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JPS5538053B2 - - Google Patents

Info

Publication number
JPS5538053B2
JPS5538053B2 JP15211376A JP15211376A JPS5538053B2 JP S5538053 B2 JPS5538053 B2 JP S5538053B2 JP 15211376 A JP15211376 A JP 15211376A JP 15211376 A JP15211376 A JP 15211376A JP S5538053 B2 JPS5538053 B2 JP S5538053B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15211376A
Other languages
Japanese (ja)
Other versions
JPS5376758A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP15211376A priority Critical patent/JPS5376758A/ja
Publication of JPS5376758A publication Critical patent/JPS5376758A/ja
Publication of JPS5538053B2 publication Critical patent/JPS5538053B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP15211376A 1976-12-20 1976-12-20 Plasma etching method Granted JPS5376758A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15211376A JPS5376758A (en) 1976-12-20 1976-12-20 Plasma etching method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15211376A JPS5376758A (en) 1976-12-20 1976-12-20 Plasma etching method

Publications (2)

Publication Number Publication Date
JPS5376758A JPS5376758A (en) 1978-07-07
JPS5538053B2 true JPS5538053B2 (hu) 1980-10-02

Family

ID=15533331

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15211376A Granted JPS5376758A (en) 1976-12-20 1976-12-20 Plasma etching method

Country Status (1)

Country Link
JP (1) JPS5376758A (hu)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5691446A (en) * 1979-12-25 1981-07-24 Seiko Epson Corp Forming of element segregation region of semiconductor integrated circuit
JPS5691447A (en) * 1979-12-25 1981-07-24 Seiko Epson Corp Forming of element segregation region of semiconductor integrated circuit

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5171597A (hu) * 1974-12-18 1976-06-21 Hitachi Ltd
JPS5334461A (en) * 1976-09-13 1978-03-31 Toshiba Corp Operating method for accumulating tube
JPS5368171A (en) * 1976-11-30 1978-06-17 Hitachi Ltd Method and apparatus for plasma treatment

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5171597A (hu) * 1974-12-18 1976-06-21 Hitachi Ltd
JPS5334461A (en) * 1976-09-13 1978-03-31 Toshiba Corp Operating method for accumulating tube
JPS5368171A (en) * 1976-11-30 1978-06-17 Hitachi Ltd Method and apparatus for plasma treatment

Also Published As

Publication number Publication date
JPS5376758A (en) 1978-07-07

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