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JPS55149829A - Detector for foreign matter in wafer - Google Patents

Detector for foreign matter in wafer

Info

Publication number
JPS55149829A
JPS55149829A JP5712679A JP5712679A JPS55149829A JP S55149829 A JPS55149829 A JP S55149829A JP 5712679 A JP5712679 A JP 5712679A JP 5712679 A JP5712679 A JP 5712679A JP S55149829 A JPS55149829 A JP S55149829A
Authority
JP
Japan
Prior art keywords
deflected
laser beam
foreign matter
beam component
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5712679A
Other languages
Japanese (ja)
Other versions
JPH0159522B2 (en
Inventor
Nobuyuki Akiyama
Yoshimasa Oshima
Mitsuyoshi Koizumi
Yoshisada Oshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP5712679A priority Critical patent/JPS55149829A/en
Publication of JPS55149829A publication Critical patent/JPS55149829A/en
Publication of JPH0159522B2 publication Critical patent/JPH0159522B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/94—Investigating contamination, e.g. dust

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To achieve stable and quick detection of foreign matter regardless of direction thereof by use of an S deflected laser respectively for the laser beams irradiated in the X and Y axes. CONSTITUTION:A pair of S deflected laser oscillators 30 of a wavelength lambda1 is arranged in the X-axis irradiation system and a pair of S deflected laser oscillator 31 of a wavelength lambda2 in the X-axis irradiation system. When irradiated at the detection point 43 on the wafer 32 from the S deflected laser oscillators 30 and 31, laser beam is spattered on the wafer depending on the pattern and foreign matters. The beam thus scattered is collected through the lens 33, the slit 34 and the realy lens 35 and then, the laser beam component of the wavelength lambda1 is made to transmit with a dichromic mirror 36 while the laser beam component of the wavelength lambda2 is reflected. Then, only the P deflected laser beam component 37 and the S deflected laser beam component 38 are extracted with the S deflected cut filters 39 and 40 to be detected with photoelectric elements 41 and 42. Addition of the two detection outputs enables one to determine whether there is foreign matter or not regardless of the direction thereof.
JP5712679A 1979-05-11 1979-05-11 Detector for foreign matter in wafer Granted JPS55149829A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5712679A JPS55149829A (en) 1979-05-11 1979-05-11 Detector for foreign matter in wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5712679A JPS55149829A (en) 1979-05-11 1979-05-11 Detector for foreign matter in wafer

Publications (2)

Publication Number Publication Date
JPS55149829A true JPS55149829A (en) 1980-11-21
JPH0159522B2 JPH0159522B2 (en) 1989-12-18

Family

ID=13046862

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5712679A Granted JPS55149829A (en) 1979-05-11 1979-05-11 Detector for foreign matter in wafer

Country Status (1)

Country Link
JP (1) JPS55149829A (en)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57128834A (en) * 1981-02-04 1982-08-10 Nippon Kogaku Kk <Nikon> Inspecting apparatus of foreign substance
JPS5887819A (en) * 1981-11-20 1983-05-25 Hitachi Ltd Mask pattern defect inspection equipment
JPS5982727A (en) * 1982-11-04 1984-05-12 Hitachi Ltd Foreign object detection method and device
JPS61104658A (en) * 1984-10-29 1986-05-22 Hitachi Ltd Semiconductor solid-state image sensor array
JPS61104659A (en) * 1984-10-29 1986-05-22 Hitachi Ltd Semiconductor solid-state image sensor array
US4614427A (en) * 1983-05-20 1986-09-30 Hitachi, Ltd. Automatic contaminants detection apparatus
JPS6219739A (en) * 1985-07-19 1987-01-28 Hitachi Ltd Method and device for inspection
JPS6270738A (en) * 1985-09-25 1987-04-01 Hitachi Electronics Eng Co Ltd Foreign object detection method
JPS6270739A (en) * 1985-09-25 1987-04-01 Hitachi Electronics Eng Co Ltd Foreign object inspection device
US4740079A (en) * 1984-10-29 1988-04-26 Hitachi, Ltd. Method of and apparatus for detecting foreign substances
JPS63153451A (en) * 1986-12-18 1988-06-25 Hitachi Ltd Foreign object detection method and device
JPH02167452A (en) * 1989-11-27 1990-06-27 Hitachi Ltd Foreign object detection method and device
US6002989A (en) * 1996-04-02 1999-12-14 Hitachi, Ltd. System for quality control where inspection frequency of inspection apparatus is reset to minimize expected total loss based on derived frequency function and loss value
US6792359B2 (en) 2000-07-26 2004-09-14 Hitachi, Ltd. Method for inspecting defect and system therefor
JP2007243164A (en) * 2006-02-09 2007-09-20 Asml Netherlands Bv Lithography system, sensor, and method of measuring properties of substrate

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52154688A (en) * 1976-06-18 1977-12-22 Nippon Steel Corp Detection of faults on surface of metal plate moving at high speed

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52154688A (en) * 1976-06-18 1977-12-22 Nippon Steel Corp Detection of faults on surface of metal plate moving at high speed

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57128834A (en) * 1981-02-04 1982-08-10 Nippon Kogaku Kk <Nikon> Inspecting apparatus of foreign substance
JPS5887819A (en) * 1981-11-20 1983-05-25 Hitachi Ltd Mask pattern defect inspection equipment
JPS5982727A (en) * 1982-11-04 1984-05-12 Hitachi Ltd Foreign object detection method and device
US4614427A (en) * 1983-05-20 1986-09-30 Hitachi, Ltd. Automatic contaminants detection apparatus
JPS61104658A (en) * 1984-10-29 1986-05-22 Hitachi Ltd Semiconductor solid-state image sensor array
JPS61104659A (en) * 1984-10-29 1986-05-22 Hitachi Ltd Semiconductor solid-state image sensor array
US4740079A (en) * 1984-10-29 1988-04-26 Hitachi, Ltd. Method of and apparatus for detecting foreign substances
JPS6219739A (en) * 1985-07-19 1987-01-28 Hitachi Ltd Method and device for inspection
JPS6270739A (en) * 1985-09-25 1987-04-01 Hitachi Electronics Eng Co Ltd Foreign object inspection device
JPS6270738A (en) * 1985-09-25 1987-04-01 Hitachi Electronics Eng Co Ltd Foreign object detection method
JPS63153451A (en) * 1986-12-18 1988-06-25 Hitachi Ltd Foreign object detection method and device
JPH02167452A (en) * 1989-11-27 1990-06-27 Hitachi Ltd Foreign object detection method and device
US6002989A (en) * 1996-04-02 1999-12-14 Hitachi, Ltd. System for quality control where inspection frequency of inspection apparatus is reset to minimize expected total loss based on derived frequency function and loss value
US6792359B2 (en) 2000-07-26 2004-09-14 Hitachi, Ltd. Method for inspecting defect and system therefor
US7010447B2 (en) 2000-07-26 2006-03-07 Hitachi, Ltd. Method for inspecting defect and system therefor
US7305314B2 (en) 2000-07-26 2007-12-04 Hitachi, Ltd. Method for inspecting defect and system therefor
US7558683B2 (en) 2000-07-26 2009-07-07 Hitachi, Ltd. Method for inspecting defect and system therefor
JP2007243164A (en) * 2006-02-09 2007-09-20 Asml Netherlands Bv Lithography system, sensor, and method of measuring properties of substrate

Also Published As

Publication number Publication date
JPH0159522B2 (en) 1989-12-18

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