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JPS55500965A - - Google Patents

Info

Publication number
JPS55500965A
JPS55500965A JP50018479A JP50018479A JPS55500965A JP S55500965 A JPS55500965 A JP S55500965A JP 50018479 A JP50018479 A JP 50018479A JP 50018479 A JP50018479 A JP 50018479A JP S55500965 A JPS55500965 A JP S55500965A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP50018479A
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS55500965A publication Critical patent/JPS55500965A/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C16/00Erasable programmable read-only memories
    • G11C16/02Erasable programmable read-only memories electrically programmable
    • G11C16/04Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
    • G11C16/0466Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS comprising cells with charge storage in an insulating layer, e.g. metal-nitride-oxide-silicon [MNOS], silicon-oxide-nitride-oxide-silicon [SONOS]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • H10D30/69IGFETs having charge trapping gate insulators, e.g. MNOS transistors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/213Channel regions of field-effect devices
    • H10D62/221Channel regions of field-effect devices of FETs
    • H10D62/235Channel regions of field-effect devices of FETs of IGFETs
    • H10D62/299Channel regions of field-effect devices of FETs of IGFETs having lateral doping variations
    • H10D62/307Channel regions of field-effect devices of FETs of IGFETs having lateral doping variations the doping variations being parallel to the channel lengths

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Non-Volatile Memory (AREA)
JP50018479A 1978-11-27 1979-11-26 Pending JPS55500965A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US96401478A 1978-11-27 1978-11-27

Publications (1)

Publication Number Publication Date
JPS55500965A true JPS55500965A (de) 1980-11-13

Family

ID=25508027

Family Applications (1)

Application Number Title Priority Date Filing Date
JP50018479A Pending JPS55500965A (de) 1978-11-27 1979-11-26

Country Status (3)

Country Link
EP (1) EP0020708A4 (de)
JP (1) JPS55500965A (de)
WO (1) WO1980001122A1 (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1191561B (it) * 1986-06-03 1988-03-23 Sgs Microelettrica Spa Dispositivo di memoria non labile a semiconduttore con porta non connessa (floating gate) alterabile elettricamente
JP2744126B2 (ja) * 1990-10-17 1998-04-28 株式会社東芝 半導体装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3719866A (en) * 1970-12-03 1973-03-06 Ncr Semiconductor memory device
JPS5024084A (de) * 1973-07-05 1975-03-14
DE2418582C3 (de) * 1974-04-17 1978-09-14 Siemens Ag, 1000 Berlin Und 8000 Muenchen MNOS-Transistor, insbesondere MNOS-Transistor mit kurzer Kanalzone, für kurze Einschreibzeiten
US4068217A (en) * 1975-06-30 1978-01-10 International Business Machines Corporation Ultimate density non-volatile cross-point semiconductor memory array
US4017888A (en) * 1975-12-31 1977-04-12 International Business Machines Corporation Non-volatile metal nitride oxide semiconductor device
JPS52105784A (en) * 1976-03-01 1977-09-05 Sony Corp Mios type memory unit
DE2720715A1 (de) * 1977-05-07 1978-11-09 Itt Ind Gmbh Deutsche Mnos-speichertransistor
US4151538A (en) * 1978-01-30 1979-04-24 Rca Corp. Nonvolatile semiconductive memory device and method of its manufacture

Also Published As

Publication number Publication date
EP0020708A4 (de) 1983-03-07
EP0020708A1 (de) 1981-01-07
WO1980001122A1 (en) 1980-05-29

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