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JPS55130817A - Producing boron structural material - Google Patents

Producing boron structural material

Info

Publication number
JPS55130817A
JPS55130817A JP3816779A JP3816779A JPS55130817A JP S55130817 A JPS55130817 A JP S55130817A JP 3816779 A JP3816779 A JP 3816779A JP 3816779 A JP3816779 A JP 3816779A JP S55130817 A JPS55130817 A JP S55130817A
Authority
JP
Japan
Prior art keywords
substrate
boron
layer
structural material
aluminum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP3816779A
Other languages
Japanese (ja)
Other versions
JPS6141846B2 (en
Inventor
Masaki Aoki
Hiroshi Yamazoe
Shigeru Yoshida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP3816779A priority Critical patent/JPS55130817A/en
Publication of JPS55130817A publication Critical patent/JPS55130817A/en
Publication of JPS6141846B2 publication Critical patent/JPS6141846B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)

Abstract

PURPOSE:To provide boron structural material excellent in mechanical properties with high productivity by a method wherein an aluminum-contg. chromium layer is provided on the base metal to form a substrate, a boron layer is formed on the substrate, and the substrate is selectively removed. CONSTITUTION:On a base metal such as tantalum and titanium, chromium which contains 1-35mol% of aluminum is deposited to form a 0.3-2mu layer, by means of electroplating or vacuum deposition, to form a substrate. The substrate is heated to about 900 deg.C or more and brought into contact with a mixed gas of BCl3 and H2 (about 1:3 volume ratio) so that boron is chemically deposited on the substrate to form a boron layer with a desired thickness. This is immersed into a solvent (e.g. a methanol solution of bromine, chlorine etc.) to selectively dissolve the substrate and remove it, leaving a structural material mainly consisting of single boron element.
JP3816779A 1979-03-29 1979-03-29 Producing boron structural material Granted JPS55130817A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP3816779A JPS55130817A (en) 1979-03-29 1979-03-29 Producing boron structural material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP3816779A JPS55130817A (en) 1979-03-29 1979-03-29 Producing boron structural material

Publications (2)

Publication Number Publication Date
JPS55130817A true JPS55130817A (en) 1980-10-11
JPS6141846B2 JPS6141846B2 (en) 1986-09-18

Family

ID=12517834

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3816779A Granted JPS55130817A (en) 1979-03-29 1979-03-29 Producing boron structural material

Country Status (1)

Country Link
JP (1) JPS55130817A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1595976A1 (en) * 2003-02-19 2005-11-16 Ulvac, Inc. Film-forming apparatus component and method for cleaning same
CN111212814A (en) * 2017-10-17 2020-05-29 株式会社德山 Boron structure and boron powder

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1595976A1 (en) * 2003-02-19 2005-11-16 Ulvac, Inc. Film-forming apparatus component and method for cleaning same
EP1595976A4 (en) * 2003-02-19 2011-05-04 Ulvac Inc Film-forming apparatus component and method for cleaning same
US8216654B2 (en) 2003-02-19 2012-07-10 Ulvac, Inc. Components for a film-forming device and method for cleaning the same
CN111212814A (en) * 2017-10-17 2020-05-29 株式会社德山 Boron structure and boron powder

Also Published As

Publication number Publication date
JPS6141846B2 (en) 1986-09-18

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