JPS55160439A - Device for fixing thin plate - Google Patents
Device for fixing thin plateInfo
- Publication number
- JPS55160439A JPS55160439A JP6780479A JP6780479A JPS55160439A JP S55160439 A JPS55160439 A JP S55160439A JP 6780479 A JP6780479 A JP 6780479A JP 6780479 A JP6780479 A JP 6780479A JP S55160439 A JPS55160439 A JP S55160439A
- Authority
- JP
- Japan
- Prior art keywords
- thin plate
- circular
- sections
- partition chamber
- container
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Jigs For Machine Tools (AREA)
- Gripping Jigs, Holding Jigs, And Positioning Jigs (AREA)
Abstract
PURPOSE:To flatly adsorb a thin plate without occurrence of a buckling by employing adsorbing means forming a thin plate fixing unit as a plurality of concentrically circular containers using present sections and sequentially attracting the thin plate sections and sequentially attracting the thin plate placed thereon from the central region to the peripheral region. CONSTITUTION:Circular sections 22a, 22b are concentrically disposed within the circular container 21, and a fixing plate 24 having a plurality of fine holes 23 at the opening end of the container 21 is engaged with the container 21 placed thereon. Then, vacuum pipes 28-30 are inserted into largely circular partition chamber 27 disposed outside a small circular partition chamber 26 surrounding the central circular columnar partition chamber 25 formed with the sections 22a, 22b and the partition chamber 25 while passing the bottoms of the containers 21 thereinto, and connected through solenoid control valves 32, 33 and an electromagnetic three-way valve 34 to an exhaust pump 35. Thereafter, the thin plate 37 such as silicon wafer of the like is placed on the plate 24, an opening and closing sequence controller 36 is operated to sequentially attract the thin plate 37 from the central region to the peripheral region.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6780479A JPS55160439A (en) | 1979-05-31 | 1979-05-31 | Device for fixing thin plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6780479A JPS55160439A (en) | 1979-05-31 | 1979-05-31 | Device for fixing thin plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS55160439A true JPS55160439A (en) | 1980-12-13 |
Family
ID=13355497
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6780479A Pending JPS55160439A (en) | 1979-05-31 | 1979-05-31 | Device for fixing thin plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55160439A (en) |
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5689744A (en) * | 1979-12-24 | 1981-07-21 | Fujitsu Ltd | X-ray transfer device |
JPS60127935A (en) * | 1983-12-14 | 1985-07-08 | Fujitsu Ltd | wafer chuck |
JPS60149755U (en) * | 1984-03-13 | 1985-10-04 | 富士通株式会社 | Parts fixing jig |
US4721462A (en) * | 1986-10-21 | 1988-01-26 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Active hold-down for heat treating |
JPH01206644A (en) * | 1988-02-13 | 1989-08-18 | Shinkawa Ltd | Substrate sucking structure |
US5008702A (en) * | 1988-09-07 | 1991-04-16 | Hitachi, Ltd. | Exposure method and apparatus |
JPH0839376A (en) * | 1994-07-29 | 1996-02-13 | Ckd Corp | Adsorbing plate of vacuum chuck and manufacture of vacuum chuck and adsorbing plate |
US5724121A (en) * | 1995-05-12 | 1998-03-03 | Hughes Danbury Optical Systems, Inc. | Mounting member method and apparatus with variable length supports |
JP2010151993A (en) * | 2008-12-24 | 2010-07-08 | Casio Computer Co Ltd | Display device |
US8404496B2 (en) | 1999-11-11 | 2013-03-26 | Fujitsu Semiconductor Limited | Method of testing a semiconductor device and suctioning a semiconductor device in the wafer state |
CN111473039A (en) * | 2020-03-04 | 2020-07-31 | 上海精测半导体技术有限公司 | Flexible panel leveling apparatus and method |
EP2748843B1 (en) * | 2011-08-26 | 2023-01-04 | SK Siltron Co., Ltd. | Susceptor |
-
1979
- 1979-05-31 JP JP6780479A patent/JPS55160439A/en active Pending
Cited By (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5689744A (en) * | 1979-12-24 | 1981-07-21 | Fujitsu Ltd | X-ray transfer device |
JPS60127935A (en) * | 1983-12-14 | 1985-07-08 | Fujitsu Ltd | wafer chuck |
JPS60149755U (en) * | 1984-03-13 | 1985-10-04 | 富士通株式会社 | Parts fixing jig |
US4721462A (en) * | 1986-10-21 | 1988-01-26 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Active hold-down for heat treating |
JPH01206644A (en) * | 1988-02-13 | 1989-08-18 | Shinkawa Ltd | Substrate sucking structure |
US5008702A (en) * | 1988-09-07 | 1991-04-16 | Hitachi, Ltd. | Exposure method and apparatus |
JPH0839376A (en) * | 1994-07-29 | 1996-02-13 | Ckd Corp | Adsorbing plate of vacuum chuck and manufacture of vacuum chuck and adsorbing plate |
US5724121A (en) * | 1995-05-12 | 1998-03-03 | Hughes Danbury Optical Systems, Inc. | Mounting member method and apparatus with variable length supports |
US8404496B2 (en) | 1999-11-11 | 2013-03-26 | Fujitsu Semiconductor Limited | Method of testing a semiconductor device and suctioning a semiconductor device in the wafer state |
JP2010151993A (en) * | 2008-12-24 | 2010-07-08 | Casio Computer Co Ltd | Display device |
EP2748843B1 (en) * | 2011-08-26 | 2023-01-04 | SK Siltron Co., Ltd. | Susceptor |
CN111473039A (en) * | 2020-03-04 | 2020-07-31 | 上海精测半导体技术有限公司 | Flexible panel leveling apparatus and method |
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