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JPS552213A - Developing method - Google Patents

Developing method

Info

Publication number
JPS552213A
JPS552213A JP7388378A JP7388378A JPS552213A JP S552213 A JPS552213 A JP S552213A JP 7388378 A JP7388378 A JP 7388378A JP 7388378 A JP7388378 A JP 7388378A JP S552213 A JPS552213 A JP S552213A
Authority
JP
Japan
Prior art keywords
film
substrate
developing
radiation
developing solution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7388378A
Other languages
Japanese (ja)
Other versions
JPS6129494B2 (en
Inventor
Katsuhiro Kawabuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
CHO LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI, CHO LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP7388378A priority Critical patent/JPS552213A/en
Publication of JPS552213A publication Critical patent/JPS552213A/en
Publication of JPS6129494B2 publication Critical patent/JPS6129494B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)

Abstract

PURPOSE:To form high precision resist patterns with sufficient reproductivity, by dipping a substrate having a radiation sensitive resist film patternwise exposed to radiation in a developing solution for developing after keeping in advance the substrate at the same temperature as that of the developing solution maintained constant. CONSTITUTION:A radiation sensitive resist film attached to a substrate is patternwise exposed to radiation and supplied in advance for preheating with feed rollers 6 into preliminary thermostat 1 kept at 30 deg.C by energizing heat coil 7 and controlling this through temperature control mechanism 8. The preheated film is sent for developing onto perforated support 22 in developing solution 13 kept at 30 deg.C by way of declining guide 23. The developed film is taken out by raising support 22 with cylinder 21 and pushing out the film on support 22 with pushing cylinde 24 through outlet duct 25 along rollers 26.
JP7388378A 1978-06-19 1978-06-19 Developing method Granted JPS552213A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7388378A JPS552213A (en) 1978-06-19 1978-06-19 Developing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7388378A JPS552213A (en) 1978-06-19 1978-06-19 Developing method

Publications (2)

Publication Number Publication Date
JPS552213A true JPS552213A (en) 1980-01-09
JPS6129494B2 JPS6129494B2 (en) 1986-07-07

Family

ID=13531043

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7388378A Granted JPS552213A (en) 1978-06-19 1978-06-19 Developing method

Country Status (1)

Country Link
JP (1) JPS552213A (en)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58168229A (en) * 1982-03-22 1983-10-04 インタ−ナシヨナル　ビジネス　マシ−ンズ　コ−ポレ−シヨン Treating device
JPS5972136A (en) * 1982-10-19 1984-04-24 Toshiba Corp Forming method for resist pattern
JPS59144220U (en) * 1983-03-18 1984-09-27 トキコ株式会社 compressor connecting rod
JPS60117733A (en) * 1983-11-30 1985-06-25 Canon Hanbai Kk Developing device for wafer
EP0224273A2 (en) * 1985-11-28 1987-06-03 Daikin Industries, Limited Resist developing apparatus
JPS62276827A (en) * 1985-11-28 1987-12-01 Daikin Ind Ltd Apparatus for developing resist
JPS63170935U (en) * 1987-04-27 1988-11-07
JPH0210824A (en) * 1988-06-29 1990-01-16 Matsushita Electric Ind Co Ltd Electron-beam resist developing method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50108005A (en) * 1974-01-31 1975-08-26
JPS5159504A (en) * 1974-11-21 1976-05-24 Fuji Photo Film Co Ltd Kankoseiheiban insatsubanno genzohoho
JPS5180228A (en) * 1975-01-10 1976-07-13 Fuji Photo Film Co Ltd GENZOEKISOSE IBUTSU

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50108005A (en) * 1974-01-31 1975-08-26
JPS5159504A (en) * 1974-11-21 1976-05-24 Fuji Photo Film Co Ltd Kankoseiheiban insatsubanno genzohoho
JPS5180228A (en) * 1975-01-10 1976-07-13 Fuji Photo Film Co Ltd GENZOEKISOSE IBUTSU

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58168229A (en) * 1982-03-22 1983-10-04 インタ−ナシヨナル　ビジネス　マシ−ンズ　コ−ポレ−シヨン Treating device
JPH0136697B2 (en) * 1982-03-22 1989-08-02 Intaanashonaru Bijinesu Mashiinzu Corp
JPS5972136A (en) * 1982-10-19 1984-04-24 Toshiba Corp Forming method for resist pattern
JPS59144220U (en) * 1983-03-18 1984-09-27 トキコ株式会社 compressor connecting rod
JPS60117733A (en) * 1983-11-30 1985-06-25 Canon Hanbai Kk Developing device for wafer
EP0224273A2 (en) * 1985-11-28 1987-06-03 Daikin Industries, Limited Resist developing apparatus
JPS62276827A (en) * 1985-11-28 1987-12-01 Daikin Ind Ltd Apparatus for developing resist
US4827867A (en) * 1985-11-28 1989-05-09 Daikin Industries, Ltd. Resist developing apparatus
JPH0513533B2 (en) * 1985-11-28 1993-02-22 Daikin Ind Ltd
JPS63170935U (en) * 1987-04-27 1988-11-07
JPH0210824A (en) * 1988-06-29 1990-01-16 Matsushita Electric Ind Co Ltd Electron-beam resist developing method

Also Published As

Publication number Publication date
JPS6129494B2 (en) 1986-07-07

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