JPS55145174A - Etching method of amorphous alloy material - Google Patents
Etching method of amorphous alloy materialInfo
- Publication number
- JPS55145174A JPS55145174A JP5183479A JP5183479A JPS55145174A JP S55145174 A JPS55145174 A JP S55145174A JP 5183479 A JP5183479 A JP 5183479A JP 5183479 A JP5183479 A JP 5183479A JP S55145174 A JPS55145174 A JP S55145174A
- Authority
- JP
- Japan
- Prior art keywords
- alloy material
- amorphous alloy
- etching
- etching method
- pretreatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000956 alloy Substances 0.000 title abstract 5
- 229910000808 amorphous metal alloy Inorganic materials 0.000 title abstract 4
- 238000005530 etching Methods 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 4
- 238000002425 crystallisation Methods 0.000 abstract 3
- 230000008025 crystallization Effects 0.000 abstract 3
- 239000011810 insulating material Substances 0.000 abstract 1
- 230000000873 masking effect Effects 0.000 abstract 1
- 239000000463 material Substances 0.000 abstract 1
- 238000001259 photo etching Methods 0.000 abstract 1
- 230000000704 physical effect Effects 0.000 abstract 1
Landscapes
- ing And Chemical Polishing (AREA)
Abstract
PURPOSE: To conduct etching efficiently without damaging physical properties of material, by, in etching of amorphous alloy material, forming a crystallization zone of a prescribed shape as a pretreatment.
CONSTITUTION: A crystallization zone of a prescribed shape is formed by means of a mask made of heat-insulating material or a masking shield on the surface of an amorphous alloy material composed of Fe, Co, Ni etc. and P, B, C, Si etc., and the alloy material is heated to a temp. not lower than the crystallization temp. by a suitable method. After completion of the pretreatment, a prescribed etching is performed. By this method, the amorphous alloy material is selectively etched quickly. This procedure is simpler than photoetching, and produces no working strain etc.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5183479A JPS55145174A (en) | 1979-04-26 | 1979-04-26 | Etching method of amorphous alloy material |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5183479A JPS55145174A (en) | 1979-04-26 | 1979-04-26 | Etching method of amorphous alloy material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS55145174A true JPS55145174A (en) | 1980-11-12 |
JPS6212308B2 JPS6212308B2 (en) | 1987-03-18 |
Family
ID=12897884
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5183479A Granted JPS55145174A (en) | 1979-04-26 | 1979-04-26 | Etching method of amorphous alloy material |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS55145174A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61189930A (en) * | 1985-02-19 | 1986-08-23 | トッパン・ムーア株式会社 | Laminated core material |
JP2013118407A (en) * | 2013-03-06 | 2013-06-13 | Renesas Electronics Corp | Method of manufacturing semiconductor device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5190944A (en) * | 1975-02-07 | 1976-08-10 | HISHOSHITSUKARUKOGENAIDOHAKUMAKUOMOCHIIRUFUOTOETSUCHINGUNOHOHO |
-
1979
- 1979-04-26 JP JP5183479A patent/JPS55145174A/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5190944A (en) * | 1975-02-07 | 1976-08-10 | HISHOSHITSUKARUKOGENAIDOHAKUMAKUOMOCHIIRUFUOTOETSUCHINGUNOHOHO |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61189930A (en) * | 1985-02-19 | 1986-08-23 | トッパン・ムーア株式会社 | Laminated core material |
JP2013118407A (en) * | 2013-03-06 | 2013-06-13 | Renesas Electronics Corp | Method of manufacturing semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPS6212308B2 (en) | 1987-03-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS51129328A (en) | Metal baseball bat and method of producing same | |
JPS542783A (en) | Production of pressure or differential pressure measuring apparatus | |
JPS55145174A (en) | Etching method of amorphous alloy material | |
JPS51125615A (en) | A cooling arrangement for rolls, etc. | |
JPS5411012A (en) | Method and equipment for heat treating titanium pipe | |
JPS5423535A (en) | Dot diameter adjusting method | |
JPS53127266A (en) | Forming method of marker | |
JPS5323818A (en) | Production of rotor material for high speed hysteresis motors | |
JPS5366818A (en) | Manufacture of high toughness high strength steel | |
JPS5328509A (en) | Treating method for increasing high temperature strength of pure titanium material | |
JPS5222598A (en) | Etching method of chromium oxide | |
JPS5237302A (en) | Safe tire and method of fabricating the same | |
JPS5361515A (en) | Production of watchcase | |
JPS53119776A (en) | Manufacture of thin walled cylinder with bellows | |
JPS5651582A (en) | Gas etching method | |
JPS5231926A (en) | Manufacturing method of b -c alloy having uniform inner stress | |
JPS5327376A (en) | Forming method of high resistanc e layer | |
JPS544857A (en) | Manufacture of hard faced pipe of aluminum or aluminum alloy | |
JPS5312184A (en) | Process for producing stem of bulb | |
JPS5313977A (en) | Detecting method for surface flaw of high temperature | |
JPS52105772A (en) | Manufacture for multi-dimensional semiconductor raw material | |
JPS5236504A (en) | Process for producing ingot of chromium or chromium alloy | |
JPS53124124A (en) | Manufacture of rolled steel | |
JPS5391635A (en) | Forming method for magnetic film pattern | |
JPS5234758A (en) | Process for the fabrication of a character plate |