 1978-06-30 1978-06-30 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7965078A JPS558019A (en) 1978-06-30 1978-06-30 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS558019A true JPS558019A (en) 1980-01-21

Family

ID=13695991

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7965078A Pending JPS558019A (en) 1978-06-30 1978-06-30 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS558019A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS572209A (en) * 1980-06-04 1982-01-07 G C Dental Ind Corp Dental cement curing solution containing acrylic acid-maleic acid copolymer
JPS572210A (en) * 1980-06-04 1982-01-07 G C Dental Ind Corp Dental cement curing solution containing fluoro complex salt
JPS5762211A (en) * 1973-08-21 1982-04-15 Nat Res Dev Liquid ingredient for poly(carboxylate) cement
US7488762B2 (en) 2005-04-25 2009-02-10 Kabushiki Kaisha Shofu Two paste-type glass ionomer cement

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS503585A (en) * 1973-04-12 1975-01-14
JPS50139678A (en) * 1974-04-15 1975-11-08

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS503585A (en) * 1973-04-12 1975-01-14
JPS50139678A (en) * 1974-04-15 1975-11-08

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5762211A (en) * 1973-08-21 1982-04-15 Nat Res Dev Liquid ingredient for poly(carboxylate) cement
JPS6150989B2 (en) * 1973-08-21 1986-11-06 Nat Res Dev
JPS572209A (en) * 1980-06-04 1982-01-07 G C Dental Ind Corp Dental cement curing solution containing acrylic acid-maleic acid copolymer
JPS572210A (en) * 1980-06-04 1982-01-07 G C Dental Ind Corp Dental cement curing solution containing fluoro complex salt
JPS5938926B2 (en) * 1980-06-04 1984-09-20 而至歯科工業株式会社 Dental glass ionomer cement curing liquid containing fluoro complex salts
JPS5946924B2 (en) * 1980-06-04 1984-11-15 而至歯科工業株式会社 Dental glass ionomer cement curing liquid using acrylic acid/maleic acid copolymer
US7488762B2 (en) 2005-04-25 2009-02-10 Kabushiki Kaisha Shofu Two paste-type glass ionomer cement

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