JPS5534414B2 - - Google Patents
Info
- Publication number
- JPS5534414B2 JPS5534414B2 JP6246573A JP6246573A JPS5534414B2 JP S5534414 B2 JPS5534414 B2 JP S5534414B2 JP 6246573 A JP6246573 A JP 6246573A JP 6246573 A JP6246573 A JP 6246573A JP S5534414 B2 JPS5534414 B2 JP S5534414B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/12—Nitrogen compound containing
- Y10S430/121—Nitrogen in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/124—Carbonyl compound containing
- Y10S430/125—Carbonyl in heterocyclic compound
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/156—Precursor compound
- Y10S430/16—Blocked developers
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US00258951A US3844790A (en) | 1972-06-02 | 1972-06-02 | Photopolymerizable compositions with improved resistance to oxygen inhibition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS4963420A JPS4963420A (ja) | 1974-06-19 |
JPS5534414B2 true JPS5534414B2 (ja) | 1980-09-06 |
Family
ID=22982820
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6246573A Expired JPS5534414B2 (ja) | 1972-06-02 | 1973-06-02 |
Country Status (5)
Country | Link |
---|---|
US (1) | US3844790A (ja) |
JP (1) | JPS5534414B2 (ja) |
DE (1) | DE2327513C3 (ja) |
FR (1) | FR2186675B1 (ja) |
GB (1) | GB1417088A (ja) |
Cited By (94)
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---|---|---|---|---|
JPS575100U (ja) * | 1980-06-09 | 1982-01-11 | ||
EP0726498A1 (en) | 1995-02-10 | 1996-08-14 | Fuji Photo Film Co., Ltd. | Photopolymerizable composition |
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EP1754758A2 (en) | 2005-08-17 | 2007-02-21 | Fuji Photo Film Co., Ltd. | Ink composition comprising an onium salt and a cationically polymerisable compound, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate |
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WO2007108367A1 (ja) | 2006-03-17 | 2007-09-27 | Fujifilm Corporation | 高分子化合物およびその製造方法、顔料分散剤、顔料分散組成物、光硬化性組成物、並びにカラーフィルタおよびその製造方法 |
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Families Citing this family (62)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4050941A (en) * | 1976-12-20 | 1977-09-27 | E. I. Du Pont De Nemours And Company | High resolution photohardenable coating compositions containing tetracyanoethane compounds |
US4189366A (en) * | 1979-01-15 | 1980-02-19 | Eastman Kodak Company | Radiation curable compositions containing 5-halo-6-halomethyluracil derivatives as photoinitiators |
JPS55118030A (en) * | 1979-03-06 | 1980-09-10 | Fuji Photo Film Co Ltd | Photopolymerizable composition |
US4248958A (en) * | 1979-05-23 | 1981-02-03 | Hoechst Aktiengesellschaft | Photopolymerizable mixture containing polyurethanes |
US4245030A (en) * | 1979-05-23 | 1981-01-13 | Hoechst Aktiengesellschaft | Photopolymerizable mixture containing improved plasticizer |
JPS5845210A (ja) * | 1981-09-09 | 1983-03-16 | Toyobo Co Ltd | 感光性樹脂組成物 |
JPS57161742A (en) * | 1981-03-27 | 1982-10-05 | Toyobo Co Ltd | Photosensitive resin composition |
US4459349A (en) * | 1981-03-27 | 1984-07-10 | Toyo Boseki Kabushiki Kaisha | Photosensitive resin composition |
DE3136484A1 (de) * | 1981-09-15 | 1983-03-31 | Kulzer & Co Gmbh, 6380 Bad Homburg | "verfahren zur photopolymerisation von vinylverbindu ngen und photopolymerisierbares material" |
JPH0629285B2 (ja) * | 1983-10-14 | 1994-04-20 | 三菱化成株式会社 | 光重合性組成物 |
US4636459A (en) * | 1985-03-06 | 1987-01-13 | Fuji Photo Film Co., Ltd. | Photopolymerizable compositions |
US4755450A (en) * | 1986-04-22 | 1988-07-05 | Minnesota Mining And Manufacturing Company | Spectral sensitizing dyes in photopolymerizable systems |
US4894314A (en) * | 1986-11-12 | 1990-01-16 | Morton Thiokol, Inc. | Photoinitiator composition containing bis ketocoumarin dialkylamino benzoate, camphorquinone and/or a triphenylimidazolyl dimer |
GB8718528D0 (en) * | 1987-08-05 | 1987-09-09 | Ciba Geigy Ag | Photopolymerisable composition |
US4849314A (en) * | 1987-11-04 | 1989-07-18 | E. I. Du Pont De Nemours And Company | Photohardenable electrostatic master containing electron acceptor or donor |
US5456905A (en) * | 1988-08-23 | 1995-10-10 | Ultraset Limited Partnership | Quick-drying nail coating method and composition |
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Also Published As
Publication number | Publication date |
---|---|
FR2186675B1 (ja) | 1981-04-10 |
DE2327513C3 (de) | 1975-03-20 |
GB1417088A (en) | 1975-12-10 |
JPS4963420A (ja) | 1974-06-19 |
US3844790A (en) | 1974-10-29 |
DE2327513A1 (de) | 1973-12-13 |
FR2186675A1 (ja) | 1974-01-11 |
DE2327513B2 (de) | 1974-08-01 |